Weimin Li

Person

New Milford, CT, US

People

Patents Grantslast 30 patents

Information Patent Grant
Coatings for enhancement of properties and performance of substrate...
- Patent number 12,084,778
- Issue date Sep 10, 2024
- Entegris, Inc.
- Bryan C. Hendrix
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Coatings for enhancement of properties and performance of substrate...
- Patent number 12,018,382
- Issue date Jun 25, 2024
- Entegris, Inc.
- Bryan C. Hendrix
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
In-situ oxidized NiO as electrode surface for high k MIM device
- Patent number 10,475,575
- Issue date Nov 12, 2019
- Entegris, Inc.
- Bryan C. Hendrix
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
ALD processes for low leakage current and low equivalent oxide thic...
- Patent number 10,186,570
- Issue date Jan 22, 2019
- Entegris, Inc.
- Bryan C. Hendrix
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Precursors for silicon dioxide gap fill
- Patent number 10,043,658
- Issue date Aug 7, 2018
- Entegris, Inc.
- William Hunks
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fluorine free tungsten ALD/CVD process
- Patent number 9,637,395
- Issue date May 2, 2017
- Entegris, Inc.
- Weimin Li
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Silylene compositions and methods of use thereof
- Patent number 9,443,736
- Issue date Sep 13, 2016
- Entegris, Inc.
- Thomas M. Cameron
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Precursors for silicon dioxide gap fill
- Patent number 9,337,054
- Issue date May 10, 2016
- Entegris, Inc.
- William Hunks
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In situ generation of RuO4 for ALD of Ru and Ru related materials
- Patent number 8,663,735
- Issue date Mar 4, 2014
- Advanced Technology Materials, Inc.
- Chongying Xu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and composition for depositing ruthenium with assistive meta...
- Patent number 8,574,675
- Issue date Nov 5, 2013
- Advanced Technology Materials, Inc.
- Jorge A. Lubguban
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High concentration nitrogen-containing germanium telluride based me...
- Patent number 8,330,136
- Issue date Dec 11, 2012
- Advanced Technology Materials, Inc.
- Jun-Fei Zheng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Amorphous Ge/Te deposition process
- Patent number 8,093,140
- Issue date Jan 10, 2012
- Advanced Technology Materials, Inc.
- Philip S. H. Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
COATINGS FOR ENHANCEMENT OF PROPERTIES AND PERFORMANCE OF SUBSTRATE...
- Publication number 20200378011
- Publication date Dec 3, 2020
- Entegris, Inc.
- Bryan C. Hendrix
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COATINGS FOR ENHANCEMENT OF PROPERTIES AND PERFORMANCE OF SUBSTRATE...
- Publication number 20190100842
- Publication date Apr 4, 2019
- Entegris, Inc.
- Bryan C. Hendrix
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PRECURSORS FOR SILICON DIOXIDE GAP FILL
- Publication number 20180130654
- Publication date May 10, 2018
- Entegris, Inc.
- William Hunks
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COATINGS FOR ENHANCEMENT OF PROPERTIES AND PERFORMANCE OF SUBSTRATE...
- Publication number 20180044800
- Publication date Feb 15, 2018
- Entegris, Inc.
- Bryan C. Hendrix
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
AMINE CATALYSTS FOR LOW TEMPERATURE ALD/CVD SiO2 DEPOSITION USING H...
- Publication number 20170103888
- Publication date Apr 13, 2017
- Entegris, Inc.
- Dingkai Guo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PRECURSORS FOR SILICON DIOXIDE GAP FILL
- Publication number 20160225615
- Publication date Aug 4, 2016
- Entegris, Inc.
- William Hunks
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ALD PROCESSES FOR LOW LEAKAGE CURRENT AND LOW EQUIVALENT OXIDE THIC...
- Publication number 20150364537
- Publication date Dec 17, 2015
- ATMI Korea Co., Ltd
- Bryan C. Hendrix
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
IN-SITU OXIDIZED NiO AS ELECTRODE SURFACE FOR HIGH k MIM DEVICE
- Publication number 20150318108
- Publication date Nov 5, 2015
- Entegris, Inc.
- Bryan C. Hendrix
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FLUORINE FREE TUNGSTEN ALD/CVD PROCESS
- Publication number 20150251920
- Publication date Sep 10, 2015
- Entegris, Inc.
- Weimin Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SILICON PRECURSORS FOR LOW TEMPERATURE ALD OF SILICON-BASED THIN-FILMS
- Publication number 20150147824
- Publication date May 28, 2015
- Advanced Technology Materials, Inc.
- Thomas M. Cameron
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
AMORPHOUS GE/TE DEPOSITION PROCESS
- Publication number 20120108038
- Publication date May 3, 2012
- Advanced Technology Materials, Inc.
- Philip S.H. Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND COMPOSITION FOR DEPOSITING RUTHENIUM WITH ASSISTIVE META...
- Publication number 20120064719
- Publication date Mar 15, 2012
- Advanced Technology Materials, Inc.
- Jorge A. Lubguban, JR.
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH CONCENTRATION NITROGEN-CONTAINING GERMANIUM TELLURIDE BASED ME...
- Publication number 20110260132
- Publication date Oct 27, 2011
- Advanced Technology Materials, Inc.
- Jun-Fei Zheng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
IN SITU GENERATION OF RuO4 FOR ALD OF Ru AND Ru RELATED MATERIALS
- Publication number 20100209598
- Publication date Aug 19, 2010
- Advanced Technology Materials, Inc.
- Chongying Xu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PRECURSORS FOR SILICON DIOXIDE GAP FILL
- Publication number 20100164057
- Publication date Jul 1, 2010
- Advanced Technology Materials, Inc.
- William Hunks
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AMORPHOUS GE/TE DEPOSITION PROCESS
- Publication number 20090112009
- Publication date Apr 30, 2009
- Advanced Technology Materials, Inc.
- Philip S.H. Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Person

Patents Grantslast 30 patents

Coatings for enhancement of properties and performance of substrate...

Coatings for enhancement of properties and performance of substrate...

In-situ oxidized NiO as electrode surface for high k MIM device

ALD processes for low leakage current and low equivalent oxide thic...

Precursors for silicon dioxide gap fill

Fluorine free tungsten ALD/CVD process

Silylene compositions and methods of use thereof

Precursors for silicon dioxide gap fill

In situ generation of RuO4 for ALD of Ru and Ru related materials

Method and composition for depositing ruthenium with assistive meta...

High concentration nitrogen-containing germanium telluride based me...

Amorphous Ge/Te deposition process

Patents Applicationslast 30 patents

COATINGS FOR ENHANCEMENT OF PROPERTIES AND PERFORMANCE OF SUBSTRATE...

COATINGS FOR ENHANCEMENT OF PROPERTIES AND PERFORMANCE OF SUBSTRATE...

PRECURSORS FOR SILICON DIOXIDE GAP FILL

COATINGS FOR ENHANCEMENT OF PROPERTIES AND PERFORMANCE OF SUBSTRATE...

AMINE CATALYSTS FOR LOW TEMPERATURE ALD/CVD SiO2 DEPOSITION USING H...

PRECURSORS FOR SILICON DIOXIDE GAP FILL

ALD PROCESSES FOR LOW LEAKAGE CURRENT AND LOW EQUIVALENT OXIDE THIC...

IN-SITU OXIDIZED NiO AS ELECTRODE SURFACE FOR HIGH k MIM DEVICE

FLUORINE FREE TUNGSTEN ALD/CVD PROCESS

SILICON PRECURSORS FOR LOW TEMPERATURE ALD OF SILICON-BASED THIN-FILMS

AMORPHOUS GE/TE DEPOSITION PROCESS

METHOD AND COMPOSITION FOR DEPOSITING RUTHENIUM WITH ASSISTIVE META...

HIGH CONCENTRATION NITROGEN-CONTAINING GERMANIUM TELLURIDE BASED ME...

IN SITU GENERATION OF RuO4 FOR ALD OF Ru AND Ru RELATED MATERIALS

PRECURSORS FOR SILICON DIOXIDE GAP FILL

AMORPHOUS GE/TE DEPOSITION PROCESS