Wenjie Li

Person

Poughkeepsie, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Coating compositions suitable for use with an overcoated photoresist
- Patent number 9,726,977
- Issue date Aug 8, 2017
- GLOBALFOUNDRIES Inc.
- James F. Cameron
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Wet developable bottom antireflective coating composition and metho...
- Patent number 8,202,678
- Issue date Jun 19, 2012
- International Business Machines Corporation
- Kuang-Jung J. Chen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Fluorinated half ester of maleic anhydride polymers for dry 193 nm...
- Patent number 7,754,820
- Issue date Jul 13, 2010
- International Business Machines Corporation
- Wu-Song S. Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Top coat material and use thereof in lithography processes
- Patent number 7,700,262
- Issue date Apr 20, 2010
- International Business Machines Corporation
- Wenjie Li
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive photoresist composition with a polymer including a fluoros...
- Patent number 7,651,831
- Issue date Jan 26, 2010
- International Business Machines Corporation
- Wenjie Li
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive photoresist composition with a polymer including a fluoros...
- Patent number 7,638,264
- Issue date Dec 29, 2009
- International Business Machines Corporation
- Wenjie Li
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Ultrathin polymeric photoacid generator layer and method of fabrica...
- Patent number 7,638,266
- Issue date Dec 29, 2009
- International Business Machines Corporation
- Marie Angelopoulos
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Wet developable bottom antireflective coating composition and metho...
- Patent number 7,563,563
- Issue date Jul 21, 2009
- International Business Machines Corporation
- Kuang-Jung J. Chen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Fluorinated half ester of maleic anhydride polymers for dry 193 nm...
- Patent number 7,435,537
- Issue date Oct 14, 2008
- International Business Machines Corporation
- Wu-Song S. Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Top coat material and use thereof in lithography processes
- Patent number 7,335,456
- Issue date Feb 26, 2008
- International Business Machines Corporation
- Wenjie Li
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
High sensitivity resist compositions for electron-based lithography
- Patent number 7,314,700
- Issue date Jan 1, 2008
- International Business Machines Corporation
- Wu-Song Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative photoresist composition including non-crosslinking chemistry
- Patent number 7,235,342
- Issue date Jun 26, 2007
- International Business Machines Corporation
- Wenjie Li
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Fluorinated photoresist materials with improved etch resistant prop...
- Patent number 7,217,496
- Issue date May 15, 2007
- International Business Machines Corporation
- Mahmoud Khojasteh
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Negative photoresist and method of using thereof
- Patent number 7,081,326
- Issue date Jul 25, 2006
- International Business Machines Corporation
- Wenjie Li
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive photoresist composition with a polymer including a fluoros...
- Patent number 7,063,931
- Issue date Jun 20, 2006
- International Business Machines Corporation
- Wenjie Li
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Negative photoresist and method of using thereof
- Patent number 7,011,923
- Issue date Mar 14, 2006
- International Business Machines Corporation
- Wenjie Li
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Negative photoresist composition involving non-crosslinking chemistry
- Patent number 6,991,890
- Issue date Jan 31, 2006
- International Business Machines Corporation
- Wenjie Li
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Negative resist composition with fluorosulfonamide-containing polymer
- Patent number 6,949,325
- Issue date Sep 27, 2005
- International Business Machines Corporation
- Wenjie Li
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist compositions with polymers having 2-cyano acrylic monomer
- Patent number 6,902,874
- Issue date Jun 7, 2005
- International Business Machines Corporation
- Wenjie Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist compositions containing non-polymeric silicon
- Patent number 6,770,418
- Issue date Aug 3, 2004
- International Business Machines Corporation
- Wenjie Li
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Cyclic olefin-based resist compositions having improved image stabi...
- Patent number 6,756,180
- Issue date Jun 29, 2004
- International Business Machines Corporation
- Wenjie Li
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Thiophene-containing photo acid generators for photolithography
- Patent number 6,696,216
- Issue date Feb 24, 2004
- International Business Machines Corporation
- Wenjie Li
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist compositions with polymers having 2-cyano acrylic monomer
- Patent number 6,635,401
- Issue date Oct 21, 2003
- International Business Machines Corporation
- Wenjie Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist compositions with polymers having pendant groups containing...
- Patent number 6,534,239
- Issue date Mar 18, 2003
- International Business Machines Corporation
- Pushkara Rao Varanasi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
Coating compositions suitable for use with an overcoated photoresist
- Publication number 20100297557
- Publication date Nov 25, 2010
- Rohm and Haas Electronic Materials L.L.C.
- James F. Cameron
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
WET DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITION AND METHO...
- Publication number 20090291392
- Publication date Nov 26, 2009
- International Business Machines Corporation
- Kuang-Jung J. Chen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
AROMATIC FLUORINE-FREE PHOTOACID GENERATORS AND PHOTORESIST COMPOSI...
- Publication number 20090181319
- Publication date Jul 16, 2009
- International Business Machines Corporation
- Wenjie Li
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FLUORINATED HALF ESTER OF MALEIC ANHYDRIDE POLYMERS FOR DRY 193 NM...
- Publication number 20080286686
- Publication date Nov 20, 2008
- International Business Machines Corporation
- Wu-Song S. Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE PHOTORESIST COMPOSITION WITH A POLYMER INCLUDING A FLUOROS...
- Publication number 20080233514
- Publication date Sep 25, 2008
- International Business Machines Corporation
- Wenjie Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TOP COAT MATERIAL AND USE THEREOF IN LITHOGRAPHY PROCESSES
- Publication number 20080166568
- Publication date Jul 10, 2008
- International Business Machines Corporation
- Wenjie Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TOP COAT MATERIAL AND USE THEREOF IN LITHOGRAPHY PROCESSES
- Publication number 20080038676
- Publication date Feb 14, 2008
- International Business Machines Corporation
- Wenjie Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FLUORINATED HALF ESTER OF MALEIC ANHYDRIDE POLYMERS FOR DRY 193 NM...
- Publication number 20080026315
- Publication date Jan 31, 2008
- International Business Machines Corporation
- Wu-Song S. Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Wet developable bottom antireflective coating composition and metho...
- Publication number 20070243484
- Publication date Oct 18, 2007
- Kuang-Jung J. Chen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Bottom antireflective coating composition and method for use thereof
- Publication number 20070231736
- Publication date Oct 4, 2007
- Kuang-Jung J. Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive photoresist composition with a polymer including a fluoros...
- Publication number 20060216643
- Publication date Sep 28, 2006
- International Business Machines Corporation
- Wenjie Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
High sensitivity resist compositions for electron-based lithography
- Publication number 20060127800
- Publication date Jun 15, 2006
- Wu-Song Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Fluorinated photoresist materials with improved etch resistant prop...
- Publication number 20060105269
- Publication date May 18, 2006
- International Business Machines Corporation
- Mahmoud Khojasteh
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Material and process for etched structure filling and planarizing
- Publication number 20060089000
- Publication date Apr 27, 2006
- International Business Machines Corporation
- Ronald A. Della Guardia
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Ultrathin polymeric photoacid generator layer and method of fabrica...
- Publication number 20060035167
- Publication date Feb 16, 2006
- International Business Machines Corporation
- Marie Angelopoulos
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Top coat material and use thereof in lithography processes
- Publication number 20050266354
- Publication date Dec 1, 2005
- Wenjie Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Negative photoresist and method of using thereof
- Publication number 20050227167
- Publication date Oct 13, 2005
- International Business Machines Corporation
- Wenjie Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Negative photoresist and method of using thereof
- Publication number 20050202339
- Publication date Sep 15, 2005
- International Business Machines Corporation
- Wenjie Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Negative photoresist composition involving non-crosslinking chemistry
- Publication number 20050175928
- Publication date Aug 11, 2005
- International Business Machines Corporation
- Wenjie Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Negative photoresist composition including non-crosslinking chemistry
- Publication number 20050164507
- Publication date Jul 28, 2005
- Wenjie Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive photoresist composition with a polymer including a fluoros...
- Publication number 20050153232
- Publication date Jul 14, 2005
- International Business Machines Corporation
- Wenjie Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Negative resist composition with fluorosulfonamide-containing polymer
- Publication number 20050058930
- Publication date Mar 17, 2005
- Wenjie Li
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
CYCLIC OLEFIN-BASED RESIST COMPOSITIONS HAVING IMPROVED IMAGE STABI...
- Publication number 20040076903
- Publication date Apr 22, 2004
- International Business Machines Corporation
- Wenjie Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist compositions with polymers having 2-cyano acrylic monomer
- Publication number 20040072099
- Publication date Apr 15, 2004
- Wenjie Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive resist compositions containing non-polymeric silicon aditives
- Publication number 20030124453
- Publication date Jul 3, 2003
- International Business Machines Corporation
- Wenjie Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist compositions with polymers having 2-cyano acrylic monomer
- Publication number 20030008502
- Publication date Jan 9, 2003
- International Business Machines Corporation
- Wenjie Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Thiophene-containing photo acid generators for photolithography
- Publication number 20030008230
- Publication date Jan 9, 2003
- International Business Machines Corporation
- Wenjie Li
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Resist compositions with polymers having pendant groups containing...
- Publication number 20020182534
- Publication date Dec 5, 2002
- International Business Machines Corporation
- Pushkara Rao Varanasi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Person

Patents Grantslast 30 patents

Coating compositions suitable for use with an overcoated photoresist

Wet developable bottom antireflective coating composition and metho...

Fluorinated half ester of maleic anhydride polymers for dry 193 nm...

Top coat material and use thereof in lithography processes

Positive photoresist composition with a polymer including a fluoros...

Positive photoresist composition with a polymer including a fluoros...

Ultrathin polymeric photoacid generator layer and method of fabrica...

Wet developable bottom antireflective coating composition and metho...

Fluorinated half ester of maleic anhydride polymers for dry 193 nm...

Top coat material and use thereof in lithography processes

High sensitivity resist compositions for electron-based lithography

Negative photoresist composition including non-crosslinking chemistry

Fluorinated photoresist materials with improved etch resistant prop...

Negative photoresist and method of using thereof

Positive photoresist composition with a polymer including a fluoros...

Negative photoresist and method of using thereof

Negative photoresist composition involving non-crosslinking chemistry

Negative resist composition with fluorosulfonamide-containing polymer

Resist compositions with polymers having 2-cyano acrylic monomer

Positive resist compositions containing non-polymeric silicon

Cyclic olefin-based resist compositions having improved image stabi...

Thiophene-containing photo acid generators for photolithography

Resist compositions with polymers having 2-cyano acrylic monomer

Resist compositions with polymers having pendant groups containing...

Patents Applicationslast 30 patents

Coating compositions suitable for use with an overcoated photoresist

WET DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITION AND METHO...

AROMATIC FLUORINE-FREE PHOTOACID GENERATORS AND PHOTORESIST COMPOSI...

FLUORINATED HALF ESTER OF MALEIC ANHYDRIDE POLYMERS FOR DRY 193 NM...

POSITIVE PHOTORESIST COMPOSITION WITH A POLYMER INCLUDING A FLUOROS...

TOP COAT MATERIAL AND USE THEREOF IN LITHOGRAPHY PROCESSES

TOP COAT MATERIAL AND USE THEREOF IN LITHOGRAPHY PROCESSES

FLUORINATED HALF ESTER OF MALEIC ANHYDRIDE POLYMERS FOR DRY 193 NM...

Wet developable bottom antireflective coating composition and metho...

Bottom antireflective coating composition and method for use thereof

Positive photoresist composition with a polymer including a fluoros...

High sensitivity resist compositions for electron-based lithography

Fluorinated photoresist materials with improved etch resistant prop...

Material and process for etched structure filling and planarizing

Ultrathin polymeric photoacid generator layer and method of fabrica...

Top coat material and use thereof in lithography processes

Negative photoresist and method of using thereof

Negative photoresist and method of using thereof

Negative photoresist composition involving non-crosslinking chemistry

Negative photoresist composition including non-crosslinking chemistry

Positive photoresist composition with a polymer including a fluoros...

Negative resist composition with fluorosulfonamide-containing polymer

CYCLIC OLEFIN-BASED RESIST COMPOSITIONS HAVING IMPROVED IMAGE STABI...

Resist compositions with polymers having 2-cyano acrylic monomer

Positive resist compositions containing non-polymeric silicon aditives

Resist compositions with polymers having 2-cyano acrylic monomer

Thiophene-containing photo acid generators for photolithography

Resist compositions with polymers having pendant groups containing...