Wan-Chun Pan

Person

Hsin-Chu, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Chemical mechanical planarization tool
- Patent number 12,030,159
- Issue date Jul 9, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tung-Kai Chen
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical planarization tool
- Patent number 11,712,778
- Issue date Aug 1, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tung-Kai Chen
- G01 - MEASURING TESTING
Information Patent Grant
Methods for reducing scratch defects in chemical mechanical planari...
- Patent number 10,522,365
- Issue date Dec 31, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wan-Chun Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for CMP station cleanliness
- Patent number 9,592,585
- Issue date Mar 14, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuo-Yin Lin
- B24 - GRINDING POLISHING
Information Patent Grant
Methods of manufacturing a semiconductor device
- Patent number 9,508,716
- Issue date Nov 29, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Cheng-Tung Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices comprising a fin
- Patent number 9,153,657
- Issue date Oct 6, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chi-Yuan Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for forming a CMOS device
- Patent number 9,064,959
- Issue date Jun 23, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Li-Ting Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for wet clean of oxide layers over epitaxial layers
- Patent number 9,048,087
- Issue date Jun 2, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Li-Lan Wu
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Semiconductor devices and methods of manufacture thereof
- Patent number 8,889,497
- Issue date Nov 18, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chi-Yuan Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical mechanical polish in the growth of semiconductor regions
- Patent number 8,853,083
- Issue date Oct 7, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuo-Yin Lin
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
HIGH-K ISOLATION OF FIN STRUCTURES
- Publication number 20240429312
- Publication date Dec 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kang Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR REDUCING SCRATCH DEFECTS IN CHEMICAL MECHANICAL PLANARI...
- Publication number 20240387187
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wan-Chun Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR REDUCING SCRATCH DEFECTS IN CHEMICAL MECHANICAL PLANARI...
- Publication number 20230377898
- Publication date Nov 23, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wan-Chun Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Chemical Mechanical Planarization Tool
- Publication number 20230321789
- Publication date Oct 12, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tung-Kai Chen
- B24 - GRINDING POLISHING
Information Patent Application
CHEMICAL MECHANICAL PLANARIZATION TOOL
- Publication number 20210053184
- Publication date Feb 25, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tung-Kai Chen
- G01 - MEASURING TESTING
Information Patent Application
Methods for Reducing Scratch Defects in Chemical Mechanical Planari...
- Publication number 20200126803
- Publication date Apr 23, 2020
- Taiwan Semiconductor Manufacturing Co., LTD
- Wan-Chun Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for Reducing Scratch Defects in Chemical Mechanical Planari...
- Publication number 20170213743
- Publication date Jul 27, 2017
- Taiwan Semiconductor Manufacturing Co., LTD
- Wan-Chun Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICES COMPRISING A FIN
- Publication number 20150028389
- Publication date Jan 29, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chi-Yuan Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Devices and Methods of Manufacture Thereof
- Publication number 20140273366
- Publication date Sep 18, 2014
- Cheng-Tung Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for Wet Clean of Oxide Layers over Epitaxial Layers
- Publication number 20140273412
- Publication date Sep 18, 2014
- Li-Lan Wu
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method and Apparatus for Forming a CMOS Device
- Publication number 20140264362
- Publication date Sep 18, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Li-Ting Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Chemical Mechanical Polish in the Growth of Semiconductor Regions
- Publication number 20140206164
- Publication date Jul 24, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuo-Yin Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and Method for CMP Station Cleanliness
- Publication number 20140182633
- Publication date Jul 3, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuo-Yin Lin
- B24 - GRINDING POLISHING
Information Patent Application
Semiconductor Devices and Methods of Manufacture Thereof
- Publication number 20140183633
- Publication date Jul 3, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chi-Yuan Chen
- H01 - BASIC ELECTRIC ELEMENTS

Wan-Chun Pan

Person

Patents Grantslast 30 patents

Chemical mechanical planarization tool

Chemical mechanical planarization tool

Methods for reducing scratch defects in chemical mechanical planari...

System and method for CMP station cleanliness

Methods of manufacturing a semiconductor device

Semiconductor devices comprising a fin

Method and apparatus for forming a CMOS device

Methods for wet clean of oxide layers over epitaxial layers

Semiconductor devices and methods of manufacture thereof

Chemical mechanical polish in the growth of semiconductor regions

Patents Applicationslast 30 patents

HIGH-K ISOLATION OF FIN STRUCTURES

METHODS FOR REDUCING SCRATCH DEFECTS IN CHEMICAL MECHANICAL PLANARI...

METHODS FOR REDUCING SCRATCH DEFECTS IN CHEMICAL MECHANICAL PLANARI...

Chemical Mechanical Planarization Tool

CHEMICAL MECHANICAL PLANARIZATION TOOL

Methods for Reducing Scratch Defects in Chemical Mechanical Planari...

Methods for Reducing Scratch Defects in Chemical Mechanical Planari...

SEMICONDUCTOR DEVICES COMPRISING A FIN

Semiconductor Devices and Methods of Manufacture Thereof

Methods for Wet Clean of Oxide Layers over Epitaxial Layers

Method and Apparatus for Forming a CMOS Device

Chemical Mechanical Polish in the Growth of Semiconductor Regions

System and Method for CMP Station Cleanliness

Semiconductor Devices and Methods of Manufacture Thereof