Wanjuan Zhang

Follow

Person

Shanghai, CN

People

Patents Grantslast 30 patents

Information Patent Grant
Mask and method for correcting mask patterns
- Patent number 11,520,225
- Issue date Dec 6, 2022
- Semiconductor Manufacturing International (Shanghai) Corporation
- Feng Bai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of detecting a scattering bar by simulation
- Patent number 9,256,703
- Issue date Feb 9, 2016
- Semiconductor Manufacturing International (Beijing) Corporation
- Wanjuan Zhang
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
MASK AND METHOD FOR CORRECTING MASK PATTERNS
- Publication number 20210208499
- Publication date Jul 8, 2021
- Semiconductor Manufacturing International (Shanghai) Corporation
- Feng BAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY