William H. Guthrie

Person

Essex Junction, VT, US

People

Patents Grantslast 30 patents

Information Patent Grant
Programmable semiconductor device
- Patent number 8,724,365
- Issue date May 13, 2014
- International Business Machines Corporation
- William R. Tonti
- G11 - INFORMATION STORAGE
Information Patent Grant
Programmable semiconductor device
- Patent number 8,184,465
- Issue date May 22, 2012
- International Business Machines Corporation
- William R. Tonti
- G11 - INFORMATION STORAGE
Information Patent Grant
Programmable semiconductor device
- Patent number 7,872,897
- Issue date Jan 18, 2011
- International Business Machines Corporation
- William R. Tonti
- G11 - INFORMATION STORAGE
Information Patent Grant
Polishing assembly with a window
- Patent number 7,255,629
- Issue date Aug 14, 2007
- Applied Materials, Inc.
- Manoocher Birang
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad with window and method of fabricating a window in a p...
- Patent number 7,118,450
- Issue date Oct 10, 2006
- Applied Materials, Inc.
- Manoocher Birang
- B24 - GRINDING POLISHING
Information Patent Grant
Forming a transparent window in a polishing pad for a chemical mech...
- Patent number 7,011,565
- Issue date Mar 14, 2006
- Applied Materials, Inc.
- Manoocher Birang
- B24 - GRINDING POLISHING
Information Patent Grant
Method of forming a transparent window in a polishing pad
- Patent number 6,910,944
- Issue date Jun 28, 2005
- Applied Materials, Inc.
- Manoocher Birang
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical-mechanical planarization of metallurgy
- Patent number 6,632,377
- Issue date Oct 14, 2003
- International Business Machines Corporation
- Vlasta Brusic
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for eliminating crack damage induced by delaminating gate co...
- Patent number 6,492,247
- Issue date Dec 10, 2002
- International Business Machines Corporation
- William H. Guthrie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for distribution of slurry in a chemical mecha...
- Patent number 6,280,297
- Issue date Aug 28, 2001
- Applied Materials, Inc.
- Robert D. Tolles
- B24 - GRINDING POLISHING
Information Patent Grant
Method of forming a transparent window in a polishing pad
- Patent number 6,280,290
- Issue date Aug 28, 2001
- Applied Materials, Inc.
- Manoocher Birang
- B24 - GRINDING POLISHING
Information Patent Grant
Method of planarizing first pole piece layer of write head by lappi...
- Patent number 6,131,271
- Issue date Oct 17, 2000
- International Business Machines Corporation
- Robert Edward Fontana
- G11 - INFORMATION STORAGE
Information Patent Grant
Apparatus and method for distribution of slurry in a chemical mecha...
- Patent number 6,051,499
- Issue date Apr 18, 2000
- Applied Materials, Inc.
- Robert D. Tolles
- B24 - GRINDING POLISHING
Information Patent Grant
Forming a transparent window in a polishing pad for a chemical mech...
- Patent number 6,045,439
- Issue date Apr 4, 2000
- Applied Materials, Inc.
- Manoocher Birang
- B24 - GRINDING POLISHING
Information Patent Grant
Method and apparatus for in-line oxide thickness determination in c...
- Patent number 6,020,264
- Issue date Feb 1, 2000
- International Business Machines Corporation
- Naftali Eliahu Lustig
- B24 - GRINDING POLISHING
Information Patent Grant
Forming a transparent window in a polishing pad for a chemical mech...
- Patent number 5,893,796
- Issue date Apr 13, 1999
- Applied Materials, Inc.
- Manoocher Birang
- B24 - GRINDING POLISHING
Information Patent Grant
Method and apparatus for using a retaining ring to control the edge...
- Patent number 5,795,215
- Issue date Aug 18, 1998
- Applied Materials, Inc.
- William L. Guthrie
- B24 - GRINDING POLISHING
Information Patent Grant
Apparatus and method for distribution of slurry in a chemical mecha...
- Patent number 5,709,593
- Issue date Jan 20, 1998
- Applied Materials, Inc.
- William L. Guthrie
- B24 - GRINDING POLISHING
Information Patent Grant
Laser planarization of zone 1 deposited metal films for submicron m...
- Patent number 5,633,195
- Issue date May 27, 1997
- International Business Machines, Corp.
- William L. Guthrie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
ZAG fuse for reduced blow-current application
- Patent number 5,420,456
- Issue date May 30, 1995
- International Business Machines Corporation
- Duane E. Galbi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ endpoint detection method and apparatus for chemical-mechan...
- Patent number 5,337,015
- Issue date Aug 9, 1994
- International Business Machines Corporation
- Naftali E. Lustig
- B24 - GRINDING POLISHING
Information Patent Grant
Plural level chip masking
- Patent number 5,126,006
- Issue date Jun 30, 1992
- International Business Machines Corp.
- John E. Cronin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of chemical-mechanical polishing an electronic component sub...
- Patent number 4,954,142
- Issue date Sep 4, 1990
- International Business Machines Corporation
- Jeffrey W. Carr
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Chem-mech polishing method for producing coplanar metal/insulator f...
- Patent number 4,944,836
- Issue date Jul 31, 1990
- International Business Machines Corporation
- Klaus D. Beyer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tape bonded semiconductor device
- Patent number 4,912,547
- Issue date Mar 27, 1990
- International Business Machines Corporation
- James A. Bilowith
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for producing coplanar multi-level metal/insulator films on...
- Patent number 4,789,648
- Issue date Dec 6, 1988
- International Business Machines Corporation
- Melanie M. Chow
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming fine conductive lines, patterns and connectors
- Patent number 4,702,792
- Issue date Oct 27, 1987
- International Business Machines Corporation
- Ming-Fea Chow
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
TRANSPARENT WINDOW IN A POLISHING PAD
- Publication number 20140038501
- Publication date Feb 6, 2014
- Applied Materials, Inc.
- Manoocher Birang
- G01 - MEASURING TESTING
Information Patent Application
PROGRAMMABLE SEMICONDUCTOR DEVICE
- Publication number 20120178239
- Publication date Jul 12, 2012
- International Business Machines Corporation
- William R. Tonti
- G11 - INFORMATION STORAGE
Information Patent Application
PROGRAMMABLE SEMICONDUCTOR DEVICE
- Publication number 20110032025
- Publication date Feb 10, 2011
- International Business Machines Corporation
- William R. Tonti
- G11 - INFORMATION STORAGE
Information Patent Application
Substrate polishing metrology using interference signals
- Publication number 20080227367
- Publication date Sep 18, 2008
- Applied Materials, Inc.
- Manoocher Birang
- B24 - GRINDING POLISHING
Information Patent Application
PROGRAMMABLE SEMICONDUCTOR DEVICE
- Publication number 20070298526
- Publication date Dec 27, 2007
- Wayne S. Berry
- G11 - INFORMATION STORAGE
Information Patent Application
Programmable Semiconductor Device
- Publication number 20070242548
- Publication date Oct 18, 2007
- International Business Machines Corporation
- William R. Tonti
- G11 - INFORMATION STORAGE
Information Patent Application
Polishing Assembly With A Window
- Publication number 20070021037
- Publication date Jan 25, 2007
- Applied Materials, Inc.
- Manoocher Birang
- B24 - GRINDING POLISHING
Information Patent Application
Method of fabricating a window in a polishing pad
- Publication number 20060014476
- Publication date Jan 19, 2006
- Manoocher Birang
- B24 - GRINDING POLISHING
Information Patent Application
Forming a transparent window in a polishing pad for a chemical mech...
- Publication number 20030190867
- Publication date Oct 9, 2003
- Applied Materials, Inc., a Delaware corporation
- Manoocher Birang
- B24 - GRINDING POLISHING
Information Patent Application
Forming a transparent window in a polishing pad for a chemical mehc...
- Publication number 20010036805
- Publication date Nov 1, 2001
- Applied Materials, Inc., a Delaware corporation
- Manoocher M.B. Birang
- G01 - MEASURING TESTING

William H. Guthrie

Person

Patents Grantslast 30 patents

Programmable semiconductor device

Programmable semiconductor device

Programmable semiconductor device

Polishing assembly with a window

Polishing pad with window and method of fabricating a window in a p...

Forming a transparent window in a polishing pad for a chemical mech...

Method of forming a transparent window in a polishing pad

Chemical-mechanical planarization of metallurgy

Method for eliminating crack damage induced by delaminating gate co...

Apparatus and method for distribution of slurry in a chemical mecha...

Method of forming a transparent window in a polishing pad

Method of planarizing first pole piece layer of write head by lappi...

Apparatus and method for distribution of slurry in a chemical mecha...

Forming a transparent window in a polishing pad for a chemical mech...

Method and apparatus for in-line oxide thickness determination in c...

Forming a transparent window in a polishing pad for a chemical mech...

Method and apparatus for using a retaining ring to control the edge...

Apparatus and method for distribution of slurry in a chemical mecha...

Laser planarization of zone 1 deposited metal films for submicron m...

ZAG fuse for reduced blow-current application

In-situ endpoint detection method and apparatus for chemical-mechan...

Plural level chip masking

Method of chemical-mechanical polishing an electronic component sub...

Chem-mech polishing method for producing coplanar metal/insulator f...

Tape bonded semiconductor device

Method for producing coplanar multi-level metal/insulator films on...

Method of forming fine conductive lines, patterns and connectors

Patents Applicationslast 30 patents

TRANSPARENT WINDOW IN A POLISHING PAD

PROGRAMMABLE SEMICONDUCTOR DEVICE

PROGRAMMABLE SEMICONDUCTOR DEVICE

Substrate polishing metrology using interference signals

PROGRAMMABLE SEMICONDUCTOR DEVICE

Programmable Semiconductor Device

Polishing Assembly With A Window

Method of fabricating a window in a polishing pad

Forming a transparent window in a polishing pad for a chemical mech...

Forming a transparent window in a polishing pad for a chemical mehc...