Werner Stickel

Person

Fairfield County, CT, US

People

Patents Grantslast 30 patents

Information Patent Grant
Optimized curvilinear variable axis lens doublet for charged partic...
- Patent number 6,617,585
- Issue date Sep 9, 2003
- Nikon Corporation
- Werner Stickel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High performance source for electron beam projection lithography
- Patent number 6,596,999
- Issue date Jul 22, 2003
- Nikon Corporation
- Steven D. Golladay
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stencil reticle incorporating scattering features for electron beam...
- Patent number 6,541,783
- Issue date Apr 1, 2003
- Nikon Corporation
- Christopher F. Robinson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetric blanking for high stability in electron beam exposure sys...
- Patent number 6,483,117
- Issue date Nov 19, 2002
- Nikon Corporation
- Clay S. Clement
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Image position and lens field control in electron beam systems
- Patent number 6,420,713
- Issue date Jul 16, 2002
- Nikon Corporation
- Werner Stickel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-element deflection aberration correction for electron beam li...
- Patent number 6,180,947
- Issue date Jan 30, 2001
- Nikon Corporation
- Werner Stickel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam projection lithography system (EBPS)
- Patent number 6,069,684
- Issue date May 30, 2000
- International Business Machines Corporation
- Steven D. Golladay
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Blanking system for electron beam projection system
- Patent number 6,023,067
- Issue date Feb 8, 2000
- Nikon Corporation
- Werner Stickel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Illumination deflection system for E-beam projection
- Patent number 6,005,250
- Issue date Dec 21, 1999
- Nikon Corporation
- Werner Stickel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam performance measurement system and method the...
- Patent number 5,936,252
- Issue date Aug 10, 1999
- International Business Machines Corporation
- Werner Stickel
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Correction of pattern dependent position errors in electron beam li...
- Patent number 5,798,528
- Issue date Aug 25, 1998
- International Business Machines Corporation
- Rainer Butsch
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Projection reticle transmission control for coulomb interaction ana...
- Patent number 5,751,004
- Issue date May 12, 1998
- International Business Machines Corporation
- Christopher Frederick Robinson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam performance measurement system and method thereof
- Patent number 5,712,488
- Issue date Jan 27, 1998
- International Business Machines Corporation
- Werner Stickel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Curvilinear variable axis lens correction with crossed coils
- Patent number 5,708,274
- Issue date Jan 13, 1998
- International Business Machines Corporation
- Guenther O. Langner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scattering reticle for electron beam systems
- Patent number 5,674,413
- Issue date Oct 7, 1997
- International Business Machines Corporation
- Hans Christian Pfeiffer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Electron beam lithography system with low brightness
- Patent number 5,633,507
- Issue date May 27, 1997
- International Business Machines Corporation
- Hans C. Pfeiffer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron beam lithography system
- Patent number 5,545,902
- Issue date Aug 13, 1996
- International Business Machines Corporation
- Hans C. Pfeiffer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron beam lithography system
- Patent number 5,466,904
- Issue date Nov 14, 1995
- International Business Machines Corporation
- Hans C. Pfeiffer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Spinning reticle scanning projection lithography exposure system an...
- Patent number 5,434,424
- Issue date Jul 18, 1995
- International Business Machines Corporation
- Werner Stickel
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Dynamic compensation of non-linear electron beam landing angle in v...
- Patent number 5,285,074
- Issue date Feb 8, 1994
- International Business Machines Corporation
- Don F. Haire
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Telecentric sub-field deflection with vail
- Patent number 4,859,856
- Issue date Aug 22, 1989
- International Business Machines Corporation
- Timothy R. Groves
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Conductive coated semiconductor electrostatic deflection plates
- Patent number 4,737,644
- Issue date Apr 12, 1988
- International Business Machines Corporation
- Douglas G. Cullum
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
System for contactless electrical property testing of multi-layer c...
- Patent number 4,417,203
- Issue date Nov 22, 1983
- International Business Machines Corporation
- Hans C. Pfeiffer
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
High performance source for electron beam projection lithography
- Publication number 20030085364
- Publication date May 8, 2003
- Steven D. Golladay
- H01 - BASIC ELECTRIC ELEMENTS

Werner Stickel

Person

Patents Grantslast 30 patents

Optimized curvilinear variable axis lens doublet for charged partic...

High performance source for electron beam projection lithography

Stencil reticle incorporating scattering features for electron beam...

Symmetric blanking for high stability in electron beam exposure sys...

Image position and lens field control in electron beam systems

Multi-element deflection aberration correction for electron beam li...

Electron beam projection lithography system (EBPS)

Blanking system for electron beam projection system

Illumination deflection system for E-beam projection

Charged particle beam performance measurement system and method the...

Correction of pattern dependent position errors in electron beam li...

Projection reticle transmission control for coulomb interaction ana...

Electron beam performance measurement system and method thereof

Curvilinear variable axis lens correction with crossed coils

Scattering reticle for electron beam systems

Electron beam lithography system with low brightness

Electron beam lithography system

Electron beam lithography system

Spinning reticle scanning projection lithography exposure system an...

Dynamic compensation of non-linear electron beam landing angle in v...

Telecentric sub-field deflection with vail

Conductive coated semiconductor electrostatic deflection plates

System for contactless electrical property testing of multi-layer c...

Patents Applicationslast 30 patents

High performance source for electron beam projection lithography