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Weizhong Wang
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Sunnyvale, CA, US
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last 30 patents
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Patent Grant
Exposure correction based on reflective index for photolithographic...
Patent number
6,482,573
Issue date
Nov 19, 2002
Advanced Micro Devices, Inc.
Jayendra D. Bhakta
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
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Patent Grant
In-situ feedback system for localized CMP thickness control
Patent number
6,303,507
Issue date
Oct 16, 2001
Advanced Micro Devices, Inc.
Weizhong Wang
B24 - GRINDING POLISHING