Wen Chang

Person

Sunnyvale, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method of matching two or more plasma reactors
- Patent number 9,305,748
- Issue date Apr 5, 2016
- Applied Materials, Inc.
- Gaurav Saraf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Predictive method of matching two plasma reactors
- Patent number 9,184,021
- Issue date Nov 10, 2015
- Applied Materials, Inc.
- Gaurav Saraf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Real time process monitoring and control for semiconductor junctions
- Patent number 8,110,828
- Issue date Feb 7, 2012
- Solyndra LLC
- Vedapuram S. Achutharaman
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Constant force mechanical scribers and methods for using same in se...
- Patent number 8,109,004
- Issue date Feb 7, 2012
- Solyndra LLC
- Alex Shenderovich
- B28 - WORKING CEMENT, CLAY, OR STONE
Information Patent Grant
Real time process monitoring and control for semiconductor junctions
- Patent number 7,964,418
- Issue date Jun 21, 2011
- Solyndra LLC
- Vedapuram S. Achutharaman
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Constant force mechanical scribers and methods for using same in se...
- Patent number 7,877,881
- Issue date Feb 1, 2011
- Solyndra, Inc.
- Alex Shenderovich
- B28 - WORKING CEMENT, CLAY, OR STONE
Information Patent Grant
Constant force mechanical scribers and methods for using same in se...
- Patent number 7,707,732
- Issue date May 4, 2010
- Solyndra, Inc.
- Alex Shenderovich
- B28 - WORKING CEMENT, CLAY, OR STONE
Information Patent Grant
Adaptive control method for rapid thermal processing of a substrate
- Patent number 7,398,693
- Issue date Jul 15, 2008
- Applied Materials, Inc.
- Joseph Michael Ranish
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Clamping ring apparatus for processing semiconductor wafers
- Patent number 5,316,278
- Issue date May 31, 1994
- Applied Materials, Inc.
- Semyon Sherstinsky
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF MATCHING TWO OR MORE PLASMA REACTORS
- Publication number 20150096959
- Publication date Apr 9, 2015
- Applied Materials, Inc.
- Gaurav Saraf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PREDICTIVE METHOD OF MATCHING TWO PLASMA REACTORS
- Publication number 20150099314
- Publication date Apr 9, 2015
- Applied Materials, Inc.
- Gaurav Saraf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REAL TIME PROCESS MONITORING AND CONTROL FOR SEMICONDUCTOR JUNCTIONS
- Publication number 20110259391
- Publication date Oct 27, 2011
- Vedapuram S. Achutharaman
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
Constant Force Mechanical Scribers and Methods for Using Same In Se...
- Publication number 20110132170
- Publication date Jun 9, 2011
- SOLYNDRA INC.
- Alex Shenderovich
- B28 - WORKING CEMENT, CLAY, OR STONE
Information Patent Application
Constant Force Mechanical Scribers and Methods for Using Same In Se...
- Publication number 20100180746
- Publication date Jul 22, 2010
- SOLYNDRA INC.
- Alex Shenderovich
- B28 - WORKING CEMENT, CLAY, OR STONE
Information Patent Application
CONSTANT FORCE MECHANICAL SCRIBERS AND METHODS FOR USING SAME IN SE...
- Publication number 20090094844
- Publication date Apr 16, 2009
- Alex Shenderovich
- B28 - WORKING CEMENT, CLAY, OR STONE
Information Patent Application
Real time process monitoring and control for semiconductor junctions
- Publication number 20080041439
- Publication date Feb 21, 2008
- Solyndra, Inc.
- Vedapuram S. Achutharaman
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
Adaptive control method for rapid thermal processing of a substrate
- Publication number 20070238202
- Publication date Oct 11, 2007
- APPLIED MATERIALS, INC.
- Joseph Michael Ranish
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate processing platform allowing processing in different ambi...
- Publication number 20060240680
- Publication date Oct 26, 2006
- APPLIED MATERIALS, INC.
- Yoshitaka Yokota
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Method of matching two or more plasma reactors

Predictive method of matching two plasma reactors

Real time process monitoring and control for semiconductor junctions

Constant force mechanical scribers and methods for using same in se...

Real time process monitoring and control for semiconductor junctions

Constant force mechanical scribers and methods for using same in se...

Constant force mechanical scribers and methods for using same in se...

Adaptive control method for rapid thermal processing of a substrate

Clamping ring apparatus for processing semiconductor wafers

Patents Applicationslast 30 patents

METHOD OF MATCHING TWO OR MORE PLASMA REACTORS

PREDICTIVE METHOD OF MATCHING TWO PLASMA REACTORS

REAL TIME PROCESS MONITORING AND CONTROL FOR SEMICONDUCTOR JUNCTIONS

Constant Force Mechanical Scribers and Methods for Using Same In Se...

Constant Force Mechanical Scribers and Methods for Using Same In Se...

CONSTANT FORCE MECHANICAL SCRIBERS AND METHODS FOR USING SAME IN SE...

Real time process monitoring and control for semiconductor junctions

Adaptive control method for rapid thermal processing of a substrate

Substrate processing platform allowing processing in different ambi...