Ward Johnson

Person

Gilbert, AZ, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method of forming an electrode on a substrate and a semiconductor d...
- Patent number 12,020,938
- Issue date Jun 25, 2024
- ASM IP Holding B.V.
- Moataz Bellah Mousa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer handling chamber with moisture reduction
- Patent number 11,837,483
- Issue date Dec 5, 2023
- ASM IP Holding B.V.
- Petri Raisanen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for depositing a material film on a substrate within a react...
- Patent number 11,501,973
- Issue date Nov 15, 2022
- ASM IP Holding B.V.
- Petri Raisanen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming an electrode on a substrate and a semiconductor d...
- Patent number 11,398,382
- Issue date Jul 26, 2022
- ASM IP Holding B.V.
- Moataz Bellah Mousa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer handling chamber with moisture reduction
- Patent number 11,270,899
- Issue date Mar 8, 2022
- ASM IP Holding B.V.
- Petri Raisanen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a doped metal carbide film on a substrate and rel...
- Patent number 11,056,567
- Issue date Jul 6, 2021
- ASM IP Holding B.V.
- Dong Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for depositing a material film on a substrate within a react...
- Patent number 10,872,771
- Issue date Dec 22, 2020
- ASM IP Holding B.V.
- Petri Raisanen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming an electrode on a substrate and a semiconductor d...
- Patent number 10,847,371
- Issue date Nov 24, 2020
- ASM IP Holding B.V.
- Moataz Bellah Mousa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas distribution device for a wafer processing apparatus
- Patent number 10,829,852
- Issue date Nov 10, 2020
- ASM IP Holding B.V.
- Petri Raisanen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF FORMING AN ELECTRODE ON A SUBSTRATE AND A SEMICONDUCTOR D...
- Publication number 20220351974
- Publication date Nov 3, 2022
- ASM IP HOLDING B.V.
- Moataz Bellah Mousa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER HANDLING CHAMBER WITH MOISTURE REDUCTION
- Publication number 20220165595
- Publication date May 26, 2022
- ASM IP HOLDING B.V.
- Petri Raisanen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR DEPOSITING A TITANIUM ALUMINUM CARBIDE FILM STRUCTURE O...
- Publication number 20220051895
- Publication date Feb 17, 2022
- ASM IP HOLDING B.V.
- Petri Raisanen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING A DOPED METAL CARBIDE FILM ON A SUBSTRATE AND RE...
- Publication number 20210328036
- Publication date Oct 21, 2021
- ASM IP HOLDING B.V.
- Dong Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR DEPOSITING A MATERIAL FILM ON A SUBSTRATE WITHIN A REACT...
- Publication number 20210066084
- Publication date Mar 4, 2021
- ASM IP HOLDING B.V.
- Petri Raisanen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF FORMING AN ELECTRODE ON A SUBSTRATE AND A SEMICONDUCTOR D...
- Publication number 20210028021
- Publication date Jan 28, 2021
- ASM IP HOLDING B.V.
- Moataz Bellah Mousa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS DISTRIBUTION DEVICE FOR A WAFER PROCESSING APPARATUS
- Publication number 20200056282
- Publication date Feb 20, 2020
- ASM IP HOLDING B.V.
- Petri Raisanen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
WAFER HANDLING CHAMBER WITH MOISTURE REDUCTION
- Publication number 20190371640
- Publication date Dec 5, 2019
- ASM IP HOLDING B.V.
- Petri Raisanen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING A DOPED METAL CARBIDE FILM ON A SUBSTRATE AND REL...
- Publication number 20190348515
- Publication date Nov 14, 2019
- ASM IP HOLDING B.V.
- Dong Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING AN ELECTRODE ON A SUBSTRATE AND A SEMICONDUCTOR D...
- Publication number 20190304790
- Publication date Oct 3, 2019
- ASM IP HOLDING B.V.
- Moataz Bellah Mousa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR DEPOSITING A MATERIAL FILM ON A SUBSTRATE WITHIN A REACT...
- Publication number 20190221433
- Publication date Jul 18, 2019
- ASM IP HOLDING B.V.
- Petri Raisanen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Ward Johnson

Person

Patents Grantslast 30 patents

Method of forming an electrode on a substrate and a semiconductor d...

Wafer handling chamber with moisture reduction

Method for depositing a material film on a substrate within a react...

Method of forming an electrode on a substrate and a semiconductor d...

Wafer handling chamber with moisture reduction

Method of forming a doped metal carbide film on a substrate and rel...

Method for depositing a material film on a substrate within a react...

Method of forming an electrode on a substrate and a semiconductor d...

Gas distribution device for a wafer processing apparatus

Patents Applicationslast 30 patents

METHOD OF FORMING AN ELECTRODE ON A SUBSTRATE AND A SEMICONDUCTOR D...

WAFER HANDLING CHAMBER WITH MOISTURE REDUCTION

METHODS FOR DEPOSITING A TITANIUM ALUMINUM CARBIDE FILM STRUCTURE O...

METHOD FOR FORMING A DOPED METAL CARBIDE FILM ON A SUBSTRATE AND RE...

METHOD FOR DEPOSITING A MATERIAL FILM ON A SUBSTRATE WITHIN A REACT...

METHOD OF FORMING AN ELECTRODE ON A SUBSTRATE AND A SEMICONDUCTOR D...

GAS DISTRIBUTION DEVICE FOR A WAFER PROCESSING APPARATUS

WAFER HANDLING CHAMBER WITH MOISTURE REDUCTION

METHOD OF FORMING A DOPED METAL CARBIDE FILM ON A SUBSTRATE AND REL...

METHOD OF FORMING AN ELECTRODE ON A SUBSTRATE AND A SEMICONDUCTOR D...

METHOD FOR DEPOSITING A MATERIAL FILM ON A SUBSTRATE WITHIN A REACT...