Wilhelmus Petrus De Boeij

Person

Veldhoven, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Lithographic apparatus and method
- Patent number 10,088,756
- Issue date Oct 2, 2018
- ASML Netherlands B.V.
- Sander Kerssemakers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, spectral purity filter and device manufactu...
- Patent number 10,001,709
- Issue date Jun 19, 2018
- ASML Netherlands B.V.
- Vadim Yevgenyevich Banine
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic method and apparatus
- Patent number 9,989,864
- Issue date Jun 5, 2018
- ASML Netherlands B.V.
- Johannes Jacobus Matheus Baselmans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, spectral purity filter and device manufactu...
- Patent number 9,594,306
- Issue date Mar 14, 2017
- ASML Netherlands B.V.
- Vadim Yevgenyevich Banine
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Lithographic apparatus and a method for determining a polarization...
- Patent number 9,170,498
- Issue date Oct 27, 2015
- ASML Netherlands B.V.
- Marcus Adrianus Van De Kerkhof
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection system and lithographic apparatus
- Patent number 9,164,401
- Issue date Oct 20, 2015
- ASML Netherlands B.V.
- Erik Roelof Loopstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation system, radiation collector, radiation beam conditioning...
- Patent number 9,097,982
- Issue date Aug 4, 2015
- ASML Netherlands B.V.
- Vadim Yevgenyevich Banine
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Parameter control in a lithographic apparatus using polarization
- Patent number 8,675,176
- Issue date Mar 18, 2014
- ASML Netherlands B.V.
- Marinus Johanes Maria Van Dam
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Radiation beam modification apparatus and method
- Patent number 8,351,022
- Issue date Jan 8, 2013
- ASML Netherlands B.V.
- Wilhelmus Petrus De Boeij
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polarized radiation in lithographic apparatus and device manufactur...
- Patent number 7,929,116
- Issue date Apr 19, 2011
- ASML Netherlands B.V.
- Christian Wagner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for patterning a radiation beam, patterning device for patte...
- Patent number 7,889,316
- Issue date Feb 15, 2011
- ASML Netherlands B.V.
- Wilhelmus Petrus De Boeij
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lens element, lithographic apparatus, device manufacturing method,...
- Patent number 7,535,644
- Issue date May 19, 2009
- ASML Netherlands B.V.
- Wilhelmus Petrus De Boeij
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus
- Patent number 7,375,799
- Issue date May 20, 2008
- ASML Netherlands B.V.
- Marcus Adrianus Van De Kerkhof
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polarized radiation in lithographic apparatus and device manufactur...
- Patent number 7,345,740
- Issue date Mar 18, 2008
- ASML Netherlands B.V.
- Christian Wagner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Different polarization in cross-section of a radiation beam in a li...
- Patent number 7,317,512
- Issue date Jan 8, 2008
- ASML Netherlands B.V.
- Wilhelmus Petrus De Boeij
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polarized radiation in lithographic apparatus and device manufactur...
- Patent number 7,312,852
- Issue date Dec 25, 2007
- ASML Netherlands B.V.
- Christian Wagner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, device manufacturing method
- Patent number 7,245,355
- Issue date Jul 17, 2007
- ASML Netherlands B.V.
- Johannes Catharinus Hubertus Mulkens
- G02 - OPTICS
Information Patent Grant
Lithographic apparatus, device manufacturing method
- Patent number 7,245,353
- Issue date Jul 17, 2007
- ASML Netherlands B.V.
- Johannes Catharinus Hubertus Mulkens
- G02 - OPTICS
Information Patent Grant
Lithographic apparatus, device manufacturing method, and device man...
- Patent number 6,906,787
- Issue date Jun 14, 2005
- ASML Netherlands B.V.
- Marcus Adrianus Van De Kerhof
- G01 - MEASURING TESTING
Information Patent Grant
Lithographic projection apparatus, a grating module, a sensor modul...
- Patent number 6,650,399
- Issue date Nov 18, 2003
- ASML Netherlands B.V.
- Johannes Jacobus Matheus Baselmans
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
LITHOGRAPHIC APPARATUS AND METHOD
- Publication number 20170199467
- Publication date Jul 13, 2017
- ASML NETHERLANDS B.V.
- Sander KERSSEMAKERS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC METHOD AND APPARATUS
- Publication number 20170160647
- Publication date Jun 8, 2017
- ASML NETHERLANDS B.V.
- Johannes Jacobus Matheus BASELMANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic Apparatus, Spectral Purity Filter and Device Manufactu...
- Publication number 20170160646
- Publication date Jun 8, 2017
- ASML NETHERLANDS B.V.
- Vadim Yevgenyevich BANINE
- G02 - OPTICS
Information Patent Application
Lithographic Apparatus, Spectral Purity Filter and Device Manufactu...
- Publication number 20140085619
- Publication date Mar 27, 2014
- ASML NETHERLANDS B.V.
- Vadim Yevgenyevich Banine
- B82 - NANO-TECHNOLOGY
Information Patent Application
Lithographic Apparatus and a Method for Determining a Polarization...
- Publication number 20130176547
- Publication date Jul 11, 2013
- ASML NETHERLANDS B.V.
- Marcus Adrianus VAN DE KERKHOF
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION SYSTEM, LITHOGRAPHIC APPARATUS AND ILLUMINATION METHOD
- Publication number 20120262690
- Publication date Oct 18, 2012
- ASML NETHERLANDS B.V.
- Wilhelmus Petrus De Boeij
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION SYSTEM, RADIATION COLLECTOR, RADIATION BEAM CONDITIONING...
- Publication number 20110223543
- Publication date Sep 15, 2011
- ASML NETHERLANDS B.V.
- Vadim Yevgenyevich Banine
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Projection System and Lithographic Apparatus
- Publication number 20110170078
- Publication date Jul 14, 2011
- ASML NETHERLANDS B.V.
- Erik Roelof Loopstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Radiation Beam Modification Apparatus and Method
- Publication number 20100315612
- Publication date Dec 16, 2010
- ASML NETHERLANDS B.V.
- Wilhelmus Petrus DE BOEIJ
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Passive reticle tool, a lithographic apparatus and a method of patt...
- Publication number 20100182582
- Publication date Jul 22, 2010
- ASML NETHERLANDS B.V,
- Marcus Adrianus Van De Kerkhof
- G01 - MEASURING TESTING
Information Patent Application
Lithographic projection system and projection lens polarization sensor
- Publication number 20100118288
- Publication date May 13, 2010
- Marcus Adrianus Van De Kerkhof
- G01 - MEASURING TESTING
Information Patent Application
Lithographic Apparatus, Method for Determining at Least One Polariz...
- Publication number 20100045956
- Publication date Feb 25, 2010
- ASML NETHERLANDS B.V.
- Marcus Adrianus Van De Kerkhof
- G01 - MEASURING TESTING
Information Patent Application
Polarized radiation in lithographic apparatus and device manufactur...
- Publication number 20080143992
- Publication date Jun 19, 2008
- ASML NETHERLANDS B.V.
- Christian Wagner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for patterning a radiation beam, patterning device for patte...
- Publication number 20070263190
- Publication date Nov 15, 2007
- ASML NETHERLANDS B.V.
- Wilhelmus Petrus De Boeij
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lens element, lithographic apparatus, device manufacturing method,...
- Publication number 20070035845
- Publication date Feb 15, 2007
- ASML NETHERLANDS B.V.
- Wilhelmus Petrus De Boeij
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Polarized radiation in lithographic apparatus and device manufactur...
- Publication number 20070008511
- Publication date Jan 11, 2007
- ASML NETHERLANDS B.V.
- Wilhelmus Petrus De Boeij
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Parameter control in a lithographic apparatus using polarization
- Publication number 20060192149
- Publication date Aug 31, 2006
- ASML NETHERLANDS B.V.
- Marinus Johannes Maria Van Dam
- B82 - NANO-TECHNOLOGY
Information Patent Application
Polarized radiation in lithographic apparatus and device manufactur...
- Publication number 20060139611
- Publication date Jun 29, 2006
- ASML NETHERLANDS B.V.
- Christian Wagner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Polarized radiation in lithographic apparatus and device manufactur...
- Publication number 20060139612
- Publication date Jun 29, 2006
- ASML NETHERLANDS B.V.
- Christian Wagner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus, device manufacturing method
- Publication number 20060077370
- Publication date Apr 13, 2006
- ASML NETHERLANDS B.V.
- Johannes Catharinus Hubertus Mulkens
- G02 - OPTICS
Information Patent Application
Lithographic apparatus, device manufacturing method
- Publication number 20060077373
- Publication date Apr 13, 2006
- ASML NETHERLANDS B.V.
- Johannes Catharinus Hubertus Mulkens
- G02 - OPTICS
Information Patent Application
Lithographic apparatus, device manufacturing method, and device man...
- Publication number 20040114120
- Publication date Jun 17, 2004
- ASML NETHERLANDS B.V.
- Marcus Adrianus Van De Kerhof
- G01 - MEASURING TESTING

Wilhelmus Petrus De Boeij

Person

Patents Grantslast 30 patents

Lithographic apparatus and method

Lithographic apparatus, spectral purity filter and device manufactu...

Lithographic method and apparatus

Lithographic apparatus, spectral purity filter and device manufactu...

Lithographic apparatus and a method for determining a polarization...

Projection system and lithographic apparatus

Radiation system, radiation collector, radiation beam conditioning...

Parameter control in a lithographic apparatus using polarization

Radiation beam modification apparatus and method

Polarized radiation in lithographic apparatus and device manufactur...

Method for patterning a radiation beam, patterning device for patte...

Lens element, lithographic apparatus, device manufacturing method,...

Lithographic apparatus

Polarized radiation in lithographic apparatus and device manufactur...

Different polarization in cross-section of a radiation beam in a li...

Polarized radiation in lithographic apparatus and device manufactur...

Lithographic apparatus, device manufacturing method

Lithographic apparatus, device manufacturing method

Lithographic apparatus, device manufacturing method, and device man...

Lithographic projection apparatus, a grating module, a sensor modul...

Patents Applicationslast 30 patents

LITHOGRAPHIC APPARATUS AND METHOD

LITHOGRAPHIC METHOD AND APPARATUS

Lithographic Apparatus, Spectral Purity Filter and Device Manufactu...

Lithographic Apparatus, Spectral Purity Filter and Device Manufactu...

Lithographic Apparatus and a Method for Determining a Polarization...

ILLUMINATION SYSTEM, LITHOGRAPHIC APPARATUS AND ILLUMINATION METHOD

RADIATION SYSTEM, RADIATION COLLECTOR, RADIATION BEAM CONDITIONING...

Projection System and Lithographic Apparatus

Radiation Beam Modification Apparatus and Method

Passive reticle tool, a lithographic apparatus and a method of patt...

Lithographic projection system and projection lens polarization sensor

Lithographic Apparatus, Method for Determining at Least One Polariz...

Polarized radiation in lithographic apparatus and device manufactur...

Method for patterning a radiation beam, patterning device for patte...

Lens element, lithographic apparatus, device manufacturing method,...

Polarized radiation in lithographic apparatus and device manufactur...

Parameter control in a lithographic apparatus using polarization

Polarized radiation in lithographic apparatus and device manufactur...

Polarized radiation in lithographic apparatus and device manufactur...

Lithographic apparatus, device manufacturing method

Lithographic apparatus, device manufacturing method

Lithographic apparatus, device manufacturing method, and device man...