Wendy H. Yeh

Person

Mountain View, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Graded ARC for high NA and immersion lithography
- Patent number 8,125,034
- Issue date Feb 28, 2012
- Applied Materials, Inc.
- Wendy H. Yeh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Graded ARC for high NA and immersion lithography
- Patent number 7,776,516
- Issue date Aug 17, 2010
- Applied Materials, Inc.
- Wendy H. Yeh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of reducing critical dimension bias during fabrication of a...
- Patent number 7,737,040
- Issue date Jun 15, 2010
- Applied Materials, Inc.
- Christopher Dennis Bencher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Techniques for the use of amorphous carbon (APF) for various etch a...
- Patent number 7,718,081
- Issue date May 18, 2010
- Applied Materials, Inc.
- Wei Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hydrogen treatment to improve photoresist adhesion and rework consi...
- Patent number 7,642,195
- Issue date Jan 5, 2010
- Applied Materials, Inc.
- Wendy H. Yeh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liquid precursors for the CVD deposition of amorphous carbon films
- Patent number 7,407,893
- Issue date Aug 5, 2008
- Applied Materials, Inc.
- Martin Jay Seamons
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Reticle fabrication using a removable hard mask
- Patent number 7,365,014
- Issue date Apr 29, 2008
- Applied Materials, Inc.
- Christopher Dennis Bencher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Absorber layer for DSA processing
- Patent number 7,262,106
- Issue date Aug 28, 2007
- Applied Materials, Inc.
- Luc Van Autryve
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Absorber layer for DSA processing
- Patent number 7,109,087
- Issue date Sep 19, 2006
- Applied Materials, Inc.
- Luc Van Autryve
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ashable layers for reducing critical dimensions of integrated circu...
- Patent number 7,105,442
- Issue date Sep 12, 2006
- Applied Materials, Inc.
- Hongching Shan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for the reduction and elimination of particulate contaminat...
- Patent number 7,094,442
- Issue date Aug 22, 2006
- Applied Materials, Inc.
- Martin Jay Seamons
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Techniques for the use of amorphous carbon (APF) for various etch a...
- Patent number 7,064,078
- Issue date Jun 20, 2006
- Applied Materials
- Wei Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nitrogen-free antireflective coating for use with photolithographic...
- Patent number 6,853,043
- Issue date Feb 8, 2005
- Applied Materials, Inc.
- Wendy H. Yeh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
COMPENSATING CONCENTRATION UNCERTAINITY
- Publication number 20130284090
- Publication date Oct 31, 2013
- Ganesh BALASUBRAMANIAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GRADED ARC FOR HIGH NA AND IMMERSION LITHOGRAPHY
- Publication number 20100239979
- Publication date Sep 23, 2010
- Wendy H. Yeh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS FOR HIGH TEMPERATURE DEPOSITION OF AN AMORPHOUS CARBON LAYER
- Publication number 20090093128
- Publication date Apr 9, 2009
- MARTIN JAY SEAMONS
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS OF TRIMMING AMORPHOUS CARBON FILM FOR FORMING ULTRA THIN ST...
- Publication number 20090004875
- Publication date Jan 1, 2009
- Meihua Shen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA-INDUCED CHARGE DAMAGE CONTROL FOR PLASMA ENHANCED CHEMICAL V...
- Publication number 20080254233
- Publication date Oct 16, 2008
- KWANGDUK DOUGLAS LEE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ABSORBER LAYER FOR DSA PROCESSING
- Publication number 20080230154
- Publication date Sep 25, 2008
- Applied Materials, Inc.
- Luc Van Autryve
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of reducing critical dimension bias during fabrication of a...
- Publication number 20080096138
- Publication date Apr 24, 2008
- APPLIED MATERIALS, INC.
- Christopher Dennis Bencher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Graded ARC for high na and immersion lithography
- Publication number 20080020319
- Publication date Jan 24, 2008
- APPLIED MATERIALS, INC.
- Wendy H. Yeh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS FOR THE REDUCTION AND ELIMINATION OF PARTICULATE CONTAMINAT...
- Publication number 20070286965
- Publication date Dec 13, 2007
- Martin Jay Seamons
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ABSORBER LAYER FOR DSA PROCESSING
- Publication number 20070243721
- Publication date Oct 18, 2007
- APPLIED MATERIALS, INC.
- LUC VAN AUTRYVE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Enhancement of remote plasma source clean for dielectric films
- Publication number 20070207275
- Publication date Sep 6, 2007
- APPLIED MATERIALS, INC.
- Thomas Nowak
- B08 - CLEANING
Information Patent Application
Hydrogen treatment to improve photoresist adhesion and rework consi...
- Publication number 20070072422
- Publication date Mar 29, 2007
- Applied Materials, Inc.
- Wendy H. Yeh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ABSORBER LAYER FOR DSA PROCESSING
- Publication number 20060292808
- Publication date Dec 28, 2006
- APPLIED MATERIALS, INC.
- Luc Van Autryve
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUES FOR THE USE OF AMORPHOUS CARBON (APF) FOR VARIOUS ETCH A...
- Publication number 20060231524
- Publication date Oct 19, 2006
- Wei Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR THE REDUCTION AND ELIMINATION OF PARTICULATE CONTAMINAT...
- Publication number 20060222771
- Publication date Oct 5, 2006
- Martin Jay Seamons
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods for the reduction and elimination of particulate contaminat...
- Publication number 20060014397
- Publication date Jan 19, 2006
- Martin Jay Seamons
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Liquid precursors for the CVD deposition of amorphous carbon films
- Publication number 20050287771
- Publication date Dec 29, 2005
- APPLIED MATERIALS, INC.
- Martin Jay Seamons
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Techniques for the use of amorphous carbon (APF) for various etch a...
- Publication number 20050167394
- Publication date Aug 4, 2005
- Wei liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Reticle fabrication using a removable hard mask
- Publication number 20050170655
- Publication date Aug 4, 2005
- Christopher Dennis Bencher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Process kit design for deposition chamber
- Publication number 20050150452
- Publication date Jul 14, 2005
- Soovo Sen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Absorber layer for DSA processing
- Publication number 20050074956
- Publication date Apr 7, 2005
- APPLIED MATERIALS, INC.
- Luc Van Autryve
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Absorber layer for DSA processing
- Publication number 20050074986
- Publication date Apr 7, 2005
- APPLIED MATERIALS, INC.
- Luc Van Autryve
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Nitrogen-free antireflective coating for use with photolithographic...
- Publication number 20040087139
- Publication date May 6, 2004
- Applied Materials, Inc.
- Wendy H. Yeh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Ashable layers for reducing critical dimensions of integrated circu...
- Publication number 20030219988
- Publication date Nov 27, 2003
- APPLIED MATERIALS, INC.
- Hongqing Shan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Wendy H. Yeh

Person

Patents Grantslast 30 patents

Graded ARC for high NA and immersion lithography

Graded ARC for high NA and immersion lithography

Method of reducing critical dimension bias during fabrication of a...

Techniques for the use of amorphous carbon (APF) for various etch a...

Hydrogen treatment to improve photoresist adhesion and rework consi...

Liquid precursors for the CVD deposition of amorphous carbon films

Reticle fabrication using a removable hard mask

Absorber layer for DSA processing

Absorber layer for DSA processing

Ashable layers for reducing critical dimensions of integrated circu...

Methods for the reduction and elimination of particulate contaminat...

Techniques for the use of amorphous carbon (APF) for various etch a...

Nitrogen-free antireflective coating for use with photolithographic...

Patents Applicationslast 30 patents

COMPENSATING CONCENTRATION UNCERTAINITY

GRADED ARC FOR HIGH NA AND IMMERSION LITHOGRAPHY

METHODS FOR HIGH TEMPERATURE DEPOSITION OF AN AMORPHOUS CARBON LAYER

METHODS OF TRIMMING AMORPHOUS CARBON FILM FOR FORMING ULTRA THIN ST...

PLASMA-INDUCED CHARGE DAMAGE CONTROL FOR PLASMA ENHANCED CHEMICAL V...

ABSORBER LAYER FOR DSA PROCESSING

Method of reducing critical dimension bias during fabrication of a...

Graded ARC for high na and immersion lithography

METHODS FOR THE REDUCTION AND ELIMINATION OF PARTICULATE CONTAMINAT...

ABSORBER LAYER FOR DSA PROCESSING

Enhancement of remote plasma source clean for dielectric films

Hydrogen treatment to improve photoresist adhesion and rework consi...

ABSORBER LAYER FOR DSA PROCESSING

TECHNIQUES FOR THE USE OF AMORPHOUS CARBON (APF) FOR VARIOUS ETCH A...

METHODS FOR THE REDUCTION AND ELIMINATION OF PARTICULATE CONTAMINAT...

Methods for the reduction and elimination of particulate contaminat...

Liquid precursors for the CVD deposition of amorphous carbon films

Techniques for the use of amorphous carbon (APF) for various etch a...

Reticle fabrication using a removable hard mask

Process kit design for deposition chamber

Absorber layer for DSA processing

Absorber layer for DSA processing

Nitrogen-free antireflective coating for use with photolithographic...

Ashable layers for reducing critical dimensions of integrated circu...