Wen Xiao

Person

Singapore, SG

People

Patents Grantslast 30 patents

Information Patent Grant
Multilayer extreme ultraviolet reflector materials
- Patent number 11,815,803
- Issue date Nov 14, 2023
- Applied Materials, Inc.
- Wen Xiao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask blank defect reduction
- Patent number 11,789,358
- Issue date Oct 17, 2023
- Applied Materials, Inc.
- Wen Xiao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Graded interface in Bragg reflector
- Patent number 11,720,013
- Issue date Aug 8, 2023
- Applied Materials, Inc.
- Wen Xiao
- G02 - OPTICS
Information Patent Grant
Extreme ultraviolet mask blank defect reduction methods
- Patent number 11,669,008
- Issue date Jun 6, 2023
- Applied Materials, Inc.
- Wen Xiao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Memory cell and method of forming the same
- Patent number 11,659,779
- Issue date May 23, 2023
- Agency for Science, Technology and Research
- Wen Xiao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Physical vapor deposition system and processes
- Patent number 11,639,544
- Issue date May 2, 2023
- Applied Materials, Inc.
- Sanjay Bhat
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Extreme ultraviolet mask absorber materials
- Patent number 11,630,385
- Issue date Apr 18, 2023
- Applied Materials, Inc.
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Surface topography measurement apparatus and method
- Patent number 11,604,151
- Issue date Mar 14, 2023
- Applied Materials, Inc.
- Weimin Li
- G01 - MEASURING TESTING
Information Patent Grant
Physical vapor deposition system and processes
- Patent number 11,599,016
- Issue date Mar 7, 2023
- Applied Materials, Inc.
- Vibhu Jindal
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask blank hard mask materials
- Patent number 11,556,053
- Issue date Jan 17, 2023
- Applied Materials, Inc.
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method to control PVD deposition uniformity
- Patent number 11,557,473
- Issue date Jan 17, 2023
- Applied Materials, Inc.
- Wen Xiao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Physical vapor deposition system and processes
- Patent number 11,542,595
- Issue date Jan 3, 2023
- Applied Materials, Inc.
- Wen Xiao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Extreme ultraviolet mask blank hard mask materials
- Patent number 11,537,040
- Issue date Dec 27, 2022
- Applied Materials, Inc.
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus to improve EUV mask blank flatness
- Patent number 11,480,865
- Issue date Oct 25, 2022
- Applied Materials, Inc.
- Vibhu Jindal
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus to anneal EUV mask blank
- Patent number 11,480,866
- Issue date Oct 25, 2022
- Applied Materials, Inc.
- Herng Yau Yoong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method of measuring refractive index of EUV mask absorber
- Patent number 11,467,499
- Issue date Oct 11, 2022
- Applied Materials, Inc.
- Wen Xiao
- G01 - MEASURING TESTING
Information Patent Grant
Surface topography measurement apparatus and method
- Patent number 11,422,096
- Issue date Aug 23, 2022
- Applied Materials, Inc.
- Weimin Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method to control PVD deposition uniformity
- Patent number 11,390,940
- Issue date Jul 19, 2022
- Applied Materials, Inc.
- Wen Xiao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV mask blanks and methods of manufacture
- Patent number 11,385,536
- Issue date Jul 12, 2022
- Applied Materials, Inc.
- Wen Xiao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask with embedded absorber layer
- Patent number 11,366,379
- Issue date Jun 21, 2022
- Applied Materials Inc.
- Wen Xiao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method to measure refractive index at specific wavelengths
- Patent number 11,366,059
- Issue date Jun 21, 2022
- Applied Materials Inc.
- Wen Xiao
- G01 - MEASURING TESTING
Information Patent Grant
Physical vapor deposition chamber cleaning processes
- Patent number 11,365,475
- Issue date Jun 21, 2022
- Applied Materials Inc.
- Vibhu Jindal
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Graded interface in bragg reflector
- Patent number 11,327,394
- Issue date May 10, 2022
- Applied Materials Inc.
- Wen Xiao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Physical vapor deposition system and processes
- Patent number 11,237,473
- Issue date Feb 1, 2022
- Applied Materials, Inc.
- Vibhu Jindal
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask absorber and processes for manufacture
- Patent number 11,194,244
- Issue date Dec 7, 2021
- Applied Materials, Inc.
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
MULTILAYER EXTREME ULTRAVIOLET REFLECTORS
- Publication number 20230075471
- Publication date Mar 9, 2023
- Applied Materials, Inc.
- Wen Xiao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTILAYER EXTREME ULTRAVIOLET REFLECTOR MATERIALS
- Publication number 20230067566
- Publication date Mar 2, 2023
- Applied Materials, Inc.
- Wen Xiao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTILAYER EXTREME ULTRAVIOLET REFLECTORS
- Publication number 20220404692
- Publication date Dec 22, 2022
- Applied Materials, Inc.
- Vibhu Jindal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Surface Topography Measurement Apparatus And Method
- Publication number 20220283100
- Publication date Sep 8, 2022
- Aplied Materials, Inc.
- Weimin Li
- G01 - MEASURING TESTING
Information Patent Application
Graded Interface In Bragg Reflector
- Publication number 20220221786
- Publication date Jul 14, 2022
- Applied Materials, Inc.
- Wen Xiao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS TO IMPROVE EUV MASK BLANK FLATNESS
- Publication number 20220187698
- Publication date Jun 16, 2022
- Applied Materials, Inc.
- Vibhu Jindal
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Process Kit Conditioning Chamber
- Publication number 20220189749
- Publication date Jun 16, 2022
- Applied Materials, Inc.
- Ribhu Gautam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS TO ANNEAL EUV MASK BLANK
- Publication number 20220187697
- Publication date Jun 16, 2022
- Applied Materials, Inc.
- Herng Yau Yoong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Surface Topography Measurement Apparatus And Method
- Publication number 20220170866
- Publication date Jun 2, 2022
- Applied Materials, Inc.
- Weimin Li
- G01 - MEASURING TESTING
Information Patent Application
PHYSICAL VAPOR DEPOSITION SYSTEM AND PROCESSES
- Publication number 20220107558
- Publication date Apr 7, 2022
- Applied Materials, Inc.
- Vibhu Jindal
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and Method of Measuring Refractive Index of EUV Mask Absorber
- Publication number 20210382398
- Publication date Dec 9, 2021
- Applied Materials, Inc.
- Wen Xiao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and Method to Measure Refractive Index at Specific Wavelengths
- Publication number 20210381967
- Publication date Dec 9, 2021
- Applied Materials, Inc.
- Wen Xiao
- G01 - MEASURING TESTING
Information Patent Application
Extreme Ultraviolet Mask Blank Defect Reduction
- Publication number 20210333703
- Publication date Oct 28, 2021
- Applied Materials, Inc.
- Wen Xiao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Extreme Ultraviolet Mask Blank Hard Mask Materials
- Publication number 20210232040
- Publication date Jul 29, 2021
- Applied Materials, Inc.
- Shuwei Liu
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
Extreme Ultraviolet Mask Blank Hard Mask Materials
- Publication number 20210232041
- Publication date Jul 29, 2021
- Applied Materials, Inc.
- Shuwei Liu
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
Extreme Ultraviolet Mask Absorber Materials
- Publication number 20210232039
- Publication date Jul 29, 2021
- Applied Materials, Inc.
- Shuwei Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXTREME ULTRAVIOLET MASK BLANK DEFECT REDUCTION METHODS
- Publication number 20210124252
- Publication date Apr 29, 2021
- Applied Materials, Inc.
- Wen Xiao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
EXTREME ULTRAVIOLET MASK BLANK DEFECT REDUCTION METHODS
- Publication number 20210124253
- Publication date Apr 29, 2021
- Applied Materials, Inc.
- Herng Yau Yoong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV Mask Blanks And Methods Of Manufacture
- Publication number 20210041781
- Publication date Feb 11, 2021
- Applied Materials, Inc., Santa Clara, CA
- Wen Xiao
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
Physical Vapor Deposition Chamber Cleaning Processes
- Publication number 20210032742
- Publication date Feb 4, 2021
- Applied Materials, Inc.
- Vibhu Jindal
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MEMORY CELL AND METHOD OF FORMING THE SAME
- Publication number 20210013407
- Publication date Jan 14, 2021
- Agency for Science, Technology and Research
- Wen Xiao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXTREME ULTRAVIOLET MASK WITH EMBEDDED ABSORBER LAYER
- Publication number 20200371431
- Publication date Nov 26, 2020
- Applied Materials, Inc.
- Wen Xiao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System And Method To Control PVD Deposition Uniformity
- Publication number 20200335331
- Publication date Oct 22, 2020
- Applied Materials, Inc.
- Wen Xiao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System And Method To Control PVD Deposition Uniformity
- Publication number 20200332412
- Publication date Oct 22, 2020
- Applied Materials, Inc.
- Wen Xiao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Graded Interface In Bragg Reflector
- Publication number 20200333700
- Publication date Oct 22, 2020
- Applied Materials, Inc.
- Wen Xiao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Extreme Ultraviolet Mask Blank With Multilayer Absorber And Method...
- Publication number 20200278603
- Publication date Sep 3, 2020
- Applied Materials, Inc.
- Wen Xiao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Physical Vapor Deposition System And Processes
- Publication number 20200277697
- Publication date Sep 3, 2020
- Applied Materials, Inc.
- Sanjay Bhat
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Physical Vapor Deposition System And Processes
- Publication number 20200277696
- Publication date Sep 3, 2020
- Applied Materials, Inc.
- Wen Xiao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Physical Vapor Deposition System And Processes
- Publication number 20200277698
- Publication date Sep 3, 2020
- Applied Materials, Inc.
- Vibhu Jindal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Physical Vapor Deposition Target Assembly
- Publication number 20200241409
- Publication date Jul 30, 2020
- Applied Materials, Inc.
- Wen Xiao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Person

Patents Grantslast 30 patents

Multilayer extreme ultraviolet reflector materials

Extreme ultraviolet mask blank defect reduction

Graded interface in Bragg reflector

Extreme ultraviolet mask blank defect reduction methods

Memory cell and method of forming the same

Physical vapor deposition system and processes

Extreme ultraviolet mask absorber materials

Surface topography measurement apparatus and method

Physical vapor deposition system and processes

Extreme ultraviolet mask blank hard mask materials

System and method to control PVD deposition uniformity

Physical vapor deposition system and processes

Extreme ultraviolet mask blank hard mask materials

Method and apparatus to improve EUV mask blank flatness

Method and apparatus to anneal EUV mask blank

System and method of measuring refractive index of EUV mask absorber

Surface topography measurement apparatus and method

System and method to control PVD deposition uniformity

EUV mask blanks and methods of manufacture

Extreme ultraviolet mask with embedded absorber layer

System and method to measure refractive index at specific wavelengths

Physical vapor deposition chamber cleaning processes

Graded interface in bragg reflector

Physical vapor deposition system and processes

Extreme ultraviolet mask absorber and processes for manufacture

Patents Applicationslast 30 patents

MULTILAYER EXTREME ULTRAVIOLET REFLECTORS

MULTILAYER EXTREME ULTRAVIOLET REFLECTOR MATERIALS

MULTILAYER EXTREME ULTRAVIOLET REFLECTORS

Surface Topography Measurement Apparatus And Method

Graded Interface In Bragg Reflector

METHOD AND APPARATUS TO IMPROVE EUV MASK BLANK FLATNESS

Process Kit Conditioning Chamber

METHOD AND APPARATUS TO ANNEAL EUV MASK BLANK

Surface Topography Measurement Apparatus And Method

PHYSICAL VAPOR DEPOSITION SYSTEM AND PROCESSES

System and Method of Measuring Refractive Index of EUV Mask Absorber

System and Method to Measure Refractive Index at Specific Wavelengths

Extreme Ultraviolet Mask Blank Defect Reduction

Extreme Ultraviolet Mask Blank Hard Mask Materials

Extreme Ultraviolet Mask Blank Hard Mask Materials

Extreme Ultraviolet Mask Absorber Materials

EXTREME ULTRAVIOLET MASK BLANK DEFECT REDUCTION METHODS

EXTREME ULTRAVIOLET MASK BLANK DEFECT REDUCTION METHODS

EUV Mask Blanks And Methods Of Manufacture

Physical Vapor Deposition Chamber Cleaning Processes

MEMORY CELL AND METHOD OF FORMING THE SAME

EXTREME ULTRAVIOLET MASK WITH EMBEDDED ABSORBER LAYER

System And Method To Control PVD Deposition Uniformity

System And Method To Control PVD Deposition Uniformity

Graded Interface In Bragg Reflector

Extreme Ultraviolet Mask Blank With Multilayer Absorber And Method...

Physical Vapor Deposition System And Processes

Physical Vapor Deposition System And Processes

Physical Vapor Deposition System And Processes

Physical Vapor Deposition Target Assembly