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Wataru TAKAYAMA

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  • Miyagi, JP
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Patents Grantslast 30 patents

  • Information Patent Grant

    Plasma processing method and plasma processing apparatus
    • Patent number 10,867,777
    • Issue date Dec 15, 2020
    • Tokyo Electron Limited
    • Wataru Takayama
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Plasma etching method
    • Patent number 10,707,090
    • Issue date Jul 7, 2020
    • Tokyo Electron Limited
    • Wataru Takayama
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Etching process method
    • Patent number 10,692,729
    • Issue date Jun 23, 2020
    • Tokyo Electron Limited
    • Jin Kudo
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Plasma etching method
    • Patent number 9,966,273
    • Issue date May 8, 2018
    • Tokyo Electron Limited
    • Wataru Takayama
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Etching method
    • Patent number 9,779,961
    • Issue date Oct 3, 2017
    • Tokyo Electron Limited
    • Yusuke Saitoh
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Etching method
    • Patent number 9,666,446
    • Issue date May 30, 2017
    • Tokyo Electron Limited
    • Sho Tominaga
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Method of manufacturing semiconductor device
    • Patent number 9,230,824
    • Issue date Jan 5, 2016
    • Tokyo Electron Limited
    • Wataru Takayama
    • H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

  • Information Patent Application

    PLASMA PROCESSING APPARATUS AND METHOD OF TRANSFERRING WORKPIECE
    • Publication number 20190304824
    • Publication date Oct 3, 2019
    • TOKYO ELECTRON LIMITED
    • Takayuki SUZUKI
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
    • Publication number 20190279850
    • Publication date Sep 12, 2019
    • TOKYO ELECTRON LIMITED
    • Wataru Takayama
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA ETCHING METHOD
    • Publication number 20180226264
    • Publication date Aug 9, 2018
    • TOKYO ELECTRON LIMITED
    • Wataru TAKAYAMA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    ETCHING PROCESS METHOD
    • Publication number 20170372916
    • Publication date Dec 28, 2017
    • TOKYO ELECTRON LIMITED
    • Jin KUDO
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA ETCHING METHOD
    • Publication number 20170162399
    • Publication date Jun 8, 2017
    • TOKYO ELECTRON LIMITED
    • Wataru TAKAYAMA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    ETCHING METHOD
    • Publication number 20160314986
    • Publication date Oct 27, 2016
    • TOKYO ELECTRON LIMITED
    • Sho TOMINAGA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    ETCHING METHOD
    • Publication number 20160064245
    • Publication date Mar 3, 2016
    • TOKYO ELECTRON LIMITED
    • Yusuke SAITOH
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
    • Publication number 20150179466
    • Publication date Jun 25, 2015
    • TOKYO ELECTRON LIMITED
    • Wataru TAKAYAMA
    • H01 - BASIC ELECTRIC ELEMENTS