Wenli Collison

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
System and method for controlling plasma with an adjustable couplin...
- Patent number 9,190,302
- Issue date Nov 17, 2015
- Lam Research Corporation
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for controlling plasma with an adjustable couplin...
- Patent number 8,518,211
- Issue date Aug 27, 2013
- Lam Research Corporation
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum plasma processor having a chamber with electrodes and a coil...
- Patent number 8,114,246
- Issue date Feb 14, 2012
- Lam Research Corporation
- Tuqiang Ni
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vacuum plasma processor having a chamber with electrodes and a coil...
- Patent number 7,105,102
- Issue date Sep 12, 2006
- Lam Research Corporation
- Tuqiang Ni
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for detecting the endpoint of a photoresist stripping process
- Patent number 7,077,971
- Issue date Jul 18, 2006
- Lam Research Corporation
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum plasma processor having a chamber with electrodes and a coil...
- Patent number 6,716,303
- Issue date Apr 6, 2004
- Lam Research Corporation
- Tuqiang Ni
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Inductively coupled plasma downstream strip module
- Patent number 6,692,649
- Issue date Feb 17, 2004
- Lam Research Corporation
- Wenli Z. Collison
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for improving uniformity and reducing etch rate variation of...
- Patent number 6,514,378
- Issue date Feb 4, 2003
- Lam Research Corporation
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for detecting the endpoint of a photoresist stripping pro...
- Patent number 6,451,158
- Issue date Sep 17, 2002
- Lam Research Corporation
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of an apparatus for obtaining neutral dissociated gas atoms
- Patent number 6,388,383
- Issue date May 14, 2002
- Lam Research Corporation
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Elevated stationary uniformity ring design
- Patent number 6,257,168
- Issue date Jul 10, 2001
- Lam Research Corporation
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processor with coil having variable rf coupling
- Patent number 6,229,264
- Issue date May 8, 2001
- Lam Research Corporation
- Tiqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inductively coupled plasma downstream strip module
- Patent number 6,203,657
- Issue date Mar 20, 2001
- Lam Research Corporation
- Wenli Z. Collison
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing chamber with optical window cleaned using process gas
- Patent number 6,052,176
- Issue date Apr 18, 2000
- Lam Research Corporation
- Tuqiang Ni
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
System and Method for Controlling Plasma With an Adjustable Couplin...
- Publication number 20130306240
- Publication date Nov 21, 2013
- LAM RESEARCH CORPORATION
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM PLASMA PROCESSOR HAVING A CHAMBER WITH ELECTRODES AND A COIL...
- Publication number 20070044915
- Publication date Mar 1, 2007
- LAM RESEARCH CORPORATION
- Tuqiang Ni
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
System and method for controlling plasma with an adjustable couplin...
- Publication number 20060112878
- Publication date Jun 1, 2006
- LAM RESEARCH CORPORATION
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Vacuum plasma processor having a chamber with electrodes and a coil...
- Publication number 20040154747
- Publication date Aug 12, 2004
- Lam Research Corporation
- Tuqiang Ni
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Inductively coupled plasma downstream strip module
- Publication number 20040149223
- Publication date Aug 5, 2004
- Lam Research Corporation
- Wenli Z. Collison
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and method for controlling plasma with an adjustable couplin...
- Publication number 20040118344
- Publication date Jun 24, 2004
- LAM RESEARCH CORPORATION
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Inductively coupled plasma downstream strip module
- Publication number 20010023741
- Publication date Sep 27, 2001
- Wenli Z. Collison
- H01 - BASIC ELECTRIC ELEMENTS

Wenli Collison

Person

Patents Grantslast 30 patents

System and method for controlling plasma with an adjustable couplin...

System and method for controlling plasma with an adjustable couplin...

Vacuum plasma processor having a chamber with electrodes and a coil...

Vacuum plasma processor having a chamber with electrodes and a coil...

Methods for detecting the endpoint of a photoresist stripping process

Vacuum plasma processor having a chamber with electrodes and a coil...

Inductively coupled plasma downstream strip module

Method for improving uniformity and reducing etch rate variation of...

Apparatus for detecting the endpoint of a photoresist stripping pro...

Method of an apparatus for obtaining neutral dissociated gas atoms

Elevated stationary uniformity ring design

Plasma processor with coil having variable rf coupling

Inductively coupled plasma downstream strip module

Processing chamber with optical window cleaned using process gas

Patents Applicationslast 30 patents

System and Method for Controlling Plasma With an Adjustable Couplin...

VACUUM PLASMA PROCESSOR HAVING A CHAMBER WITH ELECTRODES AND A COIL...

System and method for controlling plasma with an adjustable couplin...

Vacuum plasma processor having a chamber with electrodes and a coil...

Inductively coupled plasma downstream strip module

System and method for controlling plasma with an adjustable couplin...

Inductively coupled plasma downstream strip module