Weinan Jiang

Person

Santa Clara, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing method and apparatus with control of plasma excit...
- Patent number 8,480,913
- Issue date Jul 9, 2013
- Lam Research Corporation
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etch endpoint detection
- Patent number 6,855,567
- Issue date Feb 15, 2005
- Lam Research Corporation
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-cleaning etch process
- Patent number 6,699,399
- Issue date Mar 2, 2004
- Applied Materials, Inc.
- Xue-Yu Qian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of plasma etching organic antireflective coating
- Patent number 6,617,257
- Issue date Sep 9, 2003
- Lam Research Corporation
- Tuqiang Ni
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Self-cleaning etch process
- Patent number 6,136,211
- Issue date Oct 24, 2000
- Applied Materials, Inc.
- Xue-Yu Qian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck having a thermal transfer regulator pad
- Patent number 5,978,202
- Issue date Nov 2, 1999
- Applied Materials, Inc.
- Ralph M. Wadensweiler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for measuring pedestal temperature in a semiconductor waf...
- Patent number 5,893,643
- Issue date Apr 13, 1999
- Applied Materials, Inc.
- Ajay Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for etching transistor gates using a hardmask
- Patent number 5,851,926
- Issue date Dec 22, 1998
- Applied Materials, Inc.
- Ajay Kumar
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING METHOD AND APPARATUS WITH CONTROL OF PLASMA EXCIT...
- Publication number 20110253673
- Publication date Oct 20, 2011
- LAM RESEARCH CORPORATION
- Tuqiang NI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of plasma etching organic antireflective coating
- Publication number 20020182881
- Publication date Dec 5, 2002
- Tuqiang Ni
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
Plasma processing method and apparatus with control of plasma excit...
- Publication number 20020139477
- Publication date Oct 3, 2002
- Lam Research Corporation
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS

Weinan Jiang

Person

Patents Grantslast 30 patents

Plasma processing method and apparatus with control of plasma excit...

Etch endpoint detection

Self-cleaning etch process

Method of plasma etching organic antireflective coating

Self-cleaning etch process

Electrostatic chuck having a thermal transfer regulator pad

Apparatus for measuring pedestal temperature in a semiconductor waf...

Method for etching transistor gates using a hardmask

Patents Applicationslast 30 patents

PLASMA PROCESSING METHOD AND APPARATUS WITH CONTROL OF PLASMA EXCIT...

Method of plasma etching organic antireflective coating

Plasma processing method and apparatus with control of plasma excit...