William A. Enichen

Person

Dutchess County, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Lithography tool image quality evaluating and correcting
- Patent number 7,391,023
- Issue date Jun 24, 2008
- International Business Machines Corporation
- William A. Enichen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithography tool image quality evaluating and correcting
- Patent number 6,931,337
- Issue date Aug 16, 2005
- International Business Machines Corporation
- William A. Enichen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Precision high speed magnetic coil driver circuit
- Patent number 6,388,516
- Issue date May 14, 2002
- International Business Machines Corporation
- Samuel K. Doran
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Magnification and rotation calibration patterns for particle beam p...
- Patent number 6,320,187
- Issue date Nov 20, 2001
- Nikon Corporation
- William Albert Enichen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Compensation of space charge in a particle beam system
- Patent number 6,201,251
- Issue date Mar 13, 2001
- Nikon Corporation
- Steven Douglas Golladay
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Measurement marks for e-beam projection mask and method of using
- Patent number 6,040,095
- Issue date Mar 21, 2000
- Nikon Corporation
- William A. Enichen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for monitoring resist charging in a charged particle system
- Patent number 5,838,013
- Issue date Nov 17, 1998
- International Business Machines Corporation
- Rainer Butsch
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Calibration patterns and techniques for charged particle projection...
- Patent number 5,763,894
- Issue date Jun 9, 1998
- International Business Machines Corporation
- William A. Enichen
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Hardware/software implementation for multipass E-beam mask writing
- Patent number 5,621,216
- Issue date Apr 15, 1997
- International Business Machines Corporation
- Eileen V. Clarke
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron beam nano-metrology system
- Patent number 5,585,629
- Issue date Dec 17, 1996
- International Business Machines Corporation
- Samuel K. Doran
- G01 - MEASURING TESTING
Information Patent Grant
Registration and alignment technique for X-ray mask fabrication
- Patent number 5,570,405
- Issue date Oct 29, 1996
- International Business Machines Corporation
- Ken Tze-Kin Chan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pseudo-random registration masks for projection lithography tool
- Patent number 5,552,611
- Issue date Sep 3, 1996
- International Business Machines
- William A. Enichen
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Registration of patterns formed of multiple fields
- Patent number 5,301,124
- Issue date Apr 5, 1994
- International Business Machines Corporation
- Ken T. Chan
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
Lithography tool image quality evaluating and correcting
- Publication number 20050236567
- Publication date Oct 27, 2005
- William A. Enichen
- B82 - NANO-TECHNOLOGY
Information Patent Application
LITHOGRAPHY TOOL IMAGE QUALITY EVALUATING AND CORRECTING
- Publication number 20040267471
- Publication date Dec 30, 2004
- International Business Machines Corporation, Armonk, NY
- William A. Enichen
- B82 - NANO-TECHNOLOGY

William A. Enichen

Person

Patents Grantslast 30 patents

Lithography tool image quality evaluating and correcting

Lithography tool image quality evaluating and correcting

Precision high speed magnetic coil driver circuit

Magnification and rotation calibration patterns for particle beam p...

Compensation of space charge in a particle beam system

Measurement marks for e-beam projection mask and method of using

Method for monitoring resist charging in a charged particle system

Calibration patterns and techniques for charged particle projection...

Hardware/software implementation for multipass E-beam mask writing

Electron beam nano-metrology system

Registration and alignment technique for X-ray mask fabrication

Pseudo-random registration masks for projection lithography tool

Registration of patterns formed of multiple fields

Patents Applicationslast 30 patents

Lithography tool image quality evaluating and correcting

LITHOGRAPHY TOOL IMAGE QUALITY EVALUATING AND CORRECTING