WEI FANG

Person

Milpitas, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
System and method for defect inspection using voltage contrast in a...
- Patent number 12,191,112
- Issue date Jan 7, 2025
- ASML Netherlands B.V.
- Wei Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metrology data correction using image quality metric
- Patent number 12,189,307
- Issue date Jan 7, 2025
- ASML Netherlands B.V.
- Fuming Wang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Cross-talk cancellation in multiple charged-particle beam inspection
- Patent number 12,080,513
- Issue date Sep 3, 2024
- ASML Netherlands B.V.
- Wei Fang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
In-die metrology methods and systems for process control
- Patent number 12,040,187
- Issue date Jul 16, 2024
- ASML Netherlands B.V.
- Lingling Pu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Inspection method and system
- Patent number 11,880,971
- Issue date Jan 23, 2024
- ASML Netherlands B.V.
- Wei Fang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Cascade defect inspection
- Patent number 11,861,818
- Issue date Jan 2, 2024
- ASML Netherlands B.V.
- Zhichao Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
MEMS sample holder, packaged product thereof, and apparatus of char...
- Patent number 11,854,762
- Issue date Dec 26, 2023
- BORRIES PTE. LTD.
- Wei Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Backscattered electron detector, apparatus of charged-particle beam...
- Patent number 11,854,763
- Issue date Dec 26, 2023
- BORRIES PTE. LTD.
- Wei Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for adaptive alignment
- Patent number 11,842,420
- Issue date Dec 12, 2023
- ASML Netherlands B.V.
- Wei Fang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
System and method for bare wafer inspection
- Patent number 11,791,127
- Issue date Oct 17, 2023
- ASML Netherlands B.V.
- Wei Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fully automated SEM sampling system for e-beam image enhancement
- Patent number 11,769,317
- Issue date Sep 26, 2023
- ASML Netherlands B.V.
- Wentian Zhou
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Pattern grouping method based on machine learning
- Patent number 11,756,182
- Issue date Sep 12, 2023
- ASML Netherlands B.V.
- Wei Fang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Systems and methods of optimal metrology guidance
- Patent number 11,756,187
- Issue date Sep 12, 2023
- ASML Netherlands B.V.
- Lingling Pu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Low dose charged particle metrology system
- Patent number 11,720,030
- Issue date Aug 8, 2023
- ASML Netherlands B.V.
- Fei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Image enhancement for multi-layered structure in charged-particle b...
- Patent number 11,694,312
- Issue date Jul 4, 2023
- ASML Netherlands B.V.
- Wei Fang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for enhancing the semiconductor manufacturing yield
- Patent number 11,681,279
- Issue date Jun 20, 2023
- ASML Netherlands B.V.
- Wei Fang
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Apparatus of electron beam comprising pinnacle limiting plate and m...
- Patent number 11,664,186
- Issue date May 30, 2023
- BORRIES PTE. LTD.
- Zhongwei Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Knowledge recommendation for defect review
- Patent number 11,650,576
- Issue date May 16, 2023
- ASML Netherlands B.V.
- Wei Fang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
In-die metrology methods and systems for process control
- Patent number 11,527,405
- Issue date Dec 13, 2022
- ASML Netherlands B.V.
- Lingling Pu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Methods and systems for defect inspection and review
- Patent number 11,450,122
- Issue date Sep 20, 2022
- ASML Netherlands B.V.
- Wei Fang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Methods of inspecting samples with multiple beams of charged particles
- Patent number 11,430,631
- Issue date Aug 30, 2022
- ASML Netherlands B.V.
- Kuo-Shih Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Defect displaying method
- Patent number 11,416,979
- Issue date Aug 16, 2022
- ASML Netherlands B.V.
- Wei Fang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
EBeam inspection method
- Patent number 11,315,237
- Issue date Apr 26, 2022
- ASML Netherlands B.V.
- Wei Fang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Cascade defect inspection
- Patent number 11,308,602
- Issue date Apr 19, 2022
- ASML Netherlands B.V.
- Zhichao Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus for adaptive alignment
- Patent number 11,308,635
- Issue date Apr 19, 2022
- ASML Netherlands B.V.
- Wei Fang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Inspection method and system
- Patent number 11,250,559
- Issue date Feb 15, 2022
- ASML Netherlands B.V.
- Wei Fang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Defect pattern grouping method and system
- Patent number 11,238,579
- Issue date Feb 1, 2022
- ASML Netherlands B.V.
- Wei Fang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Systems and methods of optimal metrology guidance
- Patent number 11,216,938
- Issue date Jan 4, 2022
- ASML Netherlands B.V.
- Lingling Pu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Apparatus and method for detecting time-dependent defects in a fast...
- Patent number 11,175,248
- Issue date Nov 16, 2021
- ASML Netherlands B.V.
- Long Ma
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Low dose charged particle metrology system
- Patent number 11,175,590
- Issue date Nov 16, 2021
- ASML Netherlands B.V.
- Fei Wang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
CROSS-TALK CANCELLATION IN MULTIPLE CHARGED-PARTICLE BEAM INSPECTION
- Publication number 20250006456
- Publication date Jan 2, 2025
- ASML NETHERLANDS B.V.
- Wei FANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
IMPROVED CHARGED PARTICLE IMAGE INSPECTION
- Publication number 20240212131
- Publication date Jun 27, 2024
- ASML NETHERLANDS B.V.
- Hairong LEI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
FULLY AUTOMATED SEM SAMPLING SYSTEM FOR E-BEAM IMAGE ENHANCEMENT
- Publication number 20240046620
- Publication date Feb 8, 2024
- ASML NETHERLANDS B.V.
- Wentian ZHOU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
APPARATUS AND METHODS TO GENERATE DEBLURRING MODEL AND DEBLUR IMAGE
- Publication number 20240005457
- Publication date Jan 4, 2024
- ASML NETHERLANDS B.V.
- Hairong LEI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PATTERN GROUPING METHOD BASED ON MACHINE LEARNING
- Publication number 20230386021
- Publication date Nov 30, 2023
- ASML NETHERLANDS B.V.
- Wei FANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
APPARATUS AND METHODS FOR GENERATING DENOISING MODEL
- Publication number 20230230208
- Publication date Jul 20, 2023
- ASML NETHERLANDS B.V.
- Hairong LEI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CONTOUR EXTRACTION METHOD FROM INSPECTION IMAGE IN MULTIPLE CHARGED...
- Publication number 20230117237
- Publication date Apr 20, 2023
- ASML NETHERLANDS B.V.
- Lingling PU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
IN-DIE METROLOGY METHODS AND SYSTEMS FOR PROCESS CONTROL
- Publication number 20230076943
- Publication date Mar 9, 2023
- ASML NETHERLANDS B.V.
- Lingling PU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
BEAM CURRENT ADJUSTMENT FOR CHARGED-PARTICLE INSPECTION SYSTEM
- Publication number 20230028799
- Publication date Jan 26, 2023
- ASML NETHERLANDS B.V.
- Wei FANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR DEFECT INSPECTION USING VOLTAGE CONTRAST IN A...
- Publication number 20230012946
- Publication date Jan 19, 2023
- ASML NETHERLANDS B.V.
- Wei FANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-REFERENCING HEALTH MONITORING SYSTEM FOR MULTI-BEAM SEM TOOLS
- Publication number 20220319805
- Publication date Oct 6, 2022
- ASML NETHERLANDS B.V.
- Wei FANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CROSS-TALK CANCELLATION IN MULTIPLE CHARGED-PARTICLE BEAM INSPECTION
- Publication number 20220301811
- Publication date Sep 22, 2022
- ASML NETHERLANDS B.V.
- Wei FANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MULTIPLE LANDING ENERGY SCANNING ELECTRON MICROSCOPY SYSTEMS AND ME...
- Publication number 20220254599
- Publication date Aug 11, 2022
- ASML NETHERLANDS B.V.
- Wei FANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EBeam Inspection Method
- Publication number 20220253999
- Publication date Aug 11, 2022
- ASML NETHERLANDS B.V.
- Wei FANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND APPARATUS FOR ADAPTIVE ALIGNMENT
- Publication number 20220245840
- Publication date Aug 4, 2022
- ASML NETHERLANDS B.V.
- Wei FANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
INSPECTION METHOD AND SYSTEM
- Publication number 20220245780
- Publication date Aug 4, 2022
- ASML NETHERLANDS B.V.
- Wei FANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CASCADE DEFECT INSPECTION
- Publication number 20220245787
- Publication date Aug 4, 2022
- ASML NETHERLANDS B.V.
- Zhichao CHEN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SYSTEMS AND METHODS OF OPTIMAL METROLOGY GUIDANCE
- Publication number 20220237759
- Publication date Jul 28, 2022
- ASML NETHERLANDS B.V.
- Lingling PU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
LOW DOSE CHARGED PARTICLE METROLOGY SYSTEM
- Publication number 20220113637
- Publication date Apr 14, 2022
- ASML NETHERLANDS B.V.
- Fei WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR BARE WAFER INSPECTION
- Publication number 20220068592
- Publication date Mar 3, 2022
- ASML NETHERLANDS B.V.
- Wei FANG
- G01 - MEASURING TESTING
Information Patent Application
SYSTEMS AND METHODS FOR FOCUSING CHARGED -PARTICLE BEAMS
- Publication number 20220068590
- Publication date Mar 3, 2022
- ASML NETHERLANDS B.V.
- Ying LUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMAGE ENHANCEMENT FOR MULTI-LAYERED STRUCTURE IN CHARGED-PARTICLE B...
- Publication number 20210350507
- Publication date Nov 11, 2021
- ASML NETHERLANDS B.V.
- Wei FANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METROLOGY DATA CORRECTION USING IMAGE QUALITY METRIC
- Publication number 20210241449
- Publication date Aug 5, 2021
- ASML NETHERLANDS B.V.
- Fuming WANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHODS AND SYSTEMS FOR DEFECT INSPECTION AND REVIEW
- Publication number 20200334446
- Publication date Oct 22, 2020
- ASML NETHERLANDS B.V.
- Wei FANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
LOW DOSE CHARGED PARTICLE METROLOGY SYSTEM
- Publication number 20200333714
- Publication date Oct 22, 2020
- ASML NETHERLANDS B.V.
- Fei WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR DETERMINING CORRECTIONS TO FEATURES OF A MASK
- Publication number 20200326632
- Publication date Oct 15, 2020
- ASML NETHERLANDS B.V.
- Wei Fang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INSPECTION METHOD AND SYSTEM
- Publication number 20200302587
- Publication date Sep 24, 2020
- ASML Netherlands B.V.
- Wei FANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DYNAMIC DETERMINATION OF A SAMPLE INSPECTION RECIPE OF CHARGED PART...
- Publication number 20200286710
- Publication date Sep 10, 2020
- ASML NETHERLANDS B.V.
- Zhong-wei CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF INSPECTING SAMPLES WITH MULTIPLE BEAMS OF CHARGED PARTICLES
- Publication number 20200227233
- Publication date Jul 16, 2020
- ASML NETHERLANDS B.V.
- Kuo-Shih LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-DIE METROLOGY METHODS AND SYSTEMS FOR PROCESS CONTROL
- Publication number 20200211845
- Publication date Jul 2, 2020
- ASML NETHERLANDS B.V.
- Lingling PU
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

System and method for defect inspection using voltage contrast in a...

Metrology data correction using image quality metric

Cross-talk cancellation in multiple charged-particle beam inspection

In-die metrology methods and systems for process control

Inspection method and system

Cascade defect inspection

MEMS sample holder, packaged product thereof, and apparatus of char...

Backscattered electron detector, apparatus of charged-particle beam...

Method and apparatus for adaptive alignment

System and method for bare wafer inspection

Fully automated SEM sampling system for e-beam image enhancement

Pattern grouping method based on machine learning

Systems and methods of optimal metrology guidance

Low dose charged particle metrology system

Image enhancement for multi-layered structure in charged-particle b...

Method for enhancing the semiconductor manufacturing yield

Apparatus of electron beam comprising pinnacle limiting plate and m...

Knowledge recommendation for defect review

In-die metrology methods and systems for process control

Methods and systems for defect inspection and review

Methods of inspecting samples with multiple beams of charged particles

Defect displaying method

EBeam inspection method

Cascade defect inspection

Method and apparatus for adaptive alignment

Inspection method and system

Defect pattern grouping method and system

Systems and methods of optimal metrology guidance

Apparatus and method for detecting time-dependent defects in a fast...

Low dose charged particle metrology system

Patents Applicationslast 30 patents

CROSS-TALK CANCELLATION IN MULTIPLE CHARGED-PARTICLE BEAM INSPECTION

IMPROVED CHARGED PARTICLE IMAGE INSPECTION

FULLY AUTOMATED SEM SAMPLING SYSTEM FOR E-BEAM IMAGE ENHANCEMENT

APPARATUS AND METHODS TO GENERATE DEBLURRING MODEL AND DEBLUR IMAGE

PATTERN GROUPING METHOD BASED ON MACHINE LEARNING

APPARATUS AND METHODS FOR GENERATING DENOISING MODEL

CONTOUR EXTRACTION METHOD FROM INSPECTION IMAGE IN MULTIPLE CHARGED...

IN-DIE METROLOGY METHODS AND SYSTEMS FOR PROCESS CONTROL

BEAM CURRENT ADJUSTMENT FOR CHARGED-PARTICLE INSPECTION SYSTEM

SYSTEM AND METHOD FOR DEFECT INSPECTION USING VOLTAGE CONTRAST IN A...

SELF-REFERENCING HEALTH MONITORING SYSTEM FOR MULTI-BEAM SEM TOOLS

CROSS-TALK CANCELLATION IN MULTIPLE CHARGED-PARTICLE BEAM INSPECTION

MULTIPLE LANDING ENERGY SCANNING ELECTRON MICROSCOPY SYSTEMS AND ME...

EBeam Inspection Method

METHOD AND APPARATUS FOR ADAPTIVE ALIGNMENT

INSPECTION METHOD AND SYSTEM

CASCADE DEFECT INSPECTION

SYSTEMS AND METHODS OF OPTIMAL METROLOGY GUIDANCE

LOW DOSE CHARGED PARTICLE METROLOGY SYSTEM

SYSTEM AND METHOD FOR BARE WAFER INSPECTION

SYSTEMS AND METHODS FOR FOCUSING CHARGED -PARTICLE BEAMS

IMAGE ENHANCEMENT FOR MULTI-LAYERED STRUCTURE IN CHARGED-PARTICLE B...

METROLOGY DATA CORRECTION USING IMAGE QUALITY METRIC

METHODS AND SYSTEMS FOR DEFECT INSPECTION AND REVIEW

LOW DOSE CHARGED PARTICLE METROLOGY SYSTEM

METHOD FOR DETERMINING CORRECTIONS TO FEATURES OF A MASK

INSPECTION METHOD AND SYSTEM

DYNAMIC DETERMINATION OF A SAMPLE INSPECTION RECIPE OF CHARGED PART...

METHODS OF INSPECTING SAMPLES WITH MULTIPLE BEAMS OF CHARGED PARTICLES

IN-DIE METROLOGY METHODS AND SYSTEMS FOR PROCESS CONTROL