Wayne FITZGERALD

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Le Cheylas, FR

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Patents Grantslast 30 patents

Information Patent Grant
System and method for optimizing a lithography exposure process
- Patent number 11,531,279
- Issue date Dec 20, 2022
- Onto Innovation Inc.
- Elvino da Silveira
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for optimizing a lithography exposure process
- Patent number 11,126,096
- Issue date Sep 21, 2021
- Onto Innovation, Inc.
- Elvino Da Silveira
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
SYSTEM AND METHOD FOR OPTIMIZING A LITHOGRAPHY EXPOSURE PROCESS
- Publication number 20220075282
- Publication date Mar 10, 2022
- Onto Innovation, Inc.
- Elvino da Silveira
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM AND METHOD FOR OPTIMIZING A LITHOGRAPHY EXPOSURE PROCESS
- Publication number 20200233320
- Publication date Jul 23, 2020
- Onto Innovation, Inc.
- Elvino DA SILVEIRA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY