Willem Jurrianus Venema

Person

Eindhoven, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Method of operating a patterning device and lithographic apparatus
- Patent number 9,958,788
- Issue date May 1, 2018
- ASML Netherlands B.V.
- Vitaliy Prosyentsov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, device manufacturing method, and method of...
- Patent number 9,658,541
- Issue date May 23, 2017
- ASML Netherlands B.V.
- Marcus Adrianus Van De Kerkhof
- B21 - MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL PUNCHING...
Information Patent Grant
Method of operating a patterning device and lithographic apparatus
- Patent number 9,568,833
- Issue date Feb 14, 2017
- ASML Netherlands B.V.
- Vitaliy Prosyentsov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of operating a patterning device and lithographic apparatus
- Patent number 9,417,533
- Issue date Aug 16, 2016
- ASML Netherlands B.V.
- Vitaliy Prosyentsov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method of applying...
- Patent number 8,773,637
- Issue date Jul 8, 2014
- ASML Netherlands B.V.
- Marcus Adrianus Van De Kerkhof
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Level sensor, lithographic apparatus, and substrate surface positio...
- Patent number 8,675,210
- Issue date Mar 18, 2014
- ASML Netherlands B.V.
- Arie Jeffrey Den Boef
- G01 - MEASURING TESTING
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 8,279,396
- Issue date Oct 2, 2012
- ASML Netherlands B.V.
- Nicolaas Ten Kate
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for compensating for radiation induced thermal di...
- Patent number 7,830,493
- Issue date Nov 9, 2010
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, device manufacturing method and energy sensor
- Patent number 7,671,319
- Issue date Mar 2, 2010
- ASML Netherlands B.V.
- Willem Jurrianus Venema
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optimized correction of wafer thermal deformations in a lithographi...
- Patent number 7,595,496
- Issue date Sep 29, 2009
- ASML Netherlands B.V.
- Joost Jeroen Ottens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method utilizing a...
- Patent number 7,528,933
- Issue date May 5, 2009
- ASML Netherlands B.V.
- Willem Jurrianus Venema
- G02 - OPTICS
Information Patent Grant
Lithographic apparatus and device manufacturing method utilizing 2D...
- Patent number 7,477,772
- Issue date Jan 13, 2009
- ASML Netherlands B.V.
- Andrej Makarovic
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Variable lens and exposure system
- Patent number 7,460,309
- Issue date Dec 2, 2008
- ASML Netherlands B.V.
- Willem J. Venema
- G02 - OPTICS
Information Patent Grant
Ultrasonic distance sensors
- Patent number 7,391,676
- Issue date Jun 24, 2008
- ASML Netherlands B.V.
- Anastasius Jacobus Anicetus Bruinsma
- G01 - MEASURING TESTING
Information Patent Grant
System and method for compensating for thermal expansion of lithogr...
- Patent number 7,391,503
- Issue date Jun 24, 2008
- ASML Netherlands B.V.
- Willem Jurrianus Venema
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithographic apparatus, radiation beam inspection device, method of...
- Patent number 7,307,694
- Issue date Dec 11, 2007
- ASML Netherlands B.V.
- Willem Jurrianus Venema
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optimized correction of wafer thermal deformations in a lithographi...
- Patent number 7,250,237
- Issue date Jul 31, 2007
- ASML Netherlands B.V.
- Joost Jeroen Ottens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method, and device...
- Patent number 7,233,384
- Issue date Jun 19, 2007
- ASML Netherlands B.V.
- Willem Jurrianus Venema
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method utilizing he...
- Patent number 7,230,677
- Issue date Jun 12, 2007
- ASML Netherlands B.V.
- Johannes Jacobus Matheus Baselmans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Variable lens and exposure system
- Patent number 7,221,514
- Issue date May 22, 2007
- ASML Netherlands B.V.
- Willem Jurrianus Venema
- G02 - OPTICS
Information Patent Grant
Lithographic apparatus and device manufacturing method utilizing dy...
- Patent number 7,209,216
- Issue date Apr 24, 2007
- ASML Netherlands B.V.
- Pieter Willem Herman De Jager
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of detecting an amplitude transient in a field of elements h...
- Patent number 5,199,082
- Issue date Mar 30, 1993
- U.S. Philips Corp.
- Willem J. Venema
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Reading device for bar codes
- Patent number 4,746,789
- Issue date May 24, 1988
- U.S. Philips Corporation
- Antonius C. M. Gieles
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF OPERATING A PATTERNING DEVICE AND LITHOGRAPHIC APPARATUS
- Publication number 20170123323
- Publication date May 4, 2017
- ASML NETHERLANDS B.V.
- Vitaliy PROSYENTSOV
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF OPERATING A PATTERNING DEVICE AND LITHOGRAPHIC APPARATUS
- Publication number 20150029481
- Publication date Jan 29, 2015
- ASML NETHERLANDS B.V.
- Vitaliy PROSYENTSOV
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF...
- Publication number 20140313500
- Publication date Oct 23, 2014
- Marcus Adrianus VAN DE KERKHOF
- B21 - MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL PUNCHING...
Information Patent Application
LEVEL SENSOR, LITHOGRAPHIC APPARATUS, AND SUBSTRATE SURFACE POSITIO...
- Publication number 20130077079
- Publication date Mar 28, 2013
- ASML NETHERLANDS B.V.
- Arie Jeffrey DEN BOEF
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF OPERATING A PATTERNING DEVICE, LITHOGRAPHIC APPARATUS AND...
- Publication number 20120133914
- Publication date May 31, 2012
- ASML NETHERLANDS B.V.
- Vitaliy Prosyentsov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF...
- Publication number 20110090476
- Publication date Apr 21, 2011
- ASML NETHERLANDS B.V.
- Marcus Adrianus VAN DE KERKHOF
- B21 - MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL PUNCHING...
Information Patent Application
Lithographic Apparatus and Device Manufacturing Method
- Publication number 20100231875
- Publication date Sep 16, 2010
- ASML NETHERLANDS B.V.
- Nicolaas TEN KATE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE TABLE, SENSOR AND METHOD
- Publication number 20090290139
- Publication date Nov 26, 2009
- ASML NETHERLANDS B.V.
- Arie Johan VAN DER SIJS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20090168032
- Publication date Jul 2, 2009
- ASML NETHERLANDS B.V.
- Nicolaas Ten Kate
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optimized correction of water thermal deformations in a lithographi...
- Publication number 20070257209
- Publication date Nov 8, 2007
- ASML NETHERLANDS B.V.
- Joost Jeroen Ottens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
VARIABLE LENS AND EXPOSURE SYSTEM
- Publication number 20070253070
- Publication date Nov 1, 2007
- ASML NETHERLANDS B.V.
- Willem Jurrianus Venema
- G02 - OPTICS
Information Patent Application
Lithographic apparatus and device manufacturing method utilizing a...
- Publication number 20070236675
- Publication date Oct 11, 2007
- ASML NETHERLANDS B.V.
- Willem Jurrianus Venema
- G02 - OPTICS
Information Patent Application
Lithographic apparatus, device manufacturing method and energy sensor
- Publication number 20070216890
- Publication date Sep 20, 2007
- ASML NETHERLANDS B.V.
- Willem Jurrianus Venema
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus, device manufacturing method and energy sensor
- Publication number 20070201013
- Publication date Aug 30, 2007
- ASML NETHERLANDS B.V.
- Willem Jurrianus Venema
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and method for compensating for thermal expansion of lithogr...
- Publication number 20070075315
- Publication date Apr 5, 2007
- ASML NETHERLANDS B.V.
- Willem Jurrianus Venema
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and method for compensating for radiation induced thermal di...
- Publication number 20070076180
- Publication date Apr 5, 2007
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus, radiation beam inspection device, method of...
- Publication number 20070002301
- Publication date Jan 4, 2007
- ASML NETHERLANDS B.V.
- Willem Jurrianus Venema
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method, and device...
- Publication number 20060279719
- Publication date Dec 14, 2006
- ASML NETHERLANDS B.V.
- Willem Jurrianus Venema
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method utilizing 2D...
- Publication number 20060269116
- Publication date Nov 30, 2006
- ASML NETHERLANDS B.V.
- Andrej Makarovic
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Variable lens and exposure system
- Publication number 20060245072
- Publication date Nov 2, 2006
- ASML NETHERLANDS B.V.
- Willem Jurrianus Venema
- G02 - OPTICS
Information Patent Application
Lithographic apparatus and device manufacturing method utilizing dy...
- Publication number 20060215142
- Publication date Sep 28, 2006
- ASML NETHERLANDS B.V.
- Pieter Willem Herman De Jager
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method utilizing he...
- Publication number 20060132746
- Publication date Jun 22, 2006
- ASML NETHERLANDS B.V.
- Johannes Jacobus Matheus Baselmans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Ultrasonic distance sensors
- Publication number 20060133209
- Publication date Jun 22, 2006
- ASML NETHERLANDS B.V.
- Anastasius Jacobus Anicetus Bruinsma
- G01 - MEASURING TESTING
Information Patent Application
Optimized correction of wafer thermal deformations in a lithographi...
- Publication number 20050136346
- Publication date Jun 23, 2005
- ASML NETHERLANDS B.V.
- Joost Jeroen Ottens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Willem Jurrianus Venema

Person

Patents Grantslast 30 patents

Method of operating a patterning device and lithographic apparatus

Lithographic apparatus, device manufacturing method, and method of...

Method of operating a patterning device and lithographic apparatus

Method of operating a patterning device and lithographic apparatus

Lithographic apparatus and device manufacturing method of applying...

Level sensor, lithographic apparatus, and substrate surface positio...

Lithographic apparatus and device manufacturing method

System and method for compensating for radiation induced thermal di...

Lithographic apparatus, device manufacturing method and energy sensor

Optimized correction of wafer thermal deformations in a lithographi...

Lithographic apparatus and device manufacturing method utilizing a...

Lithographic apparatus and device manufacturing method utilizing 2D...

Variable lens and exposure system

Ultrasonic distance sensors

System and method for compensating for thermal expansion of lithogr...

Lithographic apparatus, radiation beam inspection device, method of...

Optimized correction of wafer thermal deformations in a lithographi...

Lithographic apparatus and device manufacturing method, and device...

Lithographic apparatus and device manufacturing method utilizing he...

Variable lens and exposure system

Lithographic apparatus and device manufacturing method utilizing dy...

Method of detecting an amplitude transient in a field of elements h...

Reading device for bar codes

Patents Applicationslast 30 patents

METHOD OF OPERATING A PATTERNING DEVICE AND LITHOGRAPHIC APPARATUS

METHOD OF OPERATING A PATTERNING DEVICE AND LITHOGRAPHIC APPARATUS

LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF...

LEVEL SENSOR, LITHOGRAPHIC APPARATUS, AND SUBSTRATE SURFACE POSITIO...

METHOD OF OPERATING A PATTERNING DEVICE, LITHOGRAPHIC APPARATUS AND...

LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF...

Lithographic Apparatus and Device Manufacturing Method

SUBSTRATE TABLE, SENSOR AND METHOD

Lithographic apparatus and device manufacturing method

Optimized correction of water thermal deformations in a lithographi...

VARIABLE LENS AND EXPOSURE SYSTEM

Lithographic apparatus and device manufacturing method utilizing a...

Lithographic apparatus, device manufacturing method and energy sensor

Lithographic apparatus, device manufacturing method and energy sensor

System and method for compensating for thermal expansion of lithogr...

System and method for compensating for radiation induced thermal di...

Lithographic apparatus, radiation beam inspection device, method of...

Lithographic apparatus and device manufacturing method, and device...

Lithographic apparatus and device manufacturing method utilizing 2D...

Variable lens and exposure system

Lithographic apparatus and device manufacturing method utilizing dy...

Lithographic apparatus and device manufacturing method utilizing he...

Ultrasonic distance sensors

Optimized correction of wafer thermal deformations in a lithographi...