Wataru SHIBAYAMA

Person

Toyama-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Film-forming composition
- Patent number 12,227,621
- Issue date Feb 18, 2025
- NISSAN CHEMICAL CORPORATION
- Wataru Shibayama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Coating composition for pattern inversion
- Patent number 12,084,592
- Issue date Sep 10, 2024
- NISSAN CHEMICAL CORPORATION
- Hiroaki Yaguchi
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Semiconductor device production method employing silicon-containing...
- Patent number 11,966,164
- Issue date Apr 23, 2024
- NISSAN CHEMICAL CORPORATION
- Wataru Shibayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming silicon-containing resist underlayer film r...
- Patent number 11,815,815
- Issue date Nov 14, 2023
- Nissan Chemical Industries, Ltd.
- Hiroyuki Wakayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radiation sensitive composition
- Patent number 11,561,472
- Issue date Jan 24, 2023
- Nissan Chemical Industries, Ltd.
- Makoto Nakajima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for producing resist pattern coating composition with use of...
- Patent number 11,531,269
- Issue date Dec 20, 2022
- NISSAN CHEMICAL CORPORATION
- Shuhei Shigaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist underlayer film forming composition containing silicone havi...
- Patent number 11,392,037
- Issue date Jul 19, 2022
- Nissan Chemical Industries, Ltd.
- Makoto Nakajima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alkaline developer soluable silicon-containing resist underlayer fi...
- Patent number 11,281,104
- Issue date Mar 22, 2022
- NISSAN CHEMICAL CORPORATION
- Wataru Shibayama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Substrate treating composition and method for fabricating a semicon...
- Patent number 11,215,927
- Issue date Jan 4, 2022
- Samsung Electronics Co., Ltd.
- Ju-Young Kim
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Silicon-containing resist underlayer film-forming composition havin...
- Patent number 11,175,583
- Issue date Nov 16, 2021
- Nissan Chemical Industries, Ltd.
- Makoto Nakajima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon-containing resist underlayer film-forming composition havin...
- Patent number 11,022,884
- Issue date Jun 1, 2021
- Nissan Chemical Industries, Ltd.
- Wataru Shibayama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist underlayer film forming composition for lithography containi...
- Patent number 10,838,303
- Issue date Nov 17, 2020
- Nissan Chemical Industries, Ltd.
- Wataru Shibayama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Isocyanuric acid derivative having alkoxyalkyl groups and method fo...
- Patent number 10,676,491
- Issue date Jun 9, 2020
- NISSAN CHEMICAL CORPORATION
- Shun Kubodera
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Silicon-containing EUV resist underlayer film-forming composition c...
- Patent number 10,613,440
- Issue date Apr 7, 2020
- Nissan Chemical Industries, Ltd.
- Wataru Shibayama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition for coating resist pattern
- Patent number 10,558,119
- Issue date Feb 11, 2020
- Nissan Chemical Industries, Ltd.
- Wataru Shibayama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist underlayer film forming composition for lithography containi...
- Patent number 10,372,040
- Issue date Aug 6, 2019
- Nissan Chemical Industries, Ltd.
- Wataru Shibayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silicon-containing resists underlayer film-forming composition havi...
- Patent number 10,197,917
- Issue date Feb 5, 2019
- Nissan Chemical Industries, Ltd.
- Makoto Nakajima
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Coating composition for pattern reversal on soc pattern
- Patent number 10,139,729
- Issue date Nov 27, 2018
- Nissan Chemical Industries, Ltd.
- Hiroaki Yaguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silicon-containing resist underlayer film-forming composition havin...
- Patent number 10,082,735
- Issue date Sep 25, 2018
- Nissan Chemical Industries, Ltd.
- Wataru Shibayama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Silicon-containing resist underlayer film forming composition havin...
- Patent number 9,760,006
- Issue date Sep 12, 2017
- Nissan Chemical Industries, Ltd.
- Makoto Nakajima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metal-containing resist underlayer film-forming composition contain...
- Patent number 9,725,618
- Issue date Aug 8, 2017
- Nissan Chemical Industries, Ltd.
- Makoto Nakajima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silicon-containing EUV resist underlayer film-forming composition i...
- Patent number 9,627,217
- Issue date Apr 18, 2017
- Nissan Chemical Industries, Ltd.
- Shuhei Shigaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist underlayer film forming composition containing silicon havin...
- Patent number 9,217,921
- Issue date Dec 22, 2015
- Nissan Chemical Industries, Ltd.
- Yuta Kanno
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist underlayer film forming composition containing silicon havin...
- Patent number 9,023,588
- Issue date May 5, 2015
- Nissan Chemical Industries, Ltd.
- Makoto Nakajima
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist underlayer film forming composition containing silicone havi...
- Patent number 8,864,894
- Issue date Oct 21, 2014
- Nissan Chemical Industries, Ltd.
- Wataru Shibayama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist underlayer film forming composition containing silicon havin...
- Patent number 8,835,093
- Issue date Sep 16, 2014
- Nissan Chemical Industries, Ltd.
- Wataru Shibayama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Silicon-containing composition having sulfonamide group for forming...
- Patent number 8,828,879
- Issue date Sep 9, 2014
- Nissan Chemical Industries, Ltd.
- Yuta Kanno
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist underlayer film forming composition containing silicon havin...
- Patent number 8,815,494
- Issue date Aug 26, 2014
- Nissan Chemical Industries, Ltd.
- Wataru Shibayama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist underlayer film forming composition containing polymer havin...
- Patent number 8,426,112
- Issue date Apr 23, 2013
- Nissan Chemical Industries, Ltd.
- Makoto Nakajima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
SILICON-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION
- Publication number 20250044692
- Publication date Feb 6, 2025
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM H...
- Publication number 20250044697
- Publication date Feb 6, 2025
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ADDITIVE-CONTAINING SILICON-CONTAINING RESIST UNDERLAYER FILM FORMI...
- Publication number 20240419073
- Publication date Dec 19, 2024
- NISSAN CHEMICAL CORPORATION
- Shuhei SHIGAKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SILICON-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION, LAMI...
- Publication number 20240393693
- Publication date Nov 28, 2024
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PRIMER FOR SEMICONDUCTOR SUBSTRATE AND METHOD FOR FORMING A PATTERN
- Publication number 20240385521
- Publication date Nov 21, 2024
- NISSAN CHEMICAL CORPORATION
- Shuhei SHIGAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION AND S...
- Publication number 20240377745
- Publication date Nov 14, 2024
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM
- Publication number 20240295819
- Publication date Sep 5, 2024
- NISSAN CHEMICAL CORPORATION
- Satoshi TAKEDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION
- Publication number 20240295815
- Publication date Sep 5, 2024
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM
- Publication number 20240231230
- Publication date Jul 11, 2024
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM
- Publication number 20240201593
- Publication date Jun 20, 2024
- NISSAN CHEMICAL CORPORATION
- Satoshi TAKEDA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SUBSTRATE WITH THIN FILM, AND SEMICONDUCTOR SUBSTRATE
- Publication number 20240162086
- Publication date May 16, 2024
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR RESIST UNDERLYING FILM FORMATION
- Publication number 20240069441
- Publication date Feb 29, 2024
- NISSAN CHEMICAL CORPORATION
- Satoshi TAKEDA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
FILM-FORMING COMPOSITION
- Publication number 20230176481
- Publication date Jun 8, 2023
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR FORMING RESIST UNDERLYING FILM
- Publication number 20230168582
- Publication date Jun 1, 2023
- NISSAN CHEMICAL CORPORATION
- Shuhei SHIGAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM-FORMING COMPOSITION
- Publication number 20230152700
- Publication date May 18, 2023
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM-FORMING COMPOSITION
- Publication number 20230152699
- Publication date May 18, 2023
- NISSAN CHEMICAL CORPORATION
- Kodai KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADIATION SENSITIVE COMPOSITION
- Publication number 20230125270
- Publication date Apr 27, 2023
- Nissan Chemical Industries, Ltd.
- Makoto NAKAJIMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOSITION FOR FORMING PHOTOCURABLE SILICON-CONTAINING COATING FILM
- Publication number 20230112897
- Publication date Apr 13, 2023
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION INCLU...
- Publication number 20220373888
- Publication date Nov 24, 2022
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR RESIST PATTERN METALLIZATION PROCESS
- Publication number 20220206395
- Publication date Jun 30, 2022
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FILM-FORMING COMPOSITION
- Publication number 20220187709
- Publication date Jun 16, 2022
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM-FORMING COMPOSITION
- Publication number 20220177653
- Publication date Jun 9, 2022
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ALKALINE DEVELOPER SOLUABLE SILICON-CONTAINING RESIST UNDERLAYER FI...
- Publication number 20220155688
- Publication date May 19, 2022
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
FILM FORMING COMPOSITION
- Publication number 20220100092
- Publication date Mar 31, 2022
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SUBSTRATE TREATING COMPOSITION AND METHOD FOR FABRICATING A SEMICON...
- Publication number 20220057715
- Publication date Feb 24, 2022
- Samsung Electronics Co., Ltd.
- JU-YOUNG KIM
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
FILM-FORMING COMPOSITION
- Publication number 20210395462
- Publication date Dec 23, 2021
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE PRODUCTION METHOD EMPLOYING SILICON-CONTAINING...
- Publication number 20210181635
- Publication date Jun 17, 2021
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PRIMER FOR SEMICONDUCTOR SUBSTRATE AND METHOD FOR FORMING A PATTERN
- Publication number 20210124266
- Publication date Apr 29, 2021
- NISSAN CHEMICAL CORPORATION
- Shuhei SHIGAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR FORMING PHOTOCURABLE SILICON-CONTAINING COATING FILM
- Publication number 20210054231
- Publication date Feb 25, 2021
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION WHICH...
- Publication number 20210018840
- Publication date Jan 21, 2021
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Wataru SHIBAYAMA

Person

Patents Grantslast 30 patents

Film-forming composition

Coating composition for pattern inversion

Semiconductor device production method employing silicon-containing...

Composition for forming silicon-containing resist underlayer film r...

Radiation sensitive composition

Method for producing resist pattern coating composition with use of...

Resist underlayer film forming composition containing silicone havi...

Alkaline developer soluable silicon-containing resist underlayer fi...

Substrate treating composition and method for fabricating a semicon...

Silicon-containing resist underlayer film-forming composition havin...

Silicon-containing resist underlayer film-forming composition havin...

Resist underlayer film forming composition for lithography containi...

Isocyanuric acid derivative having alkoxyalkyl groups and method fo...

Silicon-containing EUV resist underlayer film-forming composition c...

Composition for coating resist pattern

Resist underlayer film forming composition for lithography containi...

Silicon-containing resists underlayer film-forming composition havi...

Coating composition for pattern reversal on soc pattern

Silicon-containing resist underlayer film-forming composition havin...

Silicon-containing resist underlayer film forming composition havin...

Metal-containing resist underlayer film-forming composition contain...

Silicon-containing EUV resist underlayer film-forming composition i...

Resist underlayer film forming composition containing silicon havin...

Resist underlayer film forming composition containing silicon havin...

Resist underlayer film forming composition containing silicone havi...

Resist underlayer film forming composition containing silicon havin...

Silicon-containing composition having sulfonamide group for forming...

Resist underlayer film forming composition containing silicon havin...

Resist underlayer film forming composition containing polymer havin...

Patents Applicationslast 30 patents

SILICON-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION

COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM H...

ADDITIVE-CONTAINING SILICON-CONTAINING RESIST UNDERLAYER FILM FORMI...

SILICON-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION, LAMI...

PRIMER FOR SEMICONDUCTOR SUBSTRATE AND METHOD FOR FORMING A PATTERN

SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION AND S...

COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM

SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION

COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM

COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM

SUBSTRATE WITH THIN FILM, AND SEMICONDUCTOR SUBSTRATE

COMPOSITION FOR RESIST UNDERLYING FILM FORMATION

FILM-FORMING COMPOSITION

COMPOSITION FOR FORMING RESIST UNDERLYING FILM

FILM-FORMING COMPOSITION

FILM-FORMING COMPOSITION

RADIATION SENSITIVE COMPOSITION

COMPOSITION FOR FORMING PHOTOCURABLE SILICON-CONTAINING COATING FILM

SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION INCLU...

COMPOSITION FOR RESIST PATTERN METALLIZATION PROCESS

FILM-FORMING COMPOSITION

FILM-FORMING COMPOSITION

ALKALINE DEVELOPER SOLUABLE SILICON-CONTAINING RESIST UNDERLAYER FI...

FILM FORMING COMPOSITION

SUBSTRATE TREATING COMPOSITION AND METHOD FOR FABRICATING A SEMICON...

FILM-FORMING COMPOSITION

SEMICONDUCTOR DEVICE PRODUCTION METHOD EMPLOYING SILICON-CONTAINING...

PRIMER FOR SEMICONDUCTOR SUBSTRATE AND METHOD FOR FORMING A PATTERN

COMPOSITION FOR FORMING PHOTOCURABLE SILICON-CONTAINING COATING FILM

SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION WHICH...