Weitian KOU

Person

Eindhoven, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Method of wafer alignment using at resolution metrology on product...
- Patent number 12,124,179
- Issue date Oct 22, 2024
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for optimization of lithographic process
- Patent number 12,044,981
- Issue date Jul 23, 2024
- ASML Netherlands B.V.
- Marc Hauptmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of determining corrections for a patterning process, device...
- Patent number 11,782,349
- Issue date Oct 10, 2023
- ASML Netherlands B.V.
- Weitian Kou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of determining corrections for a patterning process, device...
- Patent number 11,592,753
- Issue date Feb 28, 2023
- ASML Netherlands B.V.
- Weitian Kou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Computational metrology based correction and control
- Patent number 11,448,973
- Issue date Sep 20, 2022
- ASML Netherlands B.V.
- Manouk Rijpstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of determining corrections for a patterning process, device...
- Patent number 11,327,407
- Issue date May 10, 2022
- ASML Netherlands B.V.
- Weitian Kou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for optimization of lithographic process
- Patent number 11,099,487
- Issue date Aug 24, 2021
- ASML Netherlands B.V.
- Marc Hauptmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for controlling an industrial process using pr...
- Patent number 11,054,813
- Issue date Jul 6, 2021
- ASML Netherlands B.V.
- Alexander Ypma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic method
- Patent number 11,029,610
- Issue date Jun 8, 2021
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic method
- Patent number 10,962,887
- Issue date Mar 30, 2021
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of determining corrections for a patterning process
- Patent number 10,877,381
- Issue date Dec 29, 2020
- ASML Netherlands B.V.
- Weitian Kou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic method
- Patent number 10,527,958
- Issue date Jan 7, 2020
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHODS OF DETERMINING CORRECTIONS FOR A PATTERNING PROCESS, DEVICE...
- Publication number 20230168591
- Publication date Jun 1, 2023
- ASML NETHERLANDS B.V.
- Weitian KOU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF WAFER ALIGNMENT USING AT RESOLUTION METROLOGY ON PRODUCT...
- Publication number 20230168594
- Publication date Jun 1, 2023
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPUTATIONAL METROLOGY BASED CORRECTION AND CONTROL
- Publication number 20220365446
- Publication date Nov 17, 2022
- ASML NETHERLANDS B.V.
- Manouk RIJPSTRA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS OF DETERMINING CORRECTIONS FOR A PATTERNING PROCESS, DEVICE...
- Publication number 20220229373
- Publication date Jul 21, 2022
- ASML NETHERLANDS B.V.
- Weitian KOU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR OPTIMIZATION OF LITHOGRAPHIC PROCESS
- Publication number 20210349402
- Publication date Nov 11, 2021
- ASML NETHERLANDS B.V.
- Marc HAUPTMANN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS OF DETERMINING CORRECTIONS FOR A PATTERNING PROCESS, DEVICE...
- Publication number 20210080836
- Publication date Mar 18, 2021
- ASML NETHERLANDS B.V.
- Weitian KOU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPUTATIONAL METROLOGY BASED CORRECTION AND CONTROL
- Publication number 20210080837
- Publication date Mar 18, 2021
- ASML NETHERLANDS B.V.
- Manouk RIJPSTRA
- G05 - CONTROLLING REGULATING
Information Patent Application
LITHOGRAPHIC METHOD
- Publication number 20200272061
- Publication date Aug 27, 2020
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC METHOD
- Publication number 20200081356
- Publication date Mar 12, 2020
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS & APPARATUS FOR CONTROLLING AN INDUSTRIAL PROCESS
- Publication number 20200050180
- Publication date Feb 13, 2020
- ASML NETHERLANDS B.V.
- Weitian KOU
- G05 - CONTROLLING REGULATING
Information Patent Application
METHOD AND APPARATUS FOR OPTIMIZATION OF LITHOGRAPHIC PROCESS
- Publication number 20200026201
- Publication date Jan 23, 2020
- ASML NETHERLANDS B.V.
- Marc HAUPTMANN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS OF DETERMINING CORRECTIONS FOR A PATTERNING PROCESS
- Publication number 20200019067
- Publication date Jan 16, 2020
- ASML NETHERLANDS B.V.
- Weitian KOU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC METHOD
- Publication number 20190094721
- Publication date Mar 28, 2019
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Weitian KOU

Person

Patents Grantslast 30 patents

Method of wafer alignment using at resolution metrology on product...

Method and apparatus for optimization of lithographic process

Methods of determining corrections for a patterning process, device...

Methods of determining corrections for a patterning process, device...

Computational metrology based correction and control

Methods of determining corrections for a patterning process, device...

Method and apparatus for optimization of lithographic process

Method and apparatus for controlling an industrial process using pr...

Lithographic method

Lithographic method

Methods of determining corrections for a patterning process

Lithographic method

Patents Applicationslast 30 patents

METHODS OF DETERMINING CORRECTIONS FOR A PATTERNING PROCESS, DEVICE...

METHOD OF WAFER ALIGNMENT USING AT RESOLUTION METROLOGY ON PRODUCT...

COMPUTATIONAL METROLOGY BASED CORRECTION AND CONTROL

METHODS OF DETERMINING CORRECTIONS FOR A PATTERNING PROCESS, DEVICE...

METHOD AND APPARATUS FOR OPTIMIZATION OF LITHOGRAPHIC PROCESS

METHODS OF DETERMINING CORRECTIONS FOR A PATTERNING PROCESS, DEVICE...

COMPUTATIONAL METROLOGY BASED CORRECTION AND CONTROL

LITHOGRAPHIC METHOD

LITHOGRAPHIC METHOD

METHODS & APPARATUS FOR CONTROLLING AN INDUSTRIAL PROCESS

METHOD AND APPARATUS FOR OPTIMIZATION OF LITHOGRAPHIC PROCESS

METHODS OF DETERMINING CORRECTIONS FOR A PATTERNING PROCESS

LITHOGRAPHIC METHOD