William Leavitt

Person

Haverhill, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Source housing assembly for controlling ion beam extraction stabili...
- Patent number 9,934,928
- Issue date Apr 3, 2018
- Varian Semiconductor Equipment Associates, Inc.
- Shengwu Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Controlling an ion beam in a wide beam current operation range
- Patent number 9,679,745
- Issue date Jun 13, 2017
- Varian Semiconductor Equipment Associates, Inc.
- Shengwu Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method to control ion beam current
- Patent number 9,396,903
- Issue date Jul 19, 2016
- Varian Semiconductor Equipment Associates, Inc.
- Shengwu Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation apparatus
- Patent number 8,426,829
- Issue date Apr 23, 2013
- GTAT Corporation
- William H Leavitt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shaft cooling mechanisms
- Patent number 6,863,736
- Issue date Mar 8, 2005
- Ibis Technology Corporation
- William Leavitt
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Beam stop for use in an ion implantation system
- Patent number 6,815,696
- Issue date Nov 9, 2004
- Ibis Technology Corporation
- Steven Richards
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thermosetting resin wafer-holding pin
- Patent number 6,794,662
- Issue date Sep 21, 2004
- Ibis Technology Corporation
- William Leavitt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer heating devices for use in ion implantation systems
- Patent number 6,744,017
- Issue date Jun 1, 2004
- Ibis Technology Corporation
- William Leavitt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System for correcting eccentricity and rotational error of a workpiece
- Patent number 6,114,705
- Issue date Sep 5, 2000
- Varian Semiconductor Equipment Associates, Inc.
- William Leavitt
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
INTEGRATED GAS BOX AND ION SOURCE
- Publication number 20240420920
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- William H. Leavitt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROLLING AN ION BEAM IN A WIDE BEAM CURRENT OPERATION RANGE
- Publication number 20170110286
- Publication date Apr 20, 2017
- Varian Semiconductor Equipment Associates, Inc.
- Shengwu Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SOURCE HOUSING ASSEMBLY FOR CONTROLLING ION BEAM EXTRACTION STABILI...
- Publication number 20160336138
- Publication date Nov 17, 2016
- Varian Semiconductor Equipment Associates, Inc.
- Shengwu Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD TO CONTROL ION BEAM CURRENT
- Publication number 20160233048
- Publication date Aug 11, 2016
- Varian Semiconductor Equipment Associates, Inc.
- Shengwu Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTATION APPARATUS
- Publication number 20110073781
- Publication date Mar 31, 2011
- TWIN CREEKS TECHNOLOGIES, INC.
- William H. Leavitt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYBRID WAFER-HOLDER
- Publication number 20070199656
- Publication date Aug 30, 2007
- IBIS TECHNOLOGY CORPORATION
- William Leavitt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Shaft cooling mechanisms
- Publication number 20030221626
- Publication date Dec 4, 2003
- IBIS TECHNOLOGY
- William Leavitt
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Wafer heating devices for use in ion implantation systems
- Publication number 20030222072
- Publication date Dec 4, 2003
- IBIS TECHNOLOGY CORPORATON
- William Leavitt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Beam stop for use in an ion implantation system
- Publication number 20030222227
- Publication date Dec 4, 2003
- IBIS TECHNOLOGY
- Steven Richards
- H01 - BASIC ELECTRIC ELEMENTS

William Leavitt

Person

Patents Grantslast 30 patents

Source housing assembly for controlling ion beam extraction stabili...

Controlling an ion beam in a wide beam current operation range

Apparatus and method to control ion beam current

Ion implantation apparatus

Shaft cooling mechanisms

Beam stop for use in an ion implantation system

Thermosetting resin wafer-holding pin

Wafer heating devices for use in ion implantation systems

System for correcting eccentricity and rotational error of a workpiece

Patents Applicationslast 30 patents

INTEGRATED GAS BOX AND ION SOURCE

CONTROLLING AN ION BEAM IN A WIDE BEAM CURRENT OPERATION RANGE

SOURCE HOUSING ASSEMBLY FOR CONTROLLING ION BEAM EXTRACTION STABILI...

APPARATUS AND METHOD TO CONTROL ION BEAM CURRENT

ION IMPLANTATION APPARATUS

HYBRID WAFER-HOLDER

Shaft cooling mechanisms

Wafer heating devices for use in ion implantation systems

Beam stop for use in an ion implantation system