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Wendy Yan
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Somers, NY, US
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last 30 patents
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Patent Grant
In-situ plasma etch for TERA hard mask materials
Patent number
6,903,023
Issue date
Jun 7, 2005
International Business Machines Corporation
Richard S. Wise
H01 - BASIC ELECTRIC ELEMENTS
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Patent Grant
Nitrogen-based highly polymerizing plasma process for etching of or...
Patent number
6,686,296
Issue date
Feb 3, 2004
International Business Machines Corp.
Gregory Costrini
H01 - BASIC ELECTRIC ELEMENTS
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Patent Grant
High-density plasma, organic anti-reflective coating etch system co...
Patent number
6,228,279
Issue date
May 8, 2001
International Business Machines Corporation
Michael Armacost
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
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Patent Application
In-situ plasma etch for TERA hard mask materials
Publication number
20040053504
Publication date
Mar 18, 2004
International Business Machines Corporation
Richard S. Wise
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY