Waltraud Herbst

Person

Uttenreuth, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Apparatus and method for proof of outgassing products
- Patent number 7,078,709
- Issue date Jul 18, 2006
- Infineon Technologies AG
- Waltraud Herbst
- G01 - MEASURING TESTING
Information Patent Grant
Silicon-containing resist for photolithography
- Patent number 7,052,820
- Issue date May 30, 2006
- Infineon Technologies AG
- Jörg Rottstegge
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photoresists with reaction anchors for chemical consolidation of re...
- Patent number 7,033,740
- Issue date Apr 25, 2006
- Infineon Technologies AG
- Jörg Rottstegge
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for increasing the etch resistance and for reducing the hol...
- Patent number 7,018,784
- Issue date Mar 28, 2006
- Infineon Technologies AG
- Jörg Rottstegge
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for sidewall amplification of resist structures and for the...
- Patent number 6,893,972
- Issue date May 17, 2005
- Infineon Technologies AG
- Jörg Rottstegge
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Negative resist process with simultaneous development and silylation
- Patent number 6,770,423
- Issue date Aug 3, 2004
- Infineon Technologies AG
- Jörg Rottstegge
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Amplification of resist structures of fluorinated resist polymers b...
- Patent number 6,759,184
- Issue date Jul 6, 2004
- Infineon Technologies AG
- Jörg Rottstegge
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method for producing organic electroluminescent components
- Patent number 6,582,888
- Issue date Jun 24, 2003
- Siemens Aktiengesellschaft
- Waltraud Herbst
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Method for forming a lithography mask
- Publication number 20060105274
- Publication date May 18, 2006
- Karl Kragler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Apparatus and method for verification of outgassing products
- Publication number 20050109954
- Publication date May 26, 2005
- Waltraud Herbst
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Apparatus and method for proof of outgassing products
- Publication number 20050092936
- Publication date May 5, 2005
- Waltraud Herbst
- G01 - MEASURING TESTING
Information Patent Application
Process for increasing the etch resistance and for reducing the hol...
- Publication number 20040043330
- Publication date Mar 4, 2004
- Jorg Rottstegge
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Silicon-containing resist for photolithography
- Publication number 20030108812
- Publication date Jun 12, 2003
- Jorg Rottstegge
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Process for sidewall amplification of resist structures and for the...
- Publication number 20030091936
- Publication date May 15, 2003
- Jorg Rottstegge
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresists with reaction anchos for chemical consolidation of res...
- Publication number 20030087182
- Publication date May 8, 2003
- Jorg Rottstegge
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Negative resist process with simultaneous development and silylation
- Publication number 20030082488
- Publication date May 1, 2003
- Jorg Rottstegge
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Amplification of resist structures of fluorinated resist polymers b...
- Publication number 20030073043
- Publication date Apr 17, 2003
- Jorg Rottstegge
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Waltraud Herbst

Person

Patents Grantslast 30 patents

Apparatus and method for proof of outgassing products

Silicon-containing resist for photolithography

Photoresists with reaction anchors for chemical consolidation of re...

Process for increasing the etch resistance and for reducing the hol...

Process for sidewall amplification of resist structures and for the...

Negative resist process with simultaneous development and silylation

Amplification of resist structures of fluorinated resist polymers b...

Method for producing organic electroluminescent components

Patents Applicationslast 30 patents

Method for forming a lithography mask

Apparatus and method for verification of outgassing products

Apparatus and method for proof of outgassing products

Process for increasing the etch resistance and for reducing the hol...

Silicon-containing resist for photolithography

Process for sidewall amplification of resist structures and for the...

Photoresists with reaction anchos for chemical consolidation of res...

Negative resist process with simultaneous development and silylation

Amplification of resist structures of fluorinated resist polymers b...