Wei V. TANG

Person

Santa Clara, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Data processing method, device, computer apparatus and storage medium
- Patent number 12,189,531
- Issue date Jan 7, 2025
- Xi'an Jiaotong University
- Wei Tang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Electronic device having an oxygen free platinum group metal film
- Patent number 11,894,233
- Issue date Feb 6, 2024
- Applied Materials, Inc.
- Yixiong Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High temperature chemical vapor deposition lid
- Patent number 11,732,358
- Issue date Aug 22, 2023
- Applied Materials, Inc.
- Muhannad Mustafa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Thermal process chamber lid with backside pumping
- Patent number 11,715,667
- Issue date Aug 1, 2023
- Applied Materials, Inc.
- Anqing Cui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of tuning film properties of metal nitride using plasma
- Patent number 11,646,226
- Issue date May 9, 2023
- Applied Materials, Inc.
- Wenyi Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ DC plasma for cleaning pedestal heater
- Patent number 11,623,253
- Issue date Apr 11, 2023
- Applied Materials, Inc.
- Tejas Ulavi
- B08 - CLEANING
Information Patent Grant
Oxygen free deposition of platinum group metal films
- Patent number 11,488,830
- Issue date Nov 1, 2022
- Applied Materials, Inc.
- Yixiong Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High temperature chemical vapor deposition lid
- Patent number 11,447,866
- Issue date Sep 20, 2022
- Applied Materials, Inc.
- Muhannad Mustafa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Thermal process chamber lid with backside pumping
- Patent number 11,335,591
- Issue date May 17, 2022
- Applied Materials, Inc.
- Anqing Cui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ DC plasma for cleaning pedestal heater
- Patent number 11,260,432
- Issue date Mar 1, 2022
- Applied Materials, Inc.
- Tejas Ulavi
- B08 - CLEANING
Information Patent Grant
Fluorine-doped nitride films for improved high-k reliability
- Patent number 11,171,047
- Issue date Nov 9, 2021
- Applied Materials, Inc.
- Yixiong Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for n-type metal oxide semiconductor (NMOS) m...
- Patent number 11,075,276
- Issue date Jul 27, 2021
- Applied Materials, Inc.
- Yongjing Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tuning work function of p-metal work function films through vapor d...
- Patent number 11,018,009
- Issue date May 25, 2021
- Applied Materials, Inc.
- Guoqiang Jian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ tungsten deposition without barrier layer
- Patent number 10,991,586
- Issue date Apr 27, 2021
- Applied Materials, Inc.
- Yong Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of reducing or eliminating defects in tungsten film
- Patent number 10,879,081
- Issue date Dec 29, 2020
- Applied Materials, Inc.
- Guoqiang Jian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of increasing selectivity for selective etch processes
- Patent number 10,755,947
- Issue date Aug 25, 2020
- Applied Materials, Inc.
- Wenyu Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for doping engineering and threshold voltage...
- Patent number 10,665,450
- Issue date May 26, 2020
- Applied Materials, Inc.
- Yixiong Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High pressure annealing of metal gate structures
- Patent number 10,636,705
- Issue date Apr 28, 2020
- Applied Materials, Inc.
- Yifei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer deposition chamber with thermal lid
- Patent number 10,407,771
- Issue date Sep 10, 2019
- Applied Materials, Inc.
- Anqing Cui
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Titanium compound based hard mask films
- Patent number 10,347,488
- Issue date Jul 9, 2019
- Applied Materials, Inc.
- Rui Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aluminum content control of TiAIN films
- Patent number 10,170,321
- Issue date Jan 1, 2019
- Applied Materials, Inc.
- Wenyu Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective etch of metal nitride films
- Patent number 10,014,185
- Issue date Jul 3, 2018
- Applied Materials, Inc.
- Liqi Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming low-resistance contacts through integrated proc...
- Patent number 9,947,578
- Issue date Apr 17, 2018
- Applied Materials, Inc.
- Yu Lei
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multi-threshold voltage structures with a lanthanum nitride film an...
- Patent number 9,748,354
- Issue date Aug 29, 2017
- Applied Materials, Inc.
- Wei V. Tang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition of films comprising aluminum alloys with high aluminum c...
- Patent number 9,683,287
- Issue date Jun 20, 2017
- Applied Materials, Inc.
- David Thompson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition of N-metal films comprising aluminum alloys
- Patent number 9,145,612
- Issue date Sep 29, 2015
- Applied Materials, Inc.
- Srinivas Gandikota
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Atomic layer deposition methods for metal gate electrodes
- Patent number 9,082,702
- Issue date Jul 14, 2015
- Applied Materials, Inc.
- Yu Lei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for manufacturing metal gates
- Patent number 8,987,080
- Issue date Mar 24, 2015
- Applied Materials, Inc.
- Xinliang Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for annealing a contact metal layer to form a metal silicid...
- Patent number 8,927,423
- Issue date Jan 6, 2015
- Applied Materials, Inc.
- Xinyu Fu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition of metal films using alane-based precursors
- Patent number 8,927,059
- Issue date Jan 6, 2015
- Applied Materials, Inc.
- Xinliang Lu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
DATA PROCESSING SYSTEM METHOD AND APPARATUS, COMPUTER DEVICE AND ST...
- Publication number 20250044979
- Publication date Feb 6, 2025
- Beijing Volcano Engine Technology Co., Ltd.
- Guojun LI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR ALLOCATING MEMORY, COMPUTER DEVICE AND STORAGE MEDIUM
- Publication number 20250044963
- Publication date Feb 6, 2025
- Beijing Volcano Engine Technology Co., Ltd.
- Peng LIU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DATA PROCESSING METHOD, DEVICE, COMPUTER APPARATUS AND STRORAGE MEDIUM
- Publication number 20250013567
- Publication date Jan 9, 2025
- Xi'an Jiaotong University
- Wei TANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SYSTEM AND METHODS FOR MANAGING THE DATA INTEGRITY OF READ AND WRIT...
- Publication number 20240248793
- Publication date Jul 25, 2024
- Lemon Inc.
- Peng Xu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DEVICE AND METHODS FOR MANAGING THE DATA INTEGRITY OF READ AND WRIT...
- Publication number 20240248794
- Publication date Jul 25, 2024
- Lemon Inc.
- Peng XU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
THERMAL PROCESS CHAMBER LID WITH BACKSIDE PUMPING
- Publication number 20230335434
- Publication date Oct 19, 2023
- Applied Materials, Inc.
- Anqing Cui
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF TUNING FILM PROPERTIES OF METAL NITRIDE USING PLASMA
- Publication number 20230245925
- Publication date Aug 3, 2023
- Applied Materials, Inc.
- Wenyi LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Oxygen Free Deposition Of Platinum Group Metal Films
- Publication number 20230025937
- Publication date Jan 26, 2023
- Applied Materials, Inc.
- Yixiong Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
High Temperature Chemical Vapor Deposition Lid
- Publication number 20220389585
- Publication date Dec 8, 2022
- Applied Materials, Inc.
- Muhannad Mustafa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
THERMAL PROCESS CHAMBER LID WITH BACKSIDE PUMPING
- Publication number 20220246471
- Publication date Aug 4, 2022
- Applied Materials, Inc.
- Anqing Cui
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
In-Situ DC Plasma For Cleaning Pedestal Heater
- Publication number 20220152668
- Publication date May 19, 2022
- Applied Materials, Inc.
- Tejas Ulavi
- B08 - CLEANING
Information Patent Application
HIGH TEMPERATURE CHEMICAL VAPOR DEPOSITION LID
- Publication number 20210395892
- Publication date Dec 23, 2021
- Applied Materials, Inc.
- Muhannad Mustafa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF TUNING FILM PROPERTIES OF METAL NITRIDE USING PLASMA
- Publication number 20210351071
- Publication date Nov 11, 2021
- Applied Materials, Inc.
- Wenyi LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
In-Situ DC Plasma For Cleaning Pedestal Heater
- Publication number 20210086239
- Publication date Mar 25, 2021
- Applied Materials, Inc.
- Tejas Ulavi
- B08 - CLEANING
Information Patent Application
Fluorine-Doped Nitride Films for Improved High-K Reliability
- Publication number 20200411373
- Publication date Dec 31, 2020
- Applied Materials, Inc.
- Yixiong Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THERMAL PROCESS CHAMBER LID WITH BACKSIDE PUMPING
- Publication number 20200381295
- Publication date Dec 3, 2020
- Applied Materials, Inc.
- Anqing Cui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LINER FOR V-NAND WORD LINE STACK
- Publication number 20200373318
- Publication date Nov 26, 2020
- Applied Materials, Inc.
- Jacqueline S. Wrench
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU TUNGSTEN DEPOSITION WITHOUT BARRIER LAYER
- Publication number 20200243341
- Publication date Jul 30, 2020
- Applied Materials, Inc.
- Yong Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR N-TYPE METAL OXIDE SEMICONDUCTOR (NMOS) M...
- Publication number 20200111885
- Publication date Apr 9, 2020
- Applied Materials, Inc.
- YONGJING LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Oxygen Free Deposition Of Platinum Group Metal Films
- Publication number 20200063263
- Publication date Feb 27, 2020
- Applied Materials, Inc.
- Yixiong Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods Of Increasing Selectivity For Selective Etch Processes
- Publication number 20190341268
- Publication date Nov 7, 2019
- Applied Materials, Inc.
- Wenyu Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TUNING WORK FUNCTION OF P-METAL WORK FUNCTION FILMS THROUGH VAPOR D...
- Publication number 20190326120
- Publication date Oct 24, 2019
- Applied Materials, Inc.
- Guoqiang JIAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF REDUCING OR ELIMINATING DEFECTS IN TUNGSTEN FILM
- Publication number 20190157102
- Publication date May 23, 2019
- Applied Materials, Inc.
- GUOQIANG JIAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR DOPING ENGINEERING AND THRESHOLD VOLTAGE...
- Publication number 20190057863
- Publication date Feb 21, 2019
- YIXIONG YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Aluminum Content Control of TiAIN Films
- Publication number 20180269065
- Publication date Sep 20, 2018
- Applied Materials, Inc.
- Wenyu Zhang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTI-THRESHOLD VOLTAGE STRUCTURES WITH A LANTHANUM NITRIDE FILM AN...
- Publication number 20170179252
- Publication date Jun 22, 2017
- Applied Materials, Inc.
- Wei V. TANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING LOW-RESISTANCE CONTACTS THROUGH INTEGRATED PROC...
- Publication number 20170148670
- Publication date May 25, 2017
- Applied Materials, Inc.
- YU LEI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Titanium-Compound Based Hard Mask Films
- Publication number 20170084459
- Publication date Mar 23, 2017
- Applied Materials, Inc.
- Rui Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ATOMIC LAYER DEPOSITION CHAMBER WITH THERMAL LID
- Publication number 20160097119
- Publication date Apr 7, 2016
- Applied Materials, Inc.
- ANQING CUI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Deposition Of Films Comprising Aluminum Alloys With High Aluminum C...
- Publication number 20140112824
- Publication date Apr 24, 2014
- David Thompson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Wei V. TANG

Person

Patents Grantslast 30 patents

Data processing method, device, computer apparatus and storage medium

Electronic device having an oxygen free platinum group metal film

High temperature chemical vapor deposition lid

Thermal process chamber lid with backside pumping

Method of tuning film properties of metal nitride using plasma

In-situ DC plasma for cleaning pedestal heater

Oxygen free deposition of platinum group metal films

High temperature chemical vapor deposition lid

Thermal process chamber lid with backside pumping

In-situ DC plasma for cleaning pedestal heater

Fluorine-doped nitride films for improved high-k reliability

Methods and apparatus for n-type metal oxide semiconductor (NMOS) m...

Tuning work function of p-metal work function films through vapor d...

In-situ tungsten deposition without barrier layer

Methods of reducing or eliminating defects in tungsten film

Methods of increasing selectivity for selective etch processes

Methods and apparatus for doping engineering and threshold voltage...

High pressure annealing of metal gate structures

Atomic layer deposition chamber with thermal lid

Titanium compound based hard mask films

Aluminum content control of TiAIN films

Selective etch of metal nitride films

Methods for forming low-resistance contacts through integrated proc...

Multi-threshold voltage structures with a lanthanum nitride film an...

Deposition of films comprising aluminum alloys with high aluminum c...

Deposition of N-metal films comprising aluminum alloys

Atomic layer deposition methods for metal gate electrodes

Methods for manufacturing metal gates

Methods for annealing a contact metal layer to form a metal silicid...

Deposition of metal films using alane-based precursors

Patents Applicationslast 30 patents

DATA PROCESSING SYSTEM METHOD AND APPARATUS, COMPUTER DEVICE AND ST...

METHOD FOR ALLOCATING MEMORY, COMPUTER DEVICE AND STORAGE MEDIUM

DATA PROCESSING METHOD, DEVICE, COMPUTER APPARATUS AND STRORAGE MEDIUM

SYSTEM AND METHODS FOR MANAGING THE DATA INTEGRITY OF READ AND WRIT...

DEVICE AND METHODS FOR MANAGING THE DATA INTEGRITY OF READ AND WRIT...

THERMAL PROCESS CHAMBER LID WITH BACKSIDE PUMPING

METHOD OF TUNING FILM PROPERTIES OF METAL NITRIDE USING PLASMA

Oxygen Free Deposition Of Platinum Group Metal Films

High Temperature Chemical Vapor Deposition Lid

THERMAL PROCESS CHAMBER LID WITH BACKSIDE PUMPING

In-Situ DC Plasma For Cleaning Pedestal Heater

HIGH TEMPERATURE CHEMICAL VAPOR DEPOSITION LID

METHOD OF TUNING FILM PROPERTIES OF METAL NITRIDE USING PLASMA

In-Situ DC Plasma For Cleaning Pedestal Heater

Fluorine-Doped Nitride Films for Improved High-K Reliability

THERMAL PROCESS CHAMBER LID WITH BACKSIDE PUMPING

LINER FOR V-NAND WORD LINE STACK

IN-SITU TUNGSTEN DEPOSITION WITHOUT BARRIER LAYER

METHODS AND APPARATUS FOR N-TYPE METAL OXIDE SEMICONDUCTOR (NMOS) M...

Oxygen Free Deposition Of Platinum Group Metal Films

Methods Of Increasing Selectivity For Selective Etch Processes

TUNING WORK FUNCTION OF P-METAL WORK FUNCTION FILMS THROUGH VAPOR D...

METHODS OF REDUCING OR ELIMINATING DEFECTS IN TUNGSTEN FILM

METHODS AND APPARATUS FOR DOPING ENGINEERING AND THRESHOLD VOLTAGE...

Aluminum Content Control of TiAIN Films

MULTI-THRESHOLD VOLTAGE STRUCTURES WITH A LANTHANUM NITRIDE FILM AN...

METHODS FOR FORMING LOW-RESISTANCE CONTACTS THROUGH INTEGRATED PROC...

Titanium-Compound Based Hard Mask Films

ATOMIC LAYER DEPOSITION CHAMBER WITH THERMAL LID

Deposition Of Films Comprising Aluminum Alloys With High Aluminum C...