Wataru Kusaki

Person

Nakakubiki-gun, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method for producing substrate for making microarray
- Patent number 9,410,951
- Issue date Aug 9, 2016
- Shin-Etsu Chemical Co., Ltd.
- Wataru Kusaki
- G01 - MEASURING TESTING
Information Patent Grant
Method for producing molecule immobilizing substrate, and molecule...
- Patent number 9,034,661
- Issue date May 19, 2015
- Shin-Etsu Chemical Co., Ltd.
- Wataru Kusaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive resist compositions and patterning process
- Patent number 8,541,158
- Issue date Sep 24, 2013
- Shin-Etsu Chemical Co., Ltd.
- Wataru Kusaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for producing hollow structure
- Patent number 8,367,311
- Issue date Feb 5, 2013
- Shin-Etsu Chemical Co., Ltd.
- Wataru Kusaki
- B32 - LAYERED PRODUCTS
Information Patent Grant
Method for manufacturing substrate for making microarray
- Patent number 8,148,053
- Issue date Apr 3, 2012
- Shin-Etsu Chemical Co., Ltd.
- Wataru Kusaki
- G01 - MEASURING TESTING
Information Patent Grant
Method for manufacturing substrate for making microarray
- Patent number 8,053,179
- Issue date Nov 8, 2011
- Shin-Etsu Chemical Co., Ltd.
- Wataru Kusaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process
- Patent number 7,771,914
- Issue date Aug 10, 2010
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Nitrogen-containing organic compound, resist composition and patter...
- Patent number 7,629,108
- Issue date Dec 8, 2009
- Shin-Etsu Chemical Co., Ltd.
- Takeru Watanabe
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polymer, resist composition, and patterning process
- Patent number 7,537,880
- Issue date May 26, 2009
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and patterning process
- Patent number 7,514,204
- Issue date Apr 7, 2009
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Negative resist material and pattern formation method using the same
- Patent number 6,861,198
- Issue date Mar 1, 2005
- Shin-Etsu Chemical Co., Ltd.
- Takanobu Takeda
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Chemical amplification resist compositions
- Patent number 6,737,214
- Issue date May 18, 2004
- Shin-Etsu Chemical Co., Ltd.
- Takanobu Takeda
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition and patterning process
- Patent number 6,641,975
- Issue date Nov 4, 2003
- Shin-Etsu Chemical Co., Ltd.
- Takanobu Takeda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Onium salts, photoacid generators for resist compositions, resist c...
- Patent number 6,440,634
- Issue date Aug 27, 2002
- Shin-Etsu Chemical Co., Ltd.
- Youichi Ohsawa
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
POSITIVE RESIST COMPOSITIONS AND PATTERNING PROCESS
- Publication number 20110183262
- Publication date Jul 28, 2011
- Wataru Kusaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING HOLLOW STRUCTURE
- Publication number 20110123935
- Publication date May 26, 2011
- Shin-Etsu Chemical Co., Ltd.
- Wataru Kusaki
- B32 - LAYERED PRODUCTS
Information Patent Application
METHOD FOR PRODUCING MOLECULE IMMOBILIZING SUBSTRATE, AND MOLECULE...
- Publication number 20100233827
- Publication date Sep 16, 2010
- Shin-Etsu Chemical Co., Ltd.
- Wataru KUSAKI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Method for producing substrate for making microarray
- Publication number 20100055337
- Publication date Mar 4, 2010
- Shin-Etsu Chemical Co., Ltd.
- Wataru Kusaki
- C40 - COMBINATORIAL CHEMISTRY
Information Patent Application
Method for manufacturing substrate for microarray
- Publication number 20080233292
- Publication date Sep 25, 2008
- Shin-Etsu Chemical Co., Ltd.
- Wataru Kusaki
- G01 - MEASURING TESTING
Information Patent Application
Method for manufacturing substrate for making microarray
- Publication number 20080233521
- Publication date Sep 25, 2008
- Shin-Etsu Chemical Co., Ltd.
- Wataru Kusaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for manufacturing substrate for making microarray
- Publication number 20080233309
- Publication date Sep 25, 2008
- Shin-Etsu Chemical Co., Ltd.
- Wataru Kusaki
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
Method for manufacturing substrate for making microarray
- Publication number 20080233409
- Publication date Sep 25, 2008
- Shin-Etsu Chemical Co., Ltd.
- Wataru Kusaki
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
Polymer, resist composition, and patterning process
- Publication number 20080118860
- Publication date May 22, 2008
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Nitrogen-containing organic compound, resist composition and patter...
- Publication number 20080102405
- Publication date May 1, 2008
- Shin-Etsu Chemical Co., Ltd.
- Takeru Watanabe
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Resist composition and patterning process
- Publication number 20080096131
- Publication date Apr 24, 2008
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20080090172
- Publication date Apr 17, 2008
- Shin-Etsu Chemical Co., Ltd.
- Jun HATAKEYAMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
- Publication number 20080090173
- Publication date Apr 17, 2008
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Negative resist material and pattern formation method using the same
- Publication number 20040023151
- Publication date Feb 5, 2004
- Shin-Etsu Chemical Co., Ltd.
- Takanobu Takeda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist composition and patterning process
- Publication number 20020039701
- Publication date Apr 4, 2002
- Shin-Etsu Chemical Co., Ltd.
- Takanobu Takeda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Chemical amplification resist compositions
- Publication number 20010031421
- Publication date Oct 18, 2001
- Takanobu Takeda
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Wataru Kusaki

Person

Patents Grantslast 30 patents

Method for producing substrate for making microarray

Method for producing molecule immobilizing substrate, and molecule...

Positive resist compositions and patterning process

Method for producing hollow structure

Method for manufacturing substrate for making microarray

Method for manufacturing substrate for making microarray

Resist composition and patterning process

Nitrogen-containing organic compound, resist composition and patter...

Polymer, resist composition, and patterning process

Resist composition and patterning process

Negative resist material and pattern formation method using the same

Chemical amplification resist compositions

Resist composition and patterning process

Onium salts, photoacid generators for resist compositions, resist c...

Patents Applicationslast 30 patents

POSITIVE RESIST COMPOSITIONS AND PATTERNING PROCESS

METHOD FOR PRODUCING HOLLOW STRUCTURE

METHOD FOR PRODUCING MOLECULE IMMOBILIZING SUBSTRATE, AND MOLECULE...

Method for producing substrate for making microarray

Method for manufacturing substrate for microarray

Method for manufacturing substrate for making microarray

Method for manufacturing substrate for making microarray

Method for manufacturing substrate for making microarray

Polymer, resist composition, and patterning process

Nitrogen-containing organic compound, resist composition and patter...

Resist composition and patterning process

RESIST COMPOSITION AND PATTERNING PROCESS

POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS

Negative resist material and pattern formation method using the same

Resist composition and patterning process

Chemical amplification resist compositions