Willem Seine Christian ROELOFS

Person

Deurne, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Methods of determining corrections for a patterning process, device...
- Patent number 11,782,349
- Issue date Oct 10, 2023
- ASML Netherlands B.V.
- Weitian Kou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of obtaining measurements, apparatus for performing a proces...
- Patent number 11,774,862
- Issue date Oct 3, 2023
- ASML Netherlands B.V.
- Hakki Ergün Cekli
- G01 - MEASURING TESTING
Information Patent Grant
Methods of determining corrections for a patterning process, device...
- Patent number 11,592,753
- Issue date Feb 28, 2023
- ASML Netherlands B.V.
- Weitian Kou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of determining corrections for a patterning process, device...
- Patent number 11,327,407
- Issue date May 10, 2022
- ASML Netherlands B.V.
- Weitian Kou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of obtaining measurements, apparatus for performing a proces...
- Patent number 11,175,591
- Issue date Nov 16, 2021
- ASML Netherlands B.V.
- Hakki Ergün Cekli
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focus and overlay improvement by modifying a patterning device
- Patent number 11,126,093
- Issue date Sep 21, 2021
- ASML Netherlands B.V.
- Richard Johannes Franciscus Van Haren
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic method
- Patent number 11,029,610
- Issue date Jun 8, 2021
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic method
- Patent number 10,962,887
- Issue date Mar 30, 2021
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of determining corrections for a patterning process
- Patent number 10,877,381
- Issue date Dec 29, 2020
- ASML Netherlands B.V.
- Weitian Kou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic method
- Patent number 10,527,958
- Issue date Jan 7, 2020
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHODS OF DETERMINING CORRECTIONS FOR A PATTERNING PROCESS, DEVICE...
- Publication number 20230168591
- Publication date Jun 1, 2023
- ASML NETHERLANDS B.V.
- Weitian KOU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS OF DETERMINING CORRECTIONS FOR A PATTERNING PROCESS, DEVICE...
- Publication number 20220229373
- Publication date Jul 21, 2022
- ASML NETHERLANDS B.V.
- Weitian KOU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF OBTAINING MEASUREMENTS, APPARATUS FOR PERFORMING A PROCES...
- Publication number 20220035259
- Publication date Feb 3, 2022
- ASML NETHERLANDS B.V.
- Hakki Ergün CEKLI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF DETERMINING CORRECTIONS FOR A PATTERNING PROCESS, DEVICE...
- Publication number 20210080836
- Publication date Mar 18, 2021
- ASML NETHERLANDS B.V.
- Weitian KOU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FOCUS AND OVERLAY IMPROVEMENT BY MODIFYING A PATTERNING DEVICE
- Publication number 20200310242
- Publication date Oct 1, 2020
- ASML NETHERLANDS B.V.
- Richard Johannes Franciscus VAN HAREN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC METHOD
- Publication number 20200272061
- Publication date Aug 27, 2020
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC METHOD
- Publication number 20200081356
- Publication date Mar 12, 2020
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS OF DETERMINING CORRECTIONS FOR A PATTERNING PROCESS
- Publication number 20200019067
- Publication date Jan 16, 2020
- ASML NETHERLANDS B.V.
- Weitian KOU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF DETERMINING PELLICLE COMPENSATION CORRECTIONS FOR A LITHO...
- Publication number 20190294059
- Publication date Sep 26, 2019
- ASML NETHERLANDS B.V.
- Leon Paul VAN DIJK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF OBTAINING MEASUREMENTS, APPARATUS FOR PERFORMING A PROCES...
- Publication number 20190137892
- Publication date May 9, 2019
- ASML NETHERLANDS B.V.
- Hakki Ergün CEKLI
- G01 - MEASURING TESTING
Information Patent Application
LITHOGRAPHIC METHOD
- Publication number 20190094721
- Publication date Mar 28, 2019
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Willem Seine Christian ROELOFS

Person

Patents Grantslast 30 patents

Methods of determining corrections for a patterning process, device...

Method of obtaining measurements, apparatus for performing a proces...

Methods of determining corrections for a patterning process, device...

Methods of determining corrections for a patterning process, device...

Method of obtaining measurements, apparatus for performing a proces...

Focus and overlay improvement by modifying a patterning device

Lithographic method

Lithographic method

Methods of determining corrections for a patterning process

Lithographic method

Patents Applicationslast 30 patents

METHODS OF DETERMINING CORRECTIONS FOR A PATTERNING PROCESS, DEVICE...

METHODS OF DETERMINING CORRECTIONS FOR A PATTERNING PROCESS, DEVICE...

METHOD OF OBTAINING MEASUREMENTS, APPARATUS FOR PERFORMING A PROCES...

METHODS OF DETERMINING CORRECTIONS FOR A PATTERNING PROCESS, DEVICE...

FOCUS AND OVERLAY IMPROVEMENT BY MODIFYING A PATTERNING DEVICE

LITHOGRAPHIC METHOD

LITHOGRAPHIC METHOD

METHODS OF DETERMINING CORRECTIONS FOR A PATTERNING PROCESS

METHOD OF DETERMINING PELLICLE COMPENSATION CORRECTIONS FOR A LITHO...

METHOD OF OBTAINING MEASUREMENTS, APPARATUS FOR PERFORMING A PROCES...

LITHOGRAPHIC METHOD