Wei-Han Fan

Person

Hsin-Chu City, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Self-aligning backside contact process and devices thereof
- Patent number 12,142,647
- Issue date Nov 12, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Wei-Han Fan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-link device adopting block acknowledgment and packet allocati...
- Patent number 12,120,036
- Issue date Oct 15, 2024
- Realtek Semiconductor Corp.
- Wei-Kang Fan
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Semiconductor structure and method for forming the same
- Patent number 12,051,732
- Issue date Jul 30, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kuan-Hao Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device including an epitaxy region
- Patent number 11,955,547
- Issue date Apr 9, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Te-Jen Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Epitaxial structures exposed in airgaps for semiconductor devices
- Patent number 11,923,409
- Issue date Mar 5, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Po-Yu Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Source and drain surface treatment for multi-gate field effect tran...
- Patent number 10,868,149
- Issue date Dec 15, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Wei-Han Fan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Source and drain surface treatment for multi-gate field effect tran...
- Patent number 10,446,669
- Issue date Oct 15, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd
- Wei-Han Fan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device including an epitaxy region
- Patent number 10,164,093
- Issue date Dec 25, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Te-Jen Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing strained source/drain structures
- Patent number 9,698,057
- Issue date Jul 4, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Feng Nieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device including an epitaxy region
- Patent number 9,595,477
- Issue date Mar 14, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Te-Jen Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High performance strained source-drain structure and method of fabr...
- Patent number 9,293,537
- Issue date Mar 22, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsueh-Chang Sung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spacer elements for semiconductor device
- Patent number 9,153,655
- Issue date Oct 6, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yun Jing Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating semiconductor device having spacer elements
- Patent number 9,111,906
- Issue date Aug 18, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yun Jing Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing strained source/drain structures
- Patent number 9,048,253
- Issue date Jun 2, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Feng Nieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having a first spacer element and an adjacent...
- Patent number 8,735,988
- Issue date May 27, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yun Jing Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High performance strained source-drain structure and method of fabr...
- Patent number 8,709,897
- Issue date Apr 29, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsueh-Chang Sung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Facet-free semiconductor device
- Patent number 8,680,625
- Issue date Mar 25, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Wei-Han Fan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing strained source/drain structures
- Patent number 8,569,139
- Issue date Oct 29, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Feng Nieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spacer elements for semiconductor device
- Patent number 8,455,952
- Issue date Jun 4, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yun Jing Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Source and drain feature profile for improving device performance
- Patent number 8,445,940
- Issue date May 21, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ming-Huan Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Strained semiconductor device with recessed channel
- Patent number 8,368,147
- Issue date Feb 5, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Fai Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing integrated circuit device with well control...
- Patent number 8,216,906
- Issue date Jul 10, 2012
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ming-Huan Tsai
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SELF-ALIGNING BACKSIDE CONTACT PROCESS AND DEVICES THEREOF
- Publication number 20240379772
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Wei-Han Fan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE
- Publication number 20240363714
- Publication date Oct 31, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuan-Hao CHENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EPITAXIAL STRUCTURES EXPOSED IN AIRGAPS FOR SEMICONDUCTOR DEVICES
- Publication number 20240186373
- Publication date Jun 6, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Po-Yu Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICE AND METHOD FOR HANDLING LOW LATENCY TRANSMISSION
- Publication number 20240015782
- Publication date Jan 11, 2024
- Realtek Semiconductor Corp.
- Wei-Kang Fan
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Application
Source and Drain Enginering Process for Multigate Devices
- Publication number 20230378304
- Publication date Nov 23, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Po-Yu Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-LINK DEVICE ADOPTING BLOCK ACKNOWLEDGMENT AND PACKET ALLOCATI...
- Publication number 20230318985
- Publication date Oct 5, 2023
- Realtek Semiconductor Corp.
- Wei-Kang Fan
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Application
Method Of Fabricating Epitaxial Source/Drain Feature
- Publication number 20230134971
- Publication date May 4, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Wei-Han Fan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-ALIGNING BACKSIDE CONTACT PROCESS AND DEVICES THEREOF
- Publication number 20230065318
- Publication date Mar 2, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wei-Han Fan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE AND METHOD FOR FORMING THE SAME
- Publication number 20230052084
- Publication date Feb 16, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuan-Hao CHENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Isolation Features For Semiconductor Devices And Methods Of Fabrica...
- Publication number 20230019386
- Publication date Jan 19, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuan-Hao CHENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INNER SPACER FOR A MULTI-GATE DEVICE AND RELATED METHODS
- Publication number 20230017036
- Publication date Jan 19, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Wei-Han FAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE STRUCTURE AND METHOD FOR FORMING THE SAME
- Publication number 20230018480
- Publication date Jan 19, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuan-Hao CHENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Inner Spacer Features For Multi-Gate Transistors
- Publication number 20230018266
- Publication date Jan 19, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Wei-Han FAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Spacer Features For Nanosheet-Based Devices
- Publication number 20220328648
- Publication date Oct 13, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- I-Hsieh Wong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Epitaxial Structures For Semiconductor Devices
- Publication number 20220320276
- Publication date Oct 6, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Po-Yu Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Source and Drain Enginering Process for Multigate Devices
- Publication number 20220320307
- Publication date Oct 6, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Po-Yu Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Source and Drain Surface Treatment for Multi-Gate Field Effect Tran...
- Publication number 20200044062
- Publication date Feb 6, 2020
- Taiwan Semiconductor Manufacturing Co., LTD
- Wei-Han Fan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Source and Drain Surface Treatment for Multi-Gate Field Effect Tran...
- Publication number 20190165139
- Publication date May 30, 2019
- Taiwan Semiconductor Manufacturing Co., LTD
- Wei-Han Fan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Device including an Epitaxy Region
- Publication number 20190123198
- Publication date Apr 25, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Te-Jen Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Device Including An Epitaxy Region
- Publication number 20170186867
- Publication date Jun 29, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Te-Jen Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Manufacturing Strained Source/Drain Structures
- Publication number 20150262886
- Publication date Sep 17, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Feng NIEH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High Performance Strained Source-Drain Structure and Method of Fabr...
- Publication number 20140319581
- Publication date Oct 30, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsueh-Chang Sung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPACER ELEMENTS FOR SEMICONDUCTOR DEVICE
- Publication number 20140291768
- Publication date Oct 2, 2014
- Yun Jing Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FABRICATING SEMICONDUCTOR DEVICE HAVING SPACER ELEMENTS
- Publication number 20140248752
- Publication date Sep 4, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yun Jing Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPACER ELEMENTS FOR SEMICONDUCTOR DEVICE
- Publication number 20140246728
- Publication date Sep 4, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yun Jing Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Manufacturing Strained Source/Drain Structures
- Publication number 20140024188
- Publication date Jan 23, 2014
- Chun-Feng Nieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Spacer Elements for Semiconductor Device
- Publication number 20130234255
- Publication date Sep 12, 2013
- Yun Jing Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED CIRCUIT DEVICE WITH WELL CONTROLLED SURFACE PROXIMITY AN...
- Publication number 20120273847
- Publication date Nov 1, 2012
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ming-Huan Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE INCLUDING AN EPITAXY REGION
- Publication number 20120187459
- Publication date Jul 26, 2012
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Te-Jen Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH PERFORMANCE STRAINED SOURCE-DRAIN STRUCTURE AND METHOD OF FABR...
- Publication number 20120132957
- Publication date May 31, 2012
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsueh-Chang Sung
- H01 - BASIC ELECTRIC ELEMENTS

Wei-Han Fan

Person

Patents Grantslast 30 patents

Self-aligning backside contact process and devices thereof

Multi-link device adopting block acknowledgment and packet allocati...

Semiconductor structure and method for forming the same

Semiconductor device including an epitaxy region

Epitaxial structures exposed in airgaps for semiconductor devices

Source and drain surface treatment for multi-gate field effect tran...

Source and drain surface treatment for multi-gate field effect tran...

Semiconductor device including an epitaxy region

Method of manufacturing strained source/drain structures

Semiconductor device including an epitaxy region

High performance strained source-drain structure and method of fabr...

Spacer elements for semiconductor device

Method for fabricating semiconductor device having spacer elements

Method of manufacturing strained source/drain structures

Semiconductor device having a first spacer element and an adjacent...

High performance strained source-drain structure and method of fabr...

Facet-free semiconductor device

Method of manufacturing strained source/drain structures

Spacer elements for semiconductor device

Source and drain feature profile for improving device performance

Strained semiconductor device with recessed channel

Method of manufacturing integrated circuit device with well control...

Patents Applicationslast 30 patents

SELF-ALIGNING BACKSIDE CONTACT PROCESS AND DEVICES THEREOF

SEMICONDUCTOR STRUCTURE

EPITAXIAL STRUCTURES EXPOSED IN AIRGAPS FOR SEMICONDUCTOR DEVICES

DEVICE AND METHOD FOR HANDLING LOW LATENCY TRANSMISSION

Source and Drain Enginering Process for Multigate Devices

MULTI-LINK DEVICE ADOPTING BLOCK ACKNOWLEDGMENT AND PACKET ALLOCATI...

Method Of Fabricating Epitaxial Source/Drain Feature

SELF-ALIGNING BACKSIDE CONTACT PROCESS AND DEVICES THEREOF

SEMICONDUCTOR STRUCTURE AND METHOD FOR FORMING THE SAME

Isolation Features For Semiconductor Devices And Methods Of Fabrica...

INNER SPACER FOR A MULTI-GATE DEVICE AND RELATED METHODS

SEMICONDUCTOR DEVICE STRUCTURE AND METHOD FOR FORMING THE SAME

Inner Spacer Features For Multi-Gate Transistors

Spacer Features For Nanosheet-Based Devices

Epitaxial Structures For Semiconductor Devices

Source and Drain Enginering Process for Multigate Devices

Source and Drain Surface Treatment for Multi-Gate Field Effect Tran...

Source and Drain Surface Treatment for Multi-Gate Field Effect Tran...

Semiconductor Device including an Epitaxy Region

Semiconductor Device Including An Epitaxy Region

Method of Manufacturing Strained Source/Drain Structures

High Performance Strained Source-Drain Structure and Method of Fabr...

SPACER ELEMENTS FOR SEMICONDUCTOR DEVICE

METHOD FOR FABRICATING SEMICONDUCTOR DEVICE HAVING SPACER ELEMENTS

SPACER ELEMENTS FOR SEMICONDUCTOR DEVICE

Method of Manufacturing Strained Source/Drain Structures

Spacer Elements for Semiconductor Device

INTEGRATED CIRCUIT DEVICE WITH WELL CONTROLLED SURFACE PROXIMITY AN...

SEMICONDUCTOR DEVICE INCLUDING AN EPITAXY REGION

HIGH PERFORMANCE STRAINED SOURCE-DRAIN STRUCTURE AND METHOD OF FABR...