Willem Henk Urbanus

Person

Delft, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Vacuum chamber arrangement for charged particle beam generator
- Patent number 11,961,627
- Issue date Apr 16, 2024
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Vacuum chamber arrangement for charged particle beam generator
- Patent number 11,705,252
- Issue date Jul 18, 2023
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Aberration correction in charged particle system
- Patent number 11,348,756
- Issue date May 31, 2022
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum chamber arrangement for charged particle beam generator
- Patent number 11,094,426
- Issue date Aug 17, 2021
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Vacuum chamber arrangement for charged particle beam generator
- Patent number 10,586,625
- Issue date Mar 10, 2020
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
High voltage shielding and cooling in a charged particle beam gener...
- Patent number 10,037,864
- Issue date Jul 31, 2018
- Mapper Lithography IP B.V.
- Alexander Hendrik Vincent Van Veen
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Multi-electrode electron optics
- Patent number 9,905,322
- Issue date Feb 27, 2018
- Mapper Lithography IP B.V.
- Marco Jan-Jaco Wieland
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Charged particle lithography system and beam generator
- Patent number 9,653,261
- Issue date May 16, 2017
- Mapper Lithography IP B.V.
- Alexander Hendrik Vincent Van Veen
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Multi-electrode stack arrangement
- Patent number 9,355,751
- Issue date May 31, 2016
- Mapper Lithography IP B.V.
- Willem Henk Urbanus
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Multi-electrode cooling arrangement
- Patent number 9,165,693
- Issue date Oct 20, 2015
- Mapper Lithography IP B.V.
- Willem Henk Urbanus
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Charged particle lithography system with intermediate chamber
- Patent number 8,916,837
- Issue date Dec 23, 2014
- Mapper Lithography IP B.V.
- Laura Dinu-Gürtler
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle lithography system with intermediate chamber
- Patent number 8,586,949
- Issue date Nov 19, 2013
- Mapper Lithography IP B.V.
- Laura Dinu-Gürtler
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
PLATFORM FOR CHARGED PARTICLE APPARATUS AND COMPONENTS WITHIN A CHA...
- Publication number 20240312756
- Publication date Sep 19, 2024
- ASML NETHERLANDS B.V.
- Jasper Hendrik GRASMAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR
- Publication number 20230386696
- Publication date Nov 30, 2023
- ASML NETHERLANDS B.V.
- Alexander Hendrik Vincent VAN VEEN
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
ABERRATION CORRECTION IN CHARGED PARTICLE SYSTEM
- Publication number 20220285124
- Publication date Sep 8, 2022
- ASML NETHERLANDS B.V.
- Alexander Hendrik Vincent VAN VEEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR
- Publication number 20210383941
- Publication date Dec 9, 2021
- ASML NETHERLANDS B.V.
- Alexander Hendrik Vincent VAN VEEN
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR
- Publication number 20200194141
- Publication date Jun 18, 2020
- ASML NETHERLANDS B.V.
- Alexander Hendrik Vincent VAN VEEN
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
ABERRATION CORRECTION IN CHARGED PARTICLE SYSTEM
- Publication number 20180277334
- Publication date Sep 27, 2018
- MAPPER LITHOGRAPHY IP BV
- Alexander Hendrik Vincent VAN VEEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High voltage shielding and cooling in a charged particle beam gener...
- Publication number 20170250053
- Publication date Aug 31, 2017
- MAPPER LITHOGRAPHY IP BV
- Alexander Hendrik Vincent Van Veen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR
- Publication number 20170221674
- Publication date Aug 3, 2017
- MAPPER LITHOGRAPHY IP BV
- Alexander Hendrik Vincent VAN VEEN
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
MULTI-ELECTRODE ELECTRON OPTICS
- Publication number 20150136995
- Publication date May 21, 2015
- MAPPER LITHOGRAPHY IP BV
- Marco Jan-Jaco WIELAND
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
MULTI-ELECTRODE STACK ARRANGEMENT
- Publication number 20150137010
- Publication date May 21, 2015
- MAPPER LITHOGRAPHY IP BV
- Willem Henk URBANUS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-ELECTRODE COOLING ARRANGEMENT
- Publication number 20150137009
- Publication date May 21, 2015
- MAPPER LITHOGRAPHY IP BV
- Willem Henk URBANUS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged particle lithography system and beam generator
- Publication number 20150124229
- Publication date May 7, 2015
- MAPPER LITHOGRAPHY IP BV
- Alexander Hendrik Vincent Van Veen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE LITHOGRAPHY SYSTEM WITH INTERMEDIATE CHAMBER
- Publication number 20140061497
- Publication date Mar 6, 2014
- MAPPER LITHOGRAPHY IP BV
- Laura DINU-GÜRTLER
- B82 - NANO-TECHNOLOGY
Information Patent Application
CHARGED PARTICLE LITHOGRAPHY SYSTEM WITH INTERMEDIATE CHAMBER
- Publication number 20120293780
- Publication date Nov 22, 2012
- MAPPER LITHOGRAPHY IP BV
- Laura DINU-GÜRTLER
- B82 - NANO-TECHNOLOGY

Willem Henk Urbanus

Person

Patents Grantslast 30 patents

Vacuum chamber arrangement for charged particle beam generator

Vacuum chamber arrangement for charged particle beam generator

Aberration correction in charged particle system

Vacuum chamber arrangement for charged particle beam generator

Vacuum chamber arrangement for charged particle beam generator

High voltage shielding and cooling in a charged particle beam gener...

Multi-electrode electron optics

Charged particle lithography system and beam generator

Multi-electrode stack arrangement

Multi-electrode cooling arrangement

Charged particle lithography system with intermediate chamber

Charged particle lithography system with intermediate chamber

Patents Applicationslast 30 patents

PLATFORM FOR CHARGED PARTICLE APPARATUS AND COMPONENTS WITHIN A CHA...

VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR

ABERRATION CORRECTION IN CHARGED PARTICLE SYSTEM

VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR

VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR

ABERRATION CORRECTION IN CHARGED PARTICLE SYSTEM

High voltage shielding and cooling in a charged particle beam gener...

VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR

MULTI-ELECTRODE ELECTRON OPTICS

MULTI-ELECTRODE STACK ARRANGEMENT

MULTI-ELECTRODE COOLING ARRANGEMENT

Charged particle lithography system and beam generator

CHARGED PARTICLE LITHOGRAPHY SYSTEM WITH INTERMEDIATE CHAMBER

CHARGED PARTICLE LITHOGRAPHY SYSTEM WITH INTERMEDIATE CHAMBER