Wilfried CLAUSS

Person

Tuebingen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Mirror for the EUV wavelength range, substrate for such a mirror, p...
- Patent number 9,494,718
- Issue date Nov 15, 2016
- Carl Zeiss SMT GmbH
- Stephan Muellender
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Lithography apparatus and method for producing a mirror arrangement
- Patent number 9,459,538
- Issue date Oct 4, 2016
- Carl Zeiss SMT GmbH
- Dirk Schaffer
- G02 - OPTICS
Information Patent Grant
Optical arrangement for EUV lithography and method for configuring...
- Patent number 9,263,161
- Issue date Feb 16, 2016
- Carl Zeiss SMT GmbH
- Wilfried Clauss
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Mirror elements for EUV lithography and production methods therefor
- Patent number 9,238,590
- Issue date Jan 19, 2016
- Carl Zeiss SMT GmbH
- Wilfried Clauss
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Optical assembly
- Patent number 8,964,162
- Issue date Feb 24, 2015
- Carl Zeiss SMT GmbH
- Damian Fiolka
- G02 - OPTICS
Information Patent Grant
Substrates for mirrors for EUV lithography and their production
- Patent number 8,870,396
- Issue date Oct 28, 2014
- Carl Zeiss SMT GmbH
- Julian Kaller
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Mirror elements for EUV lithography and production methods therefor
- Patent number 8,711,332
- Issue date Apr 29, 2014
- Carl Zeiss SMT GmbH
- Wilfried Clauss
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Transmitting optical element and objective for a microlithographic...
- Patent number 8,570,488
- Issue date Oct 29, 2013
- Carl Zeiss SMT GmbH
- Wilfried Clauss
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Grant
Projection objective of a microlithographic projection exposure app...
- Patent number 8,325,426
- Issue date Dec 4, 2012
- Carl Zeiss SMT GmbH
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Grant
Transmitting optical element with low foreign-element contamination
- Patent number 8,163,667
- Issue date Apr 24, 2012
- Carl Zeiss SMT GmbH
- Wilfried Clauss
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Grant
Illumination system or projection lens of a microlithographic expos...
- Patent number 8,031,326
- Issue date Oct 4, 2011
- Carl Zeiss SMT GmbH
- Michael Totzeck
- G02 - OPTICS
Information Patent Grant
Projection objective of a microlithographic projection exposure app...
- Patent number 7,982,969
- Issue date Jul 19, 2011
- Carl Zeiss SMT GmbH
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Grant
Optical composite material and method for its production
- Patent number 7,907,347
- Issue date Mar 15, 2011
- Carl Zeiss SMT AG
- Eric Eva
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Microlithography projection objective with crystal lens
- Patent number 7,755,839
- Issue date Jul 13, 2010
- Carl Zeiss SMT AG
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Grant
Projection objective of a microlithographic projection exposure app...
- Patent number 7,679,721
- Issue date Mar 16, 2010
- Carl Zeiss SMT AG
- Wilfried Clauss
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
LITHOGRAPHY APPARATUS AND METHOD FOR PRODUCING A MIRROR ARRANGEMENT
- Publication number 20150055112
- Publication date Feb 26, 2015
- Carl Zeiss SMT GMBH
- Dirk Schaffer
- G02 - OPTICS
Information Patent Application
Reflective Optical Element for the EUV Wavelength Range, Method for...
- Publication number 20140307308
- Publication date Oct 16, 2014
- Carl Zeiss SMT GMBH
- Markus WEISS
- B82 - NANO-TECHNOLOGY
Information Patent Application
MIRROR ELEMENTS FOR EUV LITHOGRAPHY AND PRODUCTION METHODS THEREFOR
- Publication number 20140190212
- Publication date Jul 10, 2014
- Carl Zeiss SMT GMBH
- Wilfried CLAUSS
- G02 - OPTICS
Information Patent Application
SUBSTRATES FOR MIRRORS FOR EUV LITHOGRAPHY AND THEIR PRODUCTION
- Publication number 20130120863
- Publication date May 16, 2013
- Carl Zeiss SMT GMBH
- Julian KALLER
- G02 - OPTICS
Information Patent Application
OPTICAL ARRANGEMENT FOR EUV LITHOGRAPHY AND METHOD FOR CONFIGURING...
- Publication number 20130107239
- Publication date May 2, 2013
- Carl Zeiss SMT GMBH
- Wilfried Clauss
- B82 - NANO-TECHNOLOGY
Information Patent Application
MIRROR FOR THE EUV WAVELENGTH RANGE, SUBSTRATE FOR SUCH A MIRROR, P...
- Publication number 20130038929
- Publication date Feb 14, 2013
- Carl Zeiss SMT GMBH
- Stephan MUELLENDER
- B82 - NANO-TECHNOLOGY
Information Patent Application
MIRROR ELEMENTS FOR EUV LITHOGRAPHY AND PRODUCTION METHODS THEREFOR
- Publication number 20120327384
- Publication date Dec 27, 2012
- Carl Zeiss SMT GMBH
- Wilfried CLAUSS
- G02 - OPTICS
Information Patent Application
SUBSTRATES AND MIRRORS FOR EUV MICROLITHOGRAPHY, AND METHODS FOR PR...
- Publication number 20120212721
- Publication date Aug 23, 2012
- Carl Zeiss SMT GMBH
- Wilfried CLAUSS
- G02 - OPTICS
Information Patent Application
OPTICAL ASSEMBLY
- Publication number 20120019799
- Publication date Jan 26, 2012
- CARL ZEISS SMT GMBH
- Damian Fiolka
- G02 - OPTICS
Information Patent Application
PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...
- Publication number 20110235013
- Publication date Sep 29, 2011
- Carl Zeiss SMT GMBH
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Application
PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...
- Publication number 20090284831
- Publication date Nov 19, 2009
- Carl Zeiss SMT AG
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Application
TRANSMITTING OPTICAL ELEMENT WITH LOW FOREIGN-ELEMENT CONTAMINATION
- Publication number 20090251673
- Publication date Oct 8, 2009
- Carl Zeiss SMT AG
- Wilfried CLAUSS
- G02 - OPTICS
Information Patent Application
TRANSMITTING OPTICAL ELEMENT AND OBJECTIVE FOR A MICROLITHOGRAPHIC...
- Publication number 20090201478
- Publication date Aug 13, 2009
- Carl Zeiss SMT AG
- Wilfried Clauss
- G02 - OPTICS
Information Patent Application
Optical composite material and method for its production
- Publication number 20090036289
- Publication date Feb 5, 2009
- Carl Zeiss SMT AG
- Eric Eva
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION LENS OF A MICROLITHOGRAPHIC EXPOSURE SYSTEM
- Publication number 20090021830
- Publication date Jan 22, 2009
- Carl Zeiss SMT AG
- Michael Totzeck
- G02 - OPTICS
Information Patent Application
ILLUMINATION SYSTEM OR PROJECTION LENS OF A MICROLITHOGRAPHIC EXPOS...
- Publication number 20080204877
- Publication date Aug 28, 2008
- Carl Zeiss SMT AG
- Michael Totzeck
- G02 - OPTICS
Information Patent Application
METHOD OF SELECTING CRYSTALLINE QUARTZ MATERIAL FOR USE IN AN OPTIC...
- Publication number 20080170229
- Publication date Jul 17, 2008
- Carl Zeiss SMT AG
- Wilfried Clauss
- G01 - MEASURING TESTING
Information Patent Application
Projection objective of a microlithographic projection exposure app...
- Publication number 20060238895
- Publication date Oct 26, 2006
- Wilfried Clauss
- G02 - OPTICS

Wilfried CLAUSS

Person

Patents Grantslast 30 patents

Mirror for the EUV wavelength range, substrate for such a mirror, p...

Lithography apparatus and method for producing a mirror arrangement

Optical arrangement for EUV lithography and method for configuring...

Mirror elements for EUV lithography and production methods therefor

Optical assembly

Substrates for mirrors for EUV lithography and their production

Mirror elements for EUV lithography and production methods therefor

Transmitting optical element and objective for a microlithographic...

Projection objective of a microlithographic projection exposure app...

Transmitting optical element with low foreign-element contamination

Illumination system or projection lens of a microlithographic expos...

Projection objective of a microlithographic projection exposure app...

Optical composite material and method for its production

Microlithography projection objective with crystal lens

Projection objective of a microlithographic projection exposure app...

Patents Applicationslast 30 patents

LITHOGRAPHY APPARATUS AND METHOD FOR PRODUCING A MIRROR ARRANGEMENT

Reflective Optical Element for the EUV Wavelength Range, Method for...

MIRROR ELEMENTS FOR EUV LITHOGRAPHY AND PRODUCTION METHODS THEREFOR

SUBSTRATES FOR MIRRORS FOR EUV LITHOGRAPHY AND THEIR PRODUCTION

OPTICAL ARRANGEMENT FOR EUV LITHOGRAPHY AND METHOD FOR CONFIGURING...

MIRROR FOR THE EUV WAVELENGTH RANGE, SUBSTRATE FOR SUCH A MIRROR, P...

MIRROR ELEMENTS FOR EUV LITHOGRAPHY AND PRODUCTION METHODS THEREFOR

SUBSTRATES AND MIRRORS FOR EUV MICROLITHOGRAPHY, AND METHODS FOR PR...

OPTICAL ASSEMBLY

PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...

PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...

TRANSMITTING OPTICAL ELEMENT WITH LOW FOREIGN-ELEMENT CONTAMINATION

TRANSMITTING OPTICAL ELEMENT AND OBJECTIVE FOR A MICROLITHOGRAPHIC...

Optical composite material and method for its production

PROJECTION LENS OF A MICROLITHOGRAPHIC EXPOSURE SYSTEM

ILLUMINATION SYSTEM OR PROJECTION LENS OF A MICROLITHOGRAPHIC EXPOS...

METHOD OF SELECTING CRYSTALLINE QUARTZ MATERIAL FOR USE IN AN OPTIC...

Projection objective of a microlithographic projection exposure app...