Wataru Ishii

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Hadano, JP

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Patents Grantslast 30 patents

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Undercoating material for photosensitive resins
- Patent number 4,902,770
- Issue date Feb 20, 1990
- Tokyo Ohka Kogyo Co., Ltd.
- Wataru Ishii
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative-working photosensitive composition comprising a diphenylam...
- Patent number 4,737,438
- Issue date Apr 12, 1988
- Tokyo Ohka Kogyo Co., Ltd.
- Naoki Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of preparing photoresist material with undercoating of photo...
- Patent number 4,702,992
- Issue date Oct 27, 1987
- Tokyo Ohka Kogyo Co., Ltd.
- Wataru Ishii
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for fine pattern formation on a photoresist
- Patent number 4,590,149
- Issue date May 20, 1986
- Tokyo Ohka Kogyo Co., Ltd.
- Hisashi Nakane
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for fine pattern formation on a photoresist
- Patent number 4,588,675
- Issue date May 13, 1986
- Tok Yo Ohka Kogyo Co., Ltd.
- Hisashi Nakane
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY