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Weijie Li

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  • Hangzhou, CN
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Patents Grantslast 30 patents

  • Information Patent Grant

    Photosensitive resin composition and use thereof
    • Patent number 11,827,781
    • Issue date Nov 28, 2023
    • Zhejiang First Advanced Material R&D Institute Co., Ltd.
    • Gaohua Zhu
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

  • Information Patent Application

    Dry Film Resist, Photosensitive Dry Film, and Copper Clad Laminate
    • Publication number 20250237947
    • Publication date Jul 24, 2025
    • HANGZHOU FIRST ELECTRONIC MATERIAL CO., LTD
    • Li YUAN
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    RESIN COMPOSITION AND USE THEREOF
    • Publication number 20220308450
    • Publication date Sep 29, 2022
    • ZHEJIANG FIRST ADVANCED MATERIAL R&D INSTITUTE CO., LTD.
    • Xiaoying LIN
    • C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
  • Information Patent Application

    PHOTOSENSITIVE RESIN COMPOSITION AND USE THEREOF
    • Publication number 20220145072
    • Publication date May 12, 2022
    • ZHEJIANG FIRST ADVANCED MATERIAL R&D INSTITUTE CO., LTD.
    • Gaohua Zhu
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...