William Guthrie

Person

Santa Clara, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method and system for determining a charged particle beam exposure...
- Patent number 12,243,712
- Issue date Mar 4, 2025
- D2S, Inc.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system of reducing charged particle beam write time
- Patent number 11,886,166
- Issue date Jan 30, 2024
- D2S, Inc.
- Akira Fujimura
- G05 - CONTROLLING REGULATING
Information Patent Grant
Method and system for determining a charged particle beam exposure...
- Patent number 11,756,765
- Issue date Sep 12, 2023
- D2S, Inc.
- Akira Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system of reducing charged particle beam write time
- Patent number 11,604,451
- Issue date Mar 14, 2023
- D2S, Inc.
- Akira Fujimura
- G05 - CONTROLLING REGULATING
Information Patent Grant
Method and system of reducing charged particle beam write time
- Patent number 11,592,802
- Issue date Feb 28, 2023
- D2S, Inc.
- Akira Fujimura
- G05 - CONTROLLING REGULATING
Information Patent Grant
Method and system for determining a charged particle beam exposure...
- Patent number 11,062,878
- Issue date Jul 13, 2021
- D2S, Inc.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system of reducing charged particle beam write time
- Patent number 10,884,395
- Issue date Jan 5, 2021
- D2S, Inc.
- Akira Fujimura
- G05 - CONTROLLING REGULATING
Information Patent Grant
Method and system for determining a charged particle beam exposure...
- Patent number 10,748,744
- Issue date Aug 18, 2020
- D2S, Inc.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shaped beam lithography including temperature effects
- Patent number 10,460,071
- Issue date Oct 29, 2019
- D2S, Inc.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and system for measuring circuit design capability
- Patent number 6,823,294
- Issue date Nov 23, 2004
- Collett International, Inc.
- William E. Guthrie
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...
- Publication number 20230386784
- Publication date Nov 30, 2023
- D2S, INC.
- Akira Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM OF REDUCING CHARGED PARTICLE BEAM WRITE TIME
- Publication number 20230205177
- Publication date Jun 29, 2023
- D2S, INC.
- Akira Fujimura
- G05 - CONTROLLING REGULATING
Information Patent Application
METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...
- Publication number 20230124768
- Publication date Apr 20, 2023
- D2S, INC.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...
- Publication number 20210313143
- Publication date Oct 7, 2021
- D2S, INC.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM OF REDUCING CHARGED PARTICLE BEAM WRITE TIME
- Publication number 20210208569
- Publication date Jul 8, 2021
- D2S, INC.
- Akira Fujimura
- G05 - CONTROLLING REGULATING
Information Patent Application
METHOD AND SYSTEM OF REDUCING CHARGED PARTICLE BEAM WRITE TIME
- Publication number 20210116884
- Publication date Apr 22, 2021
- D2S, INC.
- Akira Fujimura
- G05 - CONTROLLING REGULATING
Information Patent Application
METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...
- Publication number 20200373122
- Publication date Nov 26, 2020
- D2S, INC.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM OF REDUCING CHARGED PARTICLE BEAM WRITE TIME
- Publication number 20200201286
- Publication date Jun 25, 2020
- D2S, INC.
- Akira Fujimura
- G05 - CONTROLLING REGULATING
Information Patent Application
METHOD AND SYSTEM FOR FORMING PATTERNS USING SHAPED BEAM LITHOGRAPH...
- Publication number 20170124247
- Publication date May 4, 2017
- D2S, INC.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING

William Guthrie

Person

Patents Grantslast 30 patents

Method and system for determining a charged particle beam exposure...

Method and system of reducing charged particle beam write time

Method and system for determining a charged particle beam exposure...

Method and system of reducing charged particle beam write time

Method and system of reducing charged particle beam write time

Method and system for determining a charged particle beam exposure...

Method and system of reducing charged particle beam write time

Method and system for determining a charged particle beam exposure...

Shaped beam lithography including temperature effects

Method and system for measuring circuit design capability

Patents Applicationslast 30 patents

METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...

METHOD AND SYSTEM OF REDUCING CHARGED PARTICLE BEAM WRITE TIME

METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...

METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...

METHOD AND SYSTEM OF REDUCING CHARGED PARTICLE BEAM WRITE TIME

METHOD AND SYSTEM OF REDUCING CHARGED PARTICLE BEAM WRITE TIME

METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...

METHOD AND SYSTEM OF REDUCING CHARGED PARTICLE BEAM WRITE TIME

METHOD AND SYSTEM FOR FORMING PATTERNS USING SHAPED BEAM LITHOGRAPH...