Walter Pauls

Person

Huettlingen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Method for producing a reflecting optical element of a projection e...
- Patent number 11,415,892
- Issue date Aug 16, 2022
- Carl Zeiss SMT GmbH
- Matthias Kaes
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for changing a surface via particle irradiation
- Patent number 10,859,819
- Issue date Dec 8, 2020
- Carl Zeiss SMT GmbH
- Walter Pauls
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Device for changing a surface shape of an optical element via elect...
- Patent number 10,551,747
- Issue date Feb 4, 2020
- Carl Zeiss SMT GmbH
- Walter Pauls
- G02 - OPTICS
Information Patent Grant
Projection lens for EUV microlithography, film element and method f...
- Patent number 10,001,631
- Issue date Jun 19, 2018
- Carl Zeiss SMT GmbH
- Boris Bittner
- G02 - OPTICS
Information Patent Grant
Optical assembly
- Patent number 9,939,730
- Issue date Apr 10, 2018
- Carl Zeiss SMT GmbH
- Walter Pauls
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mirror arrangement for an EUV projection exposure apparatus, method...
- Patent number 9,709,770
- Issue date Jul 18, 2017
- Carl Zeiss SMT GmbH
- Boris Bittner
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Reflective optical element
- Patent number 9,470,872
- Issue date Oct 18, 2016
- Carl Zeiss SMT GmbH
- Boris Bittner
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
MULTIPLE PARTICLE BEAM MICROSCOPE AND ASSOCIATED METHOD WITH FAST A...
- Publication number 20230245852
- Publication date Aug 3, 2023
- Carl Zeiss MultiSEM GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MEASURING AN EFFECT OF A WAVELENGTH-DEPENDENT MEASURING...
- Publication number 20220350258
- Publication date Nov 3, 2022
- Carl Zeiss SMT GMBH
- Walter Pauls
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR MEASURING A REFLECTIVITY OF AN OBJECT FOR MEASUREMENT LI...
- Publication number 20220236648
- Publication date Jul 28, 2022
- Carl Zeiss SMT GMBH
- Renzo Capelli
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING A REFLECTING OPTICAL ELEMENT OF A PROJECTION E...
- Publication number 20210157244
- Publication date May 27, 2021
- Carl Zeiss SMT GMBH
- Matthias KAES
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR CHANGING A SURFACE VIA PARTICLE IRRADIATION
- Publication number 20200012091
- Publication date Jan 9, 2020
- Carl Zeiss SMT GMBH
- Walter Pauls
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DEVICE FOR CHANGING A SURFACE SHAPE OF AN OPTICAL ELEMENT VIA ELECT...
- Publication number 20190018324
- Publication date Jan 17, 2019
- Carl Zeiss SMT GMBH
- Walter Pauls
- G02 - OPTICS
Information Patent Application
Projection Lens for EUV Microlithography, Film Element and Method f...
- Publication number 20170261730
- Publication date Sep 14, 2017
- Carl Zeiss SMT GMBH
- Boris Bittner
- G02 - OPTICS
Information Patent Application
MIRROR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE SYSTEM AND METHO...
- Publication number 20160161852
- Publication date Jun 9, 2016
- Carl Zeiss SMT GMBH
- Karl-Heinz SCHUSTER
- G02 - OPTICS
Information Patent Application
OPTICAL ASSEMBLY
- Publication number 20160091798
- Publication date Mar 31, 2016
- Carl Zeiss SMT GMBH
- Walter Pauls
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MIRROR ARRANGEMENT FOR AN EUV PROJECTION EXPOSURE APPARATUS, METHOD...
- Publication number 20150168674
- Publication date Jun 18, 2015
- Carl Zeiss SMT GMBH
- Boris Bittner
- G02 - OPTICS
Information Patent Application
Reflective Optical Element
- Publication number 20150116703
- Publication date Apr 30, 2015
- Carl Zeiss SMT GMBH
- Boris Bittner
- G02 - OPTICS
Information Patent Application
Projection Lens for EUV Microlithography, Film Element and Method f...
- Publication number 20140347721
- Publication date Nov 27, 2014
- Boris Bittner
- B82 - NANO-TECHNOLOGY

Walter Pauls

Person

Patents Grantslast 30 patents

Method for producing a reflecting optical element of a projection e...

Method for changing a surface via particle irradiation

Device for changing a surface shape of an optical element via elect...

Projection lens for EUV microlithography, film element and method f...

Optical assembly

Mirror arrangement for an EUV projection exposure apparatus, method...

Reflective optical element

Patents Applicationslast 30 patents

MULTIPLE PARTICLE BEAM MICROSCOPE AND ASSOCIATED METHOD WITH FAST A...

METHOD FOR MEASURING AN EFFECT OF A WAVELENGTH-DEPENDENT MEASURING...

METHOD FOR MEASURING A REFLECTIVITY OF AN OBJECT FOR MEASUREMENT LI...

METHOD FOR PRODUCING A REFLECTING OPTICAL ELEMENT OF A PROJECTION E...

METHOD FOR CHANGING A SURFACE VIA PARTICLE IRRADIATION

DEVICE FOR CHANGING A SURFACE SHAPE OF AN OPTICAL ELEMENT VIA ELECT...

Projection Lens for EUV Microlithography, Film Element and Method f...

MIRROR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE SYSTEM AND METHO...

OPTICAL ASSEMBLY

MIRROR ARRANGEMENT FOR AN EUV PROJECTION EXPOSURE APPARATUS, METHOD...

Reflective Optical Element

Projection Lens for EUV Microlithography, Film Element and Method f...