William D. Hinsberg

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Positive tone organic solvent developed chemically amplified resist
- Patent number 8,900,802
- Issue date Dec 2, 2014
- International Business Machines Corporation
- Robert D. Allen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of directed self-assembly and layered structures formed the...
- Patent number 8,828,493
- Issue date Sep 9, 2014
- International Business Machines Corporation
- Joy Cheng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of directed self-assembly and layered structures formed the...
- Patent number 8,821,978
- Issue date Sep 2, 2014
- International Business Machines Corporation
- Joy Cheng
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Methods of directed self-assembly, and layered structures formed th...
- Patent number 8,623,458
- Issue date Jan 7, 2014
- International Business Machines Corporation
- Joy Cheng
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Photodecomposable bases and photoresist compositions
- Patent number 8,614,047
- Issue date Dec 24, 2013
- International Business Machines Corporation
- Ramakrishnan Ayothi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Fluoroalcohol containing molecular photoresist materials and proces...
- Patent number 8,530,136
- Issue date Sep 10, 2013
- International Business Machines Corporation
- Luisa D. Bozano
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Alkaline rinse agents for use in lithographic patterning
- Patent number 8,298,751
- Issue date Oct 30, 2012
- International Business Machines Corporation
- William D. Hinsberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Interconnection between sublithographic-pitched structures and lith...
- Patent number 8,247,904
- Issue date Aug 21, 2012
- International Business Machines Corporation
- Sarunya Bangsaruntip
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming polymer features by directed self-assembly of blo...
- Patent number 8,226,838
- Issue date Jul 24, 2012
- International Business Machines Corporation
- Joy Cheng
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Immersion topcoat materials with improved performance
- Patent number 7,855,045
- Issue date Dec 21, 2010
- International Business Machines Corporation
- Robert David Allen
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method of forming polymer features by directed self-assembly of blo...
- Patent number 7,521,094
- Issue date Apr 21, 2009
- International Business Machines Corporation
- Joy Cheng
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Immersion topcoat materials with improved performance
- Patent number 7,288,362
- Issue date Oct 30, 2007
- International Business Machines Corporation
- Robert David Allen
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Process for forming features of 50 nm or less half-pitch with chemi...
- Patent number 7,090,963
- Issue date Aug 15, 2006
- International Business Machines Corporation
- David R. Medeiros
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fast model-based optical proximity correction
- Patent number 7,079,223
- Issue date Jul 18, 2006
- International Business Machines Corporation
- Alan E. Rosenbluth
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for preparing a patterned continuous polymeric brush on a s...
- Patent number 6,423,465
- Issue date Jul 23, 2002
- International Business Machines Corporation
- Craig Jon Hawker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for imaging of photoresist
- Patent number 6,277,546
- Issue date Aug 21, 2001
- International Business Machines Corporation
- Gregory Breyta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for photoimaging
- Patent number 6,180,317
- Issue date Jan 30, 2001
- International Business Machines Corporation
- Robert David Allen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Software architecture for stochastic simulation of non-homogeneous...
- Patent number 5,826,065
- Issue date Oct 20, 1998
- International Business Machines Corporation
- William Dinan Hinsberg
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Copolymers 4-hydroxystyrene and alkyl substituted-4-hydroxystyrene
- Patent number 5,807,947
- Issue date Sep 15, 1998
- Clariant Finance (BVI) Limited
- Richard Vicari
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition for photoimaging
- Patent number 5,747,223
- Issue date May 5, 1998
- International Business Machines Corporation
- Robert D. Allen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for stochastic and deterministic timebase control in stochas...
- Patent number 5,745,385
- Issue date Apr 28, 1998
- International Business Machines Corproation
- William Dinan Hinsberg
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Process for synthesizing chemical compounds
- Patent number 5,658,734
- Issue date Aug 19, 1997
- International Business Machines Corporation
- Phillip Joe Brock
- C40 - COMBINATORIAL CHEMISTRY
Information Patent Grant
Stochastic simulation method for processes containing equilibrium s...
- Patent number 5,625,579
- Issue date Apr 29, 1997
- International Business Machines Corporation
- William D. Hinsberg
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Spatially resolved stochastic simulation system
- Patent number 5,446,870
- Issue date Aug 29, 1995
- International Business Machines Corporation
- William D. Hinsberg
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Patterning process for bipolar optical storage medium
- Patent number 5,432,047
- Issue date Jul 11, 1995
- International Business Machines Corporation
- John C. Cheng
- G11 - INFORMATION STORAGE
Information Patent Grant
Radiation-sensitive resist composition and process for its use
- Patent number 5,372,912
- Issue date Dec 13, 1994
- International Business Machines Corporation
- Robert D. Allen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Copolymers of 4-hydroxystyrene and alkyl substituted-4-hydroxystyre...
- Patent number 5,342,727
- Issue date Aug 30, 1994
- Hoechst Celanese Corp.
- Richard Vicari
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive photoresist system for near-UV to visible imaging
- Patent number 5,272,042
- Issue date Dec 21, 1993
- International Business Machines Corporation
- Robert D. Allen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for photo imaging
- Patent number 5,264,325
- Issue date Nov 23, 1993
- International Business Machines Corporation
- Robert D. Allen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Liquid apply, aqueous processable photoresist compositions
- Patent number 5,071,730
- Issue date Dec 10, 1991
- International Business Machines Corporation
- Robert D. Allen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
POSITIVE TONE ORGANIC SOLVENT DEVELOPED CHEMICALLY AMPLIFIED RESIST
- Publication number 20140242526
- Publication date Aug 28, 2014
- JSR Corporation
- Robert D. Allen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTODECOMPOSABLE BASES AND PHOTORESIST COMPOSITIONS
- Publication number 20130052585
- Publication date Feb 28, 2013
- JSR Corporation
- Ramakrishnan Ayothi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Fluoroalcohol Containing Molecular Photoresist Materials and Proces...
- Publication number 20120156611
- Publication date Jun 21, 2012
- International Business Machines Corporation
- Luisa D. Bozano
- C07 - ORGANIC CHEMISTRY
Information Patent Application
METHODS OF DIRECTED SELF-ASSEMBLY AND LAYERED STRUCTURES FORMED THE...
- Publication number 20110147985
- Publication date Jun 23, 2011
- Joy CHENG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS OF DIRECTED SELF-ASSEMBLY AND LAYERED STRUCTURES FORMED THE...
- Publication number 20110147983
- Publication date Jun 23, 2011
- Joy CHENG
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
METHODS OF DIRECTED SELF-ASSEMBLY, AND LAYERED STRUCTURES FORMED TH...
- Publication number 20110147984
- Publication date Jun 23, 2011
- Joy CHENG
- B82 - NANO-TECHNOLOGY
Information Patent Application
Alkaline Rinse Agents For Use In Lithographic Patterning
- Publication number 20110104900
- Publication date May 5, 2011
- International Business Machines Corporation
- William D. Hinsberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTERCONNECTION BETWEEN SUBLITHOGRAPHIC-PITCHED STRUCTURES AND LITH...
- Publication number 20110037175
- Publication date Feb 17, 2011
- International Business Machines Corporation
- Sarunya Bangsaruntip
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING POLYMER FEATURES BY DIRECTED SELF-ASSEMBLY OF BLO...
- Publication number 20090179002
- Publication date Jul 16, 2009
- International Business Machines Corporation
- Joy Cheng
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD FOR FORMING A TUNABLE DEEP-ULTRVIOLET DIELECTRIC ANTIREFLECT...
- Publication number 20080118866
- Publication date May 22, 2008
- International Business Machines Corporation
- Gregory Breyta
- G11 - INFORMATION STORAGE
Information Patent Application
IMMERSION TOPCOAT MATERIALS WITH IMPROVED PERFORMANCE
- Publication number 20080026330
- Publication date Jan 31, 2008
- International Business Machines Corporation
- Robert David Allen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TOPCOATS FOR USE IN IMMERSION LITHOGRAPHY
- Publication number 20070128543
- Publication date Jun 7, 2007
- William Dinan Hinsberg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Topcoats for use in immersion lithography
- Publication number 20060275704
- Publication date Dec 7, 2006
- William Dinan Hinsberg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Immersion topcoat materials with improved performance
- Publication number 20060188804
- Publication date Aug 24, 2006
- International Business Machines Corporation
- Robert David Allen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Apparatus for characterization of photoresist resolution, and metho...
- Publication number 20060126053
- Publication date Jun 15, 2006
- William Dinan Hinsberg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Fast model-based optical proximity correction
- Publication number 20050185159
- Publication date Aug 25, 2005
- International Business Machines Corporation
- Alan E. Rosenbluth
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Apparatus for characterization of photoresist resolution, and metho...
- Publication number 20050168717
- Publication date Aug 4, 2005
- William Dinan Hinsberg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROCESS FOR FORMING FEATURES OF 50 NM OR LESS HALF-PITCH WITH CHEMI...
- Publication number 20040265747
- Publication date Dec 30, 2004
- International Business Machines Corporation
- David R. Medeiros
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mehod for forming a tunable deep-ultraviolet dielectric antireflect...
- Publication number 20040048194
- Publication date Mar 11, 2004
- International Business Machines Corporation
- Gregory Breyta
- G11 - INFORMATION STORAGE

William D. Hinsberg

Person

Patents Grantslast 30 patents

Positive tone organic solvent developed chemically amplified resist

Methods of directed self-assembly and layered structures formed the...

Methods of directed self-assembly and layered structures formed the...

Methods of directed self-assembly, and layered structures formed th...

Photodecomposable bases and photoresist compositions

Fluoroalcohol containing molecular photoresist materials and proces...

Alkaline rinse agents for use in lithographic patterning

Interconnection between sublithographic-pitched structures and lith...

Method of forming polymer features by directed self-assembly of blo...

Immersion topcoat materials with improved performance

Method of forming polymer features by directed self-assembly of blo...

Immersion topcoat materials with improved performance

Process for forming features of 50 nm or less half-pitch with chemi...

Fast model-based optical proximity correction

Process for preparing a patterned continuous polymeric brush on a s...

Process for imaging of photoresist

Composition for photoimaging

Software architecture for stochastic simulation of non-homogeneous...

Copolymers 4-hydroxystyrene and alkyl substituted-4-hydroxystyrene

Composition for photoimaging

Method for stochastic and deterministic timebase control in stochas...

Process for synthesizing chemical compounds

Stochastic simulation method for processes containing equilibrium s...

Spatially resolved stochastic simulation system

Patterning process for bipolar optical storage medium

Radiation-sensitive resist composition and process for its use

Copolymers of 4-hydroxystyrene and alkyl substituted-4-hydroxystyre...

Positive photoresist system for near-UV to visible imaging

Composition for photo imaging

Liquid apply, aqueous processable photoresist compositions

Patents Applicationslast 30 patents

POSITIVE TONE ORGANIC SOLVENT DEVELOPED CHEMICALLY AMPLIFIED RESIST

PHOTODECOMPOSABLE BASES AND PHOTORESIST COMPOSITIONS

Fluoroalcohol Containing Molecular Photoresist Materials and Proces...

METHODS OF DIRECTED SELF-ASSEMBLY AND LAYERED STRUCTURES FORMED THE...

METHODS OF DIRECTED SELF-ASSEMBLY AND LAYERED STRUCTURES FORMED THE...

METHODS OF DIRECTED SELF-ASSEMBLY, AND LAYERED STRUCTURES FORMED TH...

Alkaline Rinse Agents For Use In Lithographic Patterning

INTERCONNECTION BETWEEN SUBLITHOGRAPHIC-PITCHED STRUCTURES AND LITH...

METHOD OF FORMING POLYMER FEATURES BY DIRECTED SELF-ASSEMBLY OF BLO...

METHOD FOR FORMING A TUNABLE DEEP-ULTRVIOLET DIELECTRIC ANTIREFLECT...

IMMERSION TOPCOAT MATERIALS WITH IMPROVED PERFORMANCE

TOPCOATS FOR USE IN IMMERSION LITHOGRAPHY

Topcoats for use in immersion lithography

Immersion topcoat materials with improved performance

Apparatus for characterization of photoresist resolution, and metho...

Fast model-based optical proximity correction

Apparatus for characterization of photoresist resolution, and metho...

PROCESS FOR FORMING FEATURES OF 50 NM OR LESS HALF-PITCH WITH CHEMI...

Mehod for forming a tunable deep-ultraviolet dielectric antireflect...