Willi Anderl

Person

Huettlingen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Facet mirror for an illumination optical unit of a projection expos...
- Patent number 11,789,367
- Issue date Oct 17, 2023
- Carl Zeiss SMT GmbH
- Willi Anderl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for producing a reflective optical element, reflective optic...
- Patent number 11,372,334
- Issue date Jun 28, 2022
- Carl Zeiss SMT GmbH
- Markus Bauer
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Projection lighting system for semiconductor lithography with an im...
- Patent number 10,969,699
- Issue date Apr 6, 2021
- Carl Zeiss SMT GmbH
- Ulrich Weber
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Beam reverser module and optical power amplifier having such a beam...
- Patent number 10,777,958
- Issue date Sep 15, 2020
- Carl Zeiss SMT GmbH
- Michael Schall
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for producing a reflective optical element, reflective optic...
- Patent number 10,534,269
- Issue date Jan 14, 2020
- Carl Zeiss SMT GmbH
- Markus Bauer
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Method for producing a reflective optical element, reflective optic...
- Patent number 10,481,501
- Issue date Nov 19, 2019
- Carl Zeiss SMT GmbH
- Markus Bauer
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Cooler for use in a device in a vacuum
- Patent number 10,303,067
- Issue date May 28, 2019
- Carl Zeiss SMT GmbH
- Willi Anderl
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Grant
Beam reverser module and optical power amplifier having such a beam...
- Patent number 9,843,153
- Issue date Dec 12, 2017
- Carl Zeiss SMT GmbH
- Michael Schall
- G02 - OPTICS
Information Patent Grant
Reflective optical element for use in an EUV system
- Patent number 8,342,701
- Issue date Jan 1, 2013
- Carl Zeiss Laser Optics GmbH
- Holger Kierey
- G02 - OPTICS
Information Patent Grant
Optical component having an improved transient thermal behavior and...
- Patent number 7,965,456
- Issue date Jun 21, 2011
- Carl Zeiss SMT GmbH
- Wilhelm Egle
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Optical component having an improved transient thermal behavior and...
- Patent number 7,483,223
- Issue date Jan 27, 2009
- Carl Zeiss SMT AG
- Wilhelm Egle
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING

Patents Applicationslast 30 patents

Information Patent Application
FIELD FACET SYSTEM AND LITHOGRAPHY APPARATUS
- Publication number 20230384685
- Publication date Nov 30, 2023
- Carl Zeiss SMT GMBH
- Arno Schmittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FIELD FACET SYSTEM AND LITHOGRAPHY APPARATUS
- Publication number 20230384686
- Publication date Nov 30, 2023
- Carl Zeiss SMT GMBH
- Arno Schmittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FACET MIRROR FOR AN ILLUMINATION OPTICAL UNIT OF A PROJECTION EXPOS...
- Publication number 20220206398
- Publication date Jun 30, 2022
- Carl Zeiss SMT GMBH
- Willi Anderl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING A REFLECTIVE OPTICAL ELEMENT, REFLECTIVE OPTIC...
- Publication number 20200096874
- Publication date Mar 26, 2020
- Carl Zeiss SMT GMBH
- Markus Bauer
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
PROJECTION LIGHTING SYSTEM FOR SEMICONDUCTOR LITHOGRAPHY WITH AN IM...
- Publication number 20190384187
- Publication date Dec 19, 2019
- Carl Zeiss SMT GMBH
- Ulrich Weber
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Beam Reverser Module and Optical Power Amplifier Having Such a Beam...
- Publication number 20180102620
- Publication date Apr 12, 2018
- Carl Zeiss SMT GMBH
- Michael Schall
- G02 - OPTICS
Information Patent Application
METHOD FOR PRODUCING A REFLECTIVE OPTICAL ELEMENT, REFLECTIVE OPTIC...
- Publication number 20170315453
- Publication date Nov 2, 2017
- Carl Zeiss SMT GMBH
- Markus Bauer
- G02 - OPTICS
Information Patent Application
COOLER FOR USE IN A DEVICE IN A VACUUM
- Publication number 20160299443
- Publication date Oct 13, 2016
- Carl Zeiss SMT GMBH
- Willi Anderl
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Application
Beam Reverser Module and Optical Power Amplifier Having Such a Beam...
- Publication number 20150340829
- Publication date Nov 26, 2015
- Carl Zeiss SMT GMBH
- Michael Schall
- G02 - OPTICS
Information Patent Application
COOLER FOR PLASMA GENERATION CHAMBER OF EUV RADIATION SOURCE
- Publication number 20150083938
- Publication date Mar 26, 2015
- CARL ZEISS LASER OPTICS GmbH
- Willi Anderl
- G02 - OPTICS
Information Patent Application
EUV COLLECTOR MIRROR SHELL OF AN EUV COLLECTOR FOR EUV LITHOGRAPHY
- Publication number 20130176614
- Publication date Jul 11, 2013
- CARL ZEISS LASER OPTICS GmbH
- Willi Anderl
- G02 - OPTICS
Information Patent Application
OPTICAL COMPONENT HAVING AN IMPROVED TRANSIENT THERMAL BEHAVIOR AND...
- Publication number 20110211180
- Publication date Sep 1, 2011
- Carl Zeiss SMT GMBH
- Wilhelm Egle
- B82 - NANO-TECHNOLOGY
Information Patent Application
REFLECTIVE OPTICAL ELEMENT FOR USE IN AN EUV SYSTEM
- Publication number 20110051267
- Publication date Mar 3, 2011
- CARL ZEISS LASER OPTICS GmbH
- Holger Kierey
- G02 - OPTICS
Information Patent Application
Optical Component Having an Improved Transient Thermal Behavior and...
- Publication number 20090021950
- Publication date Jan 22, 2009
- Wilhelm Egle
- B82 - NANO-TECHNOLOGY
Information Patent Application
Optical component having an improved transient thermal behavior and...
- Publication number 20060093253
- Publication date May 4, 2006
- Wilhelm Egle
- B82 - NANO-TECHNOLOGY

Willi Anderl

Person

Patents Grantslast 30 patents

Facet mirror for an illumination optical unit of a projection expos...

Method for producing a reflective optical element, reflective optic...

Projection lighting system for semiconductor lithography with an im...

Beam reverser module and optical power amplifier having such a beam...

Method for producing a reflective optical element, reflective optic...

Method for producing a reflective optical element, reflective optic...

Cooler for use in a device in a vacuum

Beam reverser module and optical power amplifier having such a beam...

Reflective optical element for use in an EUV system

Optical component having an improved transient thermal behavior and...

Optical component having an improved transient thermal behavior and...

Patents Applicationslast 30 patents

FIELD FACET SYSTEM AND LITHOGRAPHY APPARATUS

FIELD FACET SYSTEM AND LITHOGRAPHY APPARATUS

FACET MIRROR FOR AN ILLUMINATION OPTICAL UNIT OF A PROJECTION EXPOS...

METHOD FOR PRODUCING A REFLECTIVE OPTICAL ELEMENT, REFLECTIVE OPTIC...

PROJECTION LIGHTING SYSTEM FOR SEMICONDUCTOR LITHOGRAPHY WITH AN IM...

Beam Reverser Module and Optical Power Amplifier Having Such a Beam...

METHOD FOR PRODUCING A REFLECTIVE OPTICAL ELEMENT, REFLECTIVE OPTIC...

COOLER FOR USE IN A DEVICE IN A VACUUM

Beam Reverser Module and Optical Power Amplifier Having Such a Beam...

COOLER FOR PLASMA GENERATION CHAMBER OF EUV RADIATION SOURCE

EUV COLLECTOR MIRROR SHELL OF AN EUV COLLECTOR FOR EUV LITHOGRAPHY

OPTICAL COMPONENT HAVING AN IMPROVED TRANSIENT THERMAL BEHAVIOR AND...

REFLECTIVE OPTICAL ELEMENT FOR USE IN AN EUV SYSTEM

Optical Component Having an Improved Transient Thermal Behavior and...

Optical component having an improved transient thermal behavior and...