Wei Liu

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Los Altos, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for design of a metrology target
- Patent number 11,221,560
- Issue date Jan 11, 2022
- ASML Netherlands B.V.
- Guangqing Chen
- G01 - MEASURING TESTING
Information Patent Grant
Correction for flare effects in lithography system
- Patent number 10,423,745
- Issue date Sep 24, 2019
- ASML Netherlands B.V.
- Hua-Yu Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Metrology method and apparatus
- Patent number 9,903,823
- Issue date Feb 27, 2018
- ASML Netherlands B.V.
- Yen-Wen Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Correction for flare effects in lithography system
- Patent number 8,887,104
- Issue date Nov 11, 2014
- ASML Netherlands B.V.
- Hua-Yu Liu
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND APPARATUS FOR DESIGN OF A METROLOGY TARGET
- Publication number 20220113638
- Publication date Apr 14, 2022
- ASML NETHERLANDS B.V.
- Guangqing CHEN
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY METHOD AND APPARATUS
- Publication number 20160146740
- Publication date May 26, 2016
- ASML NETHERLANDS B.V.
- Yen-Wen Lu
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND APPARATUS FOR DESIGN OF A METROLOGY TARGET
- Publication number 20150185625
- Publication date Jul 2, 2015
- ASML NETHERLANDS B.V.
- Guangqing CHEN
- G01 - MEASURING TESTING
Information Patent Application
CORRECTION FOR FLARE EFFECTS IN LITHOGRAPHY SYSTEM
- Publication number 20150058815
- Publication date Feb 26, 2015
- ASML NETHERLANDS B.V.
- Hua-Yu Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CORRECTION FOR FLARE EFFECTS IN LITHOGRAPHY SYSTEM
- Publication number 20130185681
- Publication date Jul 18, 2013
- ASML NETHERLANDS B.V.
- Hua-Yu Liu
- G06 - COMPUTING CALCULATING COUNTING