William J. Baggenstoss

Person

Boise, ID, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method of forming pixel cell having a grated interface
- Patent number 8,101,454
- Issue date Jan 24, 2012
- Micron Technology, Inc.
- William J. Baggenstoss
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pixel cell having a grated interface
- Patent number 7,880,255
- Issue date Feb 1, 2011
- Micron Technology, Inc.
- William J. Baggenstoss
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reticles and methods of forming and using the same
- Patent number 7,229,724
- Issue date Jun 12, 2007
- Micron Technology, Inc.
- William J. Baggenstoss
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Capacitor layout orientation
- Patent number 7,208,813
- Issue date Apr 24, 2007
- Micron Technology, Inc.
- Bill Baggenstoss
- G11 - INFORMATION STORAGE
Information Patent Grant
Capacitor layout orientation
- Patent number 7,205,633
- Issue date Apr 17, 2007
- Micron Technology, Inc.
- Bill Baggenstoss
- G11 - INFORMATION STORAGE
Information Patent Grant
Methods of patterning radiation, methods of forming radiation-patte...
- Patent number 7,122,453
- Issue date Oct 17, 2006
- Micron Technology, Inc.
- Bill Baggenstoss
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern mask with features to minimize the effect of aberrations
- Patent number 7,105,278
- Issue date Sep 12, 2006
- Micron Technology, Inc.
- Pary Baluswamy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Field correction of overlay error
- Patent number 6,893,786
- Issue date May 17, 2005
- Micron Technology, Inc.
- Bill Baggenstoss
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticles and methods of forming and using the same
- Patent number 6,854,106
- Issue date Feb 8, 2005
- Micron Technology, Inc.
- William J. Baggenstoss
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Field correction of overlay error
- Patent number 6,841,889
- Issue date Jan 11, 2005
- Micron Technology, Inc.
- Bill Baggenstoss
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Field correction of overlay error
- Patent number 6,811,934
- Issue date Nov 2, 2004
- Micron Technology, Inc.
- Bill Baggenstoss
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern mask with features to minimize the effect of aberrations
- Patent number 6,803,157
- Issue date Oct 12, 2004
- Micron Technology, Inc.
- Pary Baluswamy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Field correction of overlay error
- Patent number 6,779,171
- Issue date Aug 17, 2004
- Micron Technology, Inc.
- Bill Baggenstoss
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of patterning radiation, methods of forming radiation-patte...
- Patent number 6,692,876
- Issue date Feb 17, 2004
- Micron Technology, Inc.
- Bill Baggenstoss
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of patterning radiation, methods of forming radiation-patte...
- Patent number 6,692,900
- Issue date Feb 17, 2004
- Micron Technology, Inc.
- Bill Baggenstoss
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of patterning radiation, methods of forming radiation-patte...
- Patent number 6,569,574
- Issue date May 27, 2003
- Micron Technology, Inc.
- Bill Baggenstoss
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Field correction of overlay error
- Patent number 6,440,612
- Issue date Aug 27, 2002
- Micron Technology, Inc.
- Bill Baggenstoss
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method to eliminate side lobe printing of attenuated phase shift
- Patent number 6,401,236
- Issue date Jun 4, 2002
- Micron Technology Inc.
- William J. Baggenstoss
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Correction of field effects in photolithography
- Patent number 6,374,396
- Issue date Apr 16, 2002
- Micron Technology, Inc.
- Bill Baggenstoss
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of reducing proximity effects in lithographic processes
- Patent number 6,319,644
- Issue date Nov 20, 2001
- Micron Technology, Inc.
- Christophe Pierrat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of reducing proximity effects in lithographic processes
- Patent number 6,284,419
- Issue date Sep 4, 2001
- Micron Technology, Inc.
- Christophe Pierrat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of reducing proximity effects in lithographic processes
- Patent number 6,120,952
- Issue date Sep 19, 2000
- Micron Technology, Inc.
- Christophe Pierrat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Pattern mask with features to minimize the effect of aberrations
- Publication number 20060093927
- Publication date May 4, 2006
- Pary Baluswamy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pixel cell having a grated interface
- Publication number 20060081900
- Publication date Apr 20, 2006
- William J. Baggenstoss
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Capacitor layout orientation
- Publication number 20060011992
- Publication date Jan 19, 2006
- Bill Baggenstoss
- G11 - INFORMATION STORAGE
Information Patent Application
Pixel cell having a grated interface
- Publication number 20060011955
- Publication date Jan 19, 2006
- William J. Baggenstoss
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Reticles and methods of forming and using the same
- Publication number 20050014078
- Publication date Jan 20, 2005
- William J. Baggenstoss
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pattern mask with features to minimize the effect of aberrations
- Publication number 20050003281
- Publication date Jan 6, 2005
- MICRON TECHNOLOGY, INC. a corporation of Delaware
- Pary Baluswamy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Capacitor layout orientation
- Publication number 20040264235
- Publication date Dec 30, 2004
- Bill Baggenstoss
- G11 - INFORMATION STORAGE
Information Patent Application
Methods of patterning radiation, methods of forming radiation-patte...
- Publication number 20040137342
- Publication date Jul 15, 2004
- Bill Baggenstoss
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reticles and methods of forming and using the same
- Publication number 20040044982
- Publication date Mar 4, 2004
- William J. Baggenstoss
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods of patterning radiation, methods of forming radiation-patte...
- Publication number 20030198876
- Publication date Oct 23, 2003
- Bill Baggenstoss
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pattern mask with features to minimize the effect of aberrations
- Publication number 20030165748
- Publication date Sep 4, 2003
- MICRON TECHNOLOGY INC., a corporation of Delaware
- Pary Baluswamy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Field correction of overlay error
- Publication number 20030034570
- Publication date Feb 20, 2003
- Micron Technology, Inc.
- Bill Baggenstoss
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Field correction of overlay error
- Publication number 20030036007
- Publication date Feb 20, 2003
- Micron Technology, Inc.
- Bill Baggenstoss
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Field correction of overlay error
- Publication number 20030022075
- Publication date Jan 30, 2003
- Micron Technology, Inc.
- Bill Baggenstoss
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Field correction of overlay error
- Publication number 20030022079
- Publication date Jan 30, 2003
- Micron Technology, Inc.
- Bill Baggenstoss
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS OF PATTERNING RADIATION , METHODS OF FORMING RADIATION- PAT...
- Publication number 20020142228
- Publication date Oct 3, 2002
- Bill Baggenstoss
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods of patterning radiation, methods of forming radiation-patte...
- Publication number 20010033979
- Publication date Oct 25, 2001
- Bill Baggenstoss
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods of reducing proximity effects in lithographic processes
- Publication number 20010023045
- Publication date Sep 20, 2001
- Christophe Pierrat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods of reducing proximity effects in lithographic processes
- Publication number 20010002304
- Publication date May 31, 2001
- Christophe Pierrat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

William J. Baggenstoss

Person

Patents Grantslast 30 patents

Method of forming pixel cell having a grated interface

Pixel cell having a grated interface

Reticles and methods of forming and using the same

Capacitor layout orientation

Capacitor layout orientation

Methods of patterning radiation, methods of forming radiation-patte...

Pattern mask with features to minimize the effect of aberrations

Field correction of overlay error

Reticles and methods of forming and using the same

Field correction of overlay error

Field correction of overlay error

Pattern mask with features to minimize the effect of aberrations

Field correction of overlay error

Methods of patterning radiation, methods of forming radiation-patte...

Methods of patterning radiation, methods of forming radiation-patte...

Methods of patterning radiation, methods of forming radiation-patte...

Field correction of overlay error

Method to eliminate side lobe printing of attenuated phase shift

Correction of field effects in photolithography

Methods of reducing proximity effects in lithographic processes

Methods of reducing proximity effects in lithographic processes

Methods of reducing proximity effects in lithographic processes

Patents Applicationslast 30 patents

Pattern mask with features to minimize the effect of aberrations

Pixel cell having a grated interface

Capacitor layout orientation

Pixel cell having a grated interface

Reticles and methods of forming and using the same

Pattern mask with features to minimize the effect of aberrations

Capacitor layout orientation

Methods of patterning radiation, methods of forming radiation-patte...

Reticles and methods of forming and using the same

Methods of patterning radiation, methods of forming radiation-patte...

Pattern mask with features to minimize the effect of aberrations

Field correction of overlay error

Field correction of overlay error

Field correction of overlay error

Field correction of overlay error

METHODS OF PATTERNING RADIATION , METHODS OF FORMING RADIATION- PAT...

Methods of patterning radiation, methods of forming radiation-patte...

Methods of reducing proximity effects in lithographic processes

Methods of reducing proximity effects in lithographic processes