Wan-Lin Chen

Person

Sunnyvale, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Fabrication of a silicon structure and deep silicon etch with profi...
- Patent number 9,865,472
- Issue date Jan 9, 2018
- Lam Research Corporation
- Robert Chebi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fabrication of a silicon structure and deep silicon etch with profi...
- Patent number 9,330,926
- Issue date May 3, 2016
- Lam Research Corporation
- Robert Chebi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reduction of feature critical dimensions
- Patent number 7,541,291
- Issue date Jun 2, 2009
- Lam Research Corporation
- Sean S. Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma in-situ treatment of chemically amplified resist
- Patent number 7,347,915
- Issue date Mar 25, 2008
- Lam Research Corporation
- Douglas L. Keil
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reduction of feature critical dimensions
- Patent number 7,250,371
- Issue date Jul 31, 2007
- Lam Research Corporation
- Sean S. Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for protecting silicon or silicon carbide electrode surface...
- Patent number 7,226,869
- Issue date Jun 5, 2007
- Lam Research Corporation
- Kenji Takeshita
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
In-situ plug fill
- Patent number 7,192,531
- Issue date Mar 20, 2007
- Lam Research Corporation
- Sean S. Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma in-situ treatment of chemically amplified resist
- Patent number 7,022,611
- Issue date Apr 4, 2006
- Lam Research Corporation
- Douglas L. Keil
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Post-development treatment of patterned photoresist to promote cros...
- Patent number 6,780,569
- Issue date Aug 24, 2004
- Lam Research Corporation
- Eric Hudson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
FABRICATION OF A SILICON STRUCTURE AND DEEP SILICON ETCH WITH PROFI...
- Publication number 20160233102
- Publication date Aug 11, 2016
- LAM RESEARCH CORPORATION
- Robert CHEBI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FABRICATION OF A SILICON STRUCTURE AND DEEP SILICON ETCH WITH PROFI...
- Publication number 20090184089
- Publication date Jul 23, 2009
- LAM RESEARCH CORPORATION
- Robert CHEBI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Reduction of feature critical dimensions
- Publication number 20070293050
- Publication date Dec 20, 2007
- Lam Research Corporation
- Sean S. Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for protecting silicon or silicon carbide electrode surface...
- Publication number 20060091104
- Publication date May 4, 2006
- Kenji Takeshita
- B08 - CLEANING
Information Patent Application
Reduction of feature critical dimensions
- Publication number 20050048785
- Publication date Mar 3, 2005
- Lam Research Corporation
- Sean S. Kang
- H01 - BASIC ELECTRIC ELEMENTS

Wan-Lin Chen

Person

Patents Grantslast 30 patents

Fabrication of a silicon structure and deep silicon etch with profi...

Fabrication of a silicon structure and deep silicon etch with profi...

Reduction of feature critical dimensions

Plasma in-situ treatment of chemically amplified resist

Reduction of feature critical dimensions

Methods for protecting silicon or silicon carbide electrode surface...

In-situ plug fill

Plasma in-situ treatment of chemically amplified resist

Post-development treatment of patterned photoresist to promote cros...

Patents Applicationslast 30 patents

FABRICATION OF A SILICON STRUCTURE AND DEEP SILICON ETCH WITH PROFI...

FABRICATION OF A SILICON STRUCTURE AND DEEP SILICON ETCH WITH PROFI...

Reduction of feature critical dimensions

Methods for protecting silicon or silicon carbide electrode surface...

Reduction of feature critical dimensions