Weidong Mao

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Hoboken, NJ, US

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Patents Grantslast 30 patents

Information Patent Grant
Tunable two-mirror interference lithography system
- Patent number 8,681,315
- Issue date Mar 25, 2014
- The Trustees of the Stevens Institute of Technology
- Weidong Mao
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
TUNABLE TWO-MIRROR INTERFERENCE LITHOGRAPHY SYSTEM
- Publication number 20130017498
- Publication date Jan 17, 2013
- Weidong Mao
- G02 - OPTICS