Willem Marie Julia Marcel Coene

Person

Geldrop, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Inspection method and apparatus, lithographic apparatus, lithograph...
- Patent number 8,223,347
- Issue date Jul 17, 2012
- ASML Netherlands B.V.
- Hendrik Jan Hidde Smilde
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Methods and Patterning Devices For Measuring Phase Aberration
- Publication number 20130010306
- Publication date Jan 10, 2013
- ASML NETHERLANDS B.V.
- Willem Marie Julia Marcel Coene
- G01 - MEASURING TESTING
Information Patent Application
Metrology Method and Inspection Apparatus, Lithographic System and...
- Publication number 20120123581
- Publication date May 17, 2012
- ASML NETHERLANDS B.V.
- Hendrik Jan Hidde SMILDE
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Scatterometry Method and Measurement System for Lithography
- Publication number 20110304851
- Publication date Dec 15, 2011
- ASML NETHERLANDS B.V.
- Willem Marie Julia Marcel Coene
- G01 - MEASURING TESTING
Information Patent Application
Substrate, an Inspection Apparatus, and a Lithographic Apparatus
- Publication number 20110194092
- Publication date Aug 11, 2011
- ASML NETHERLANDS B.V.
- Hendrik Jan Hidde Smilde
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Calibration Method and Apparatus
- Publication number 20110178785
- Publication date Jul 21, 2011
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G01 - MEASURING TESTING
Information Patent Application
Metrology Method and Apparatus, Lithographic Apparatus, Device Manu...
- Publication number 20110043791
- Publication date Feb 24, 2011
- ASML NETHERLANDS B.V.
- Hendrik Jan Hidde Smilde
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of Determining Overlay Error and a Device Manufacturing Method
- Publication number 20110020616
- Publication date Jan 27, 2011
- ASML NETHERLANDS B.V.
- Willem Marie Julia Marcel COENE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Inspection Method and Apparatus, Lithographic Apparatus, Lithograph...
- Publication number 20110001978
- Publication date Jan 6, 2011
- ASML NETHERLANDS B.V.
- Hendrik Jan Hidde SMILDE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of Determining Overlay Error and a Device Manufacturing Method
- Publication number 20100284008
- Publication date Nov 11, 2010
- ASML NETHERLANDS B.V.
- Willem Marie Julia Marcel COENE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Willem Marie Julia Marcel Coene

Person

Patents Grantslast 30 patents

Inspection method and apparatus, lithographic apparatus, lithograph...

Patents Applicationslast 30 patents

Methods and Patterning Devices For Measuring Phase Aberration

Metrology Method and Inspection Apparatus, Lithographic System and...

Scatterometry Method and Measurement System for Lithography

Substrate, an Inspection Apparatus, and a Lithographic Apparatus

Calibration Method and Apparatus

Metrology Method and Apparatus, Lithographic Apparatus, Device Manu...

Method of Determining Overlay Error and a Device Manufacturing Method

Inspection Method and Apparatus, Lithographic Apparatus, Lithograph...

Method of Determining Overlay Error and a Device Manufacturing Method