William R. Entley

Person

Wakefield, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Systems, methods and apparatus for choked flow element extraction
- Patent number 10,424,460
- Issue date Sep 24, 2019
- Lam Research Corporation
- Ali Shajii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Distributed multi-zone plasma source systems, methods and apparatus
- Patent number 10,283,325
- Issue date May 7, 2019
- Lam Research Corporation
- Ali Shajii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems, methods and apparatus for choked flow element extraction
- Patent number 9,449,793
- Issue date Sep 20, 2016
- Lam Research Corporation
- Ali Shajii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Distributed multi-zone plasma source systems, methods and apparatus
- Patent number 9,155,181
- Issue date Oct 6, 2015
- Lam Research Corporation
- Ali Shajii
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Systems, methods and apparatus for separate plasma source control
- Patent number 8,999,104
- Issue date Apr 7, 2015
- Lam Research Corporation
- Ali Shajii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle trap for a plasma source
- Patent number 7,914,603
- Issue date Mar 29, 2011
- MKS Instruments, Inc.
- Ali Shajii
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
Systems, Methods and Apparatus for Choked Flow Element Extraction
- Publication number 20160358754
- Publication date Dec 8, 2016
- LAM RESEARCH CORPORATION
- Ali Shajii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DISTRIBUTED MULTI-ZONE PLASMA SOURCE SYSTEMS, METHODS AND APPARATUS
- Publication number 20140096908
- Publication date Apr 10, 2014
- LAM RESEARCH CORPORATION
- Ali Shajii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Distributed, Non-Concentric Multi-Zone Plasma Source Systems, Metho...
- Publication number 20130025788
- Publication date Jan 31, 2013
- Ali Shajii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS, METHODS AND APPARATUS FOR CHOKED FLOW ELEMENT EXTRACTION
- Publication number 20120035766
- Publication date Feb 9, 2012
- Ali Shajii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DISTRIBUTED MULTI-ZONE PLASMA SOURCE SYSTEMS, METHODS AND APPARATUS
- Publication number 20120034394
- Publication date Feb 9, 2012
- Ali Shajii
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
SYSTEMS, METHODS AND APPARATUS FOR SEPARATE PLASMA SOURCE CONTROL
- Publication number 20120031876
- Publication date Feb 9, 2012
- Ali Shajii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARTICLE TRAP FOR A PLASMA SOURCE
- Publication number 20090320677
- Publication date Dec 31, 2009
- MKS Instruments, Inc.
- Ali Shajii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Particle Reduction Through Gas and Plasma Source Control
- Publication number 20080302652
- Publication date Dec 11, 2008
- MKS Instruments, Inc.
- William Robert Entley
- H01 - BASIC ELECTRIC ELEMENTS

William R. Entley

Person

Patents Grantslast 30 patents

Systems, methods and apparatus for choked flow element extraction

Distributed multi-zone plasma source systems, methods and apparatus

Systems, methods and apparatus for choked flow element extraction

Distributed multi-zone plasma source systems, methods and apparatus

Systems, methods and apparatus for separate plasma source control

Particle trap for a plasma source

Patents Applicationslast 30 patents

Systems, Methods and Apparatus for Choked Flow Element Extraction

DISTRIBUTED MULTI-ZONE PLASMA SOURCE SYSTEMS, METHODS AND APPARATUS

Distributed, Non-Concentric Multi-Zone Plasma Source Systems, Metho...

SYSTEMS, METHODS AND APPARATUS FOR CHOKED FLOW ELEMENT EXTRACTION

DISTRIBUTED MULTI-ZONE PLASMA SOURCE SYSTEMS, METHODS AND APPARATUS

SYSTEMS, METHODS AND APPARATUS FOR SEPARATE PLASMA SOURCE CONTROL

PARTICLE TRAP FOR A PLASMA SOURCE

Particle Reduction Through Gas and Plasma Source Control