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Singapore, SG
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last 30 patents
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Patent Grant
Method for reducing argon diffusion from high density plasma films
Patent number
7,297,640
Issue date
Nov 20, 2007
Chartered Semiconductor Manufacturing Ltd.
Jun Xie
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Patents Applications
last 30 patents
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Patent Application
Method for reducing argon diffusion from high density plasma films
Publication number
20060154491
Publication date
Jul 13, 2006
Chartered Semiconductor Manufacturing Ltd.
Jun Xie
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...