Wim Tjibbo TEL

Person

Helmond, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Method for determining a measurement recipe and associated apparatuses
- Patent number 12,210,293
- Issue date Jan 28, 2025
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of determining control parameters of a device manufacturing...
- Patent number 12,197,136
- Issue date Jan 14, 2025
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Computational metrology
- Patent number 12,189,302
- Issue date Jan 7, 2025
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of wafer alignment using at resolution metrology on product...
- Patent number 12,124,179
- Issue date Oct 22, 2024
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Computational metrology based sampling scheme
- Patent number 12,044,979
- Issue date Jul 23, 2024
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of manufacturing devices
- Patent number 12,044,980
- Issue date Jul 23, 2024
- ASML Netherlands B.V.
- Abraham Slachter
- G05 - CONTROLLING REGULATING
Information Patent Grant
Method for calibrating a scanning charged particle microscope
- Patent number 11,972,922
- Issue date Apr 30, 2024
- ASML Netherlands B.V.
- Hermanus Adrianus Dillen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for characterizing a manufacturing process of semiconductor...
- Patent number 11,860,548
- Issue date Jan 2, 2024
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process window based on defect probability
- Patent number 11,822,255
- Issue date Nov 21, 2023
- ASML Netherlands B.V.
- Abraham Slachter
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of determining control parameters of a device manufacturing...
- Patent number 11,768,442
- Issue date Sep 26, 2023
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and system to monitor a process apparatus
- Patent number 11,733,610
- Issue date Aug 22, 2023
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to characterize post-processing data in terms of individual...
- Patent number 11,709,432
- Issue date Jul 25, 2023
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Selection of measurement locations for patterning processes
- Patent number 11,681,229
- Issue date Jun 20, 2023
- ASML Netherlands B.V.
- Hans Van Der Laan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for calibrating a scanning charged particle microscope
- Patent number 11,646,174
- Issue date May 9, 2023
- ASML Netherlands, B.V.
- Hermanus Adrianus Dillen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Computational metrology based sampling scheme
- Patent number 11,635,698
- Issue date Apr 25, 2023
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Lithographic process and apparatus and inspection process and appar...
- Patent number 11,599,027
- Issue date Mar 7, 2023
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Separation of contributions to metrology data
- Patent number 11,520,239
- Issue date Dec 6, 2022
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of determining control parameters of a device manufacturing...
- Patent number 11,513,442
- Issue date Nov 29, 2022
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Computational metrology based correction and control
- Patent number 11,448,973
- Issue date Sep 20, 2022
- ASML Netherlands B.V.
- Manouk Rijpstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and apparatus for monitoring a lithographic manufacturing p...
- Patent number 11,422,476
- Issue date Aug 23, 2022
- ASML Netherlands B.V.
- Emil Peter Schmitt-Weaver
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of determining a focus of a projection system, device manufa...
- Patent number 11,415,899
- Issue date Aug 16, 2022
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Computational metrology
- Patent number 11,347,150
- Issue date May 31, 2022
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Methods using fingerprint and evolution analysis
- Patent number 11,281,110
- Issue date Mar 22, 2022
- ASML Netherlands B.V.
- Jeroen Van Dongen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for measurement of alignment
- Patent number 11,249,404
- Issue date Feb 15, 2022
- ASML Netherlands B.V.
- Emil Peter Schmitt-Weaver
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic process and apparatus and inspection process and appar...
- Patent number 11,199,782
- Issue date Dec 14, 2021
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Control based on probability density function of parameter
- Patent number 11,143,971
- Issue date Oct 12, 2021
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Focus and overlay improvement by modifying a patterning device
- Patent number 11,126,093
- Issue date Sep 21, 2021
- ASML Netherlands B.V.
- Richard Johannes Franciscus Van Haren
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optimization of a lithographic projection apparatus accounting for...
- Patent number 11,112,700
- Issue date Sep 7, 2021
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Process window based on defect probability
- Patent number 11,079,687
- Issue date Aug 3, 2021
- ASML Netherlands B.V.
- Abraham Slachter
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Computational metrology
- Patent number 11,067,902
- Issue date Jul 20, 2021
- ASML Netherlands B.V.
- Patrick Warnaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
COMPUTATIONAL METROLOGY BASED SAMPLING SCHEME
- Publication number 20240377756
- Publication date Nov 14, 2024
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR DECOUPLING SOURCES OF VARIATION RELATED TO SEMICONDUCTOR...
- Publication number 20240142959
- Publication date May 2, 2024
- ASML NETHERLANDS B.V.
- Jill Elizabeth FREEMAN
- G05 - CONTROLLING REGULATING
Information Patent Application
PROCESS WINDOW BASED ON DEFECT PROBABILITY
- Publication number 20240126181
- Publication date Apr 18, 2024
- ASML NETHERLANDS B.V.
- Abraham SLACHTER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
A METHOD FOR CHARACTERIZING A MANUFACTURING PROCESS OF SEMICONDUCTO...
- Publication number 20240111218
- Publication date Apr 4, 2024
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF DETERMINING CONTROL PARAMETERS OF A DEVICE MANUFACTURING...
- Publication number 20240012337
- Publication date Jan 11, 2024
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND SYSTEM TO MONITOR A PROCESS APPARATUS
- Publication number 20240004299
- Publication date Jan 4, 2024
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTION OF MEASUREMENT LOCATIONS FOR PATTERNING PROCESSES
- Publication number 20230333481
- Publication date Oct 19, 2023
- ASML NETHERLANDS B.V.
- Hans VAN DER LAAN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
TARGET STRUCTURE AND ASSOCIATED METHODS AND APPARATUS
- Publication number 20230333485
- Publication date Oct 19, 2023
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR CALIBRATING A SCANNING CHARGED PARTICLE MICROSCOPE
- Publication number 20230245851
- Publication date Aug 3, 2023
- ASML NETHERLANDS B.V.
- Hermanus Adrianus DILLEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPUTATIONAL METROLOGY BASED SAMPLING SCHEME
- Publication number 20230221654
- Publication date Jul 13, 2023
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD OF WAFER ALIGNMENT USING AT RESOLUTION METROLOGY ON PRODUCT...
- Publication number 20230168594
- Publication date Jun 1, 2023
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF DETERMINING CONTROL PARAMETERS OF A DEVICE MANUFACTURING...
- Publication number 20230058839
- Publication date Feb 23, 2023
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SEPARATION OF CONTRIBUTIONS TO METROLOGY DATA
- Publication number 20230042759
- Publication date Feb 9, 2023
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING A MEASUREMENT RECIPE AND ASSOCIATED APPARATUSES
- Publication number 20230035073
- Publication date Feb 2, 2023
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING A FIELD-OF-VIEW SETTING
- Publication number 20230023153
- Publication date Jan 26, 2023
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPUTATIONAL METROLOGY BASED CORRECTION AND CONTROL
- Publication number 20220365446
- Publication date Nov 17, 2022
- ASML NETHERLANDS B.V.
- Manouk RIJPSTRA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING DEFECTIVENESS OF PATTERN BASED ON AFTER DEVE...
- Publication number 20220342316
- Publication date Oct 27, 2022
- ASML NETHERLANDS B.V.
- Marleen KOOIMAN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
COMPUTATIONAL METROLOGY
- Publication number 20220260925
- Publication date Aug 18, 2022
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
A METHOD FOR CHARACTERIZING A MANUFACTURING PROCESS OF SEMICONDUCTO...
- Publication number 20220100098
- Publication date Mar 31, 2022
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC PROCESS & APPARATUS AND INSPECTION PROCESS AND APPARATUS
- Publication number 20220057719
- Publication date Feb 24, 2022
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD IN THE MANUFACTURING PROCESS OF A DEVICE, A NON-TRANSITORY C...
- Publication number 20210407112
- Publication date Dec 30, 2021
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD OF MANUFACTURING DEVICES
- Publication number 20210397172
- Publication date Dec 23, 2021
- ASML NETHERLANDS B.V.
- Abraham SLACHTER
- G05 - CONTROLLING REGULATING
Information Patent Application
METHOD TO CHARACTERIZE POST-PROCESSING DATA IN TERMS OF INDIVIDUAL...
- Publication number 20210389683
- Publication date Dec 16, 2021
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROCESS WINDOW BASED ON DEFECT PROBABILITY
- Publication number 20210356874
- Publication date Nov 18, 2021
- ASML NETHERLANDS B.V.
- Abraham SLACHTER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPUTATIONAL METROLOGY
- Publication number 20210349395
- Publication date Nov 11, 2021
- ASML NETHERLANDS B.V.
- Patrick WARNAAR
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS USING FINGERPRINT AND EVOLUTION ANALYSIS
- Publication number 20210255547
- Publication date Aug 19, 2021
- ASML NETHERLANDS B.V.
- Jeroen Van Dongen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SELECTION OF MEASUREMENT LOCATIONS FOR PATTERNING PROCESSES
- Publication number 20210216017
- Publication date Jul 15, 2021
- ASML NETHERLANDS B.V.
- Hans VAN DER LAAN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
LITHOGRAPHIC PROCESS & APPARATUS AND INSPECTION PROCESS AND APPARATUS
- Publication number 20210208511
- Publication date Jul 8, 2021
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPUTATIONAL METROLOGY
- Publication number 20210191278
- Publication date Jun 24, 2021
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD OF DETERMINING CONTROL PARAMETERS OF A DEVICE MANUFACTURING...
- Publication number 20210149312
- Publication date May 20, 2021
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G06 - COMPUTING CALCULATING COUNTING

Wim Tjibbo TEL

Person

Patents Grantslast 30 patents

Method for determining a measurement recipe and associated apparatuses

Method of determining control parameters of a device manufacturing...

Computational metrology

Method of wafer alignment using at resolution metrology on product...

Computational metrology based sampling scheme

Method of manufacturing devices

Method for calibrating a scanning charged particle microscope

Method for characterizing a manufacturing process of semiconductor...

Process window based on defect probability

Method of determining control parameters of a device manufacturing...

Method and system to monitor a process apparatus

Method to characterize post-processing data in terms of individual...

Selection of measurement locations for patterning processes

Method for calibrating a scanning charged particle microscope

Computational metrology based sampling scheme

Lithographic process and apparatus and inspection process and appar...

Separation of contributions to metrology data

Method of determining control parameters of a device manufacturing...

Computational metrology based correction and control

Methods and apparatus for monitoring a lithographic manufacturing p...

Method of determining a focus of a projection system, device manufa...

Computational metrology

Methods using fingerprint and evolution analysis

System and method for measurement of alignment

Lithographic process and apparatus and inspection process and appar...

Control based on probability density function of parameter

Focus and overlay improvement by modifying a patterning device

Optimization of a lithographic projection apparatus accounting for...

Process window based on defect probability

Computational metrology

Patents Applicationslast 30 patents

COMPUTATIONAL METROLOGY BASED SAMPLING SCHEME

METHOD FOR DECOUPLING SOURCES OF VARIATION RELATED TO SEMICONDUCTOR...

PROCESS WINDOW BASED ON DEFECT PROBABILITY

A METHOD FOR CHARACTERIZING A MANUFACTURING PROCESS OF SEMICONDUCTO...

METHOD OF DETERMINING CONTROL PARAMETERS OF A DEVICE MANUFACTURING...

METHOD AND SYSTEM TO MONITOR A PROCESS APPARATUS

SELECTION OF MEASUREMENT LOCATIONS FOR PATTERNING PROCESSES

TARGET STRUCTURE AND ASSOCIATED METHODS AND APPARATUS

METHOD FOR CALIBRATING A SCANNING CHARGED PARTICLE MICROSCOPE

COMPUTATIONAL METROLOGY BASED SAMPLING SCHEME

METHOD OF WAFER ALIGNMENT USING AT RESOLUTION METROLOGY ON PRODUCT...

METHOD OF DETERMINING CONTROL PARAMETERS OF A DEVICE MANUFACTURING...

SEPARATION OF CONTRIBUTIONS TO METROLOGY DATA

METHOD FOR DETERMINING A MEASUREMENT RECIPE AND ASSOCIATED APPARATUSES

METHOD FOR DETERMINING A FIELD-OF-VIEW SETTING

COMPUTATIONAL METROLOGY BASED CORRECTION AND CONTROL

METHOD FOR DETERMINING DEFECTIVENESS OF PATTERN BASED ON AFTER DEVE...

COMPUTATIONAL METROLOGY

A METHOD FOR CHARACTERIZING A MANUFACTURING PROCESS OF SEMICONDUCTO...

LITHOGRAPHIC PROCESS & APPARATUS AND INSPECTION PROCESS AND APPARATUS

METHOD IN THE MANUFACTURING PROCESS OF A DEVICE, A NON-TRANSITORY C...

METHOD OF MANUFACTURING DEVICES

METHOD TO CHARACTERIZE POST-PROCESSING DATA IN TERMS OF INDIVIDUAL...

PROCESS WINDOW BASED ON DEFECT PROBABILITY

COMPUTATIONAL METROLOGY

METHODS USING FINGERPRINT AND EVOLUTION ANALYSIS

SELECTION OF MEASUREMENT LOCATIONS FOR PATTERNING PROCESSES

LITHOGRAPHIC PROCESS & APPARATUS AND INSPECTION PROCESS AND APPARATUS

COMPUTATIONAL METROLOGY

METHOD OF DETERMINING CONTROL PARAMETERS OF A DEVICE MANUFACTURING...