Wen-Hao Cheng

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Photomask including contrast enhancement layer and method of making...
- Patent number 7,807,319
- Issue date Oct 5, 2010
- Intel Corporation
- Wen-Hao Cheng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Continuous sloped phase edge architecture fabrication technique usi...
- Patent number 7,695,872
- Issue date Apr 13, 2010
- Intel Corporation
- Matt F. Vernon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Continuous sloped phase edge architecture fabrication technique usi...
- Patent number 7,282,306
- Issue date Oct 16, 2007
- Intel Corporation
- Matt F. Vernon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Manufacturable chromeless alternating phase shift mask structure wi...
- Patent number 7,160,651
- Issue date Jan 9, 2007
- Intel Corporation
- Tim Pinkerton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Active secondary exposure mask to manufacture integrated circuits
- Patent number 7,014,956
- Issue date Mar 21, 2006
- Intel Corporation
- Fred Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Modifying circuitry features in radiation sensitive layers with act...
- Patent number 6,942,958
- Issue date Sep 13, 2005
- Intel Corporation
- Fred Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Photomask including contrast enhancement layer and method of making...
- Publication number 20080241710
- Publication date Oct 2, 2008
- Wen-Hao Cheng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of repairing a photolithographic mask
- Publication number 20080057410
- Publication date Mar 6, 2008
- Wen-Hao Cheng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Continuous sloped phase edge architecture fabrication technique usi...
- Publication number 20080044768
- Publication date Feb 21, 2008
- Intel Corporation
- Matt F. Vernon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Image inspection method
- Publication number 20070002322
- Publication date Jan 4, 2007
- Yan Borodovsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Continuous sloped phase edge architecture fabrication technique usi...
- Publication number 20050214652
- Publication date Sep 29, 2005
- Matt F. Vernon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Manufacturable chromeless alternating phase shift mask structure wi...
- Publication number 20050084769
- Publication date Apr 21, 2005
- Intel Corporation
- Tim Pinkerton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reducing charging effects in photolithography reticle manufacturing
- Publication number 20040229129
- Publication date Nov 18, 2004
- Gary Allen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Modifying circuitry features in radiation sensitive layers with act...
- Publication number 20040170906
- Publication date Sep 2, 2004
- Fred Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Active secondary exposure mask to manufacture integrated circuits
- Publication number 20030129502
- Publication date Jul 10, 2003
- Fred Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposed phase edge mask method for generating periodic structures w...
- Publication number 20030039893
- Publication date Feb 27, 2003
- Jeff Farnsworth
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Wen-Hao Cheng

Person

Patents Grantslast 30 patents

Photomask including contrast enhancement layer and method of making...

Continuous sloped phase edge architecture fabrication technique usi...

Continuous sloped phase edge architecture fabrication technique usi...

Manufacturable chromeless alternating phase shift mask structure wi...

Active secondary exposure mask to manufacture integrated circuits

Modifying circuitry features in radiation sensitive layers with act...

Patents Applicationslast 30 patents

Photomask including contrast enhancement layer and method of making...

Method of repairing a photolithographic mask

Continuous sloped phase edge architecture fabrication technique usi...

Image inspection method

Continuous sloped phase edge architecture fabrication technique usi...

Manufacturable chromeless alternating phase shift mask structure wi...

Reducing charging effects in photolithography reticle manufacturing

Modifying circuitry features in radiation sensitive layers with act...

Active secondary exposure mask to manufacture integrated circuits

Exposed phase edge mask method for generating periodic structures w...