Winfried Kaiser

Person

Aalen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Microlithography projection exposure apparatus having at least two...
- Patent number 9,529,276
- Issue date Dec 27, 2016
- Carl Zeiss SMT GmbH
- Hans-Juergen Mann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Objective with fluoride crystal lenses
- Patent number 7,382,536
- Issue date Jun 3, 2008
- Carl Zeiss SMT AG
- Daniel Krähmer
- G02 - OPTICS
Information Patent Grant
Projection objective, especially for microlithography, and method f...
- Patent number 7,310,187
- Issue date Dec 18, 2007
- Carl Zeiss SMT AG
- Alexander Epple
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection objective, especially for microlithography, and method f...
- Patent number 7,209,292
- Issue date Apr 24, 2007
- Carl Zeiss SMT AG
- Alexander Epple
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Objective with fluoride crystal lenses
- Patent number 7,180,667
- Issue date Feb 20, 2007
- Carl Zeiss SMT AG
- Daniel Krähmer
- G02 - OPTICS
Information Patent Grant
Projection lens and microlithographic projection exposure apparatus
- Patent number 7,170,585
- Issue date Jan 30, 2007
- Carl Zeiss SMT AG
- Martin Brunotte
- G02 - OPTICS
Information Patent Grant
Objective with fluoride crystal lenses
- Patent number 7,145,720
- Issue date Dec 5, 2006
- Carl Zeiss SMT AG
- Daniel Krähmer
- G02 - OPTICS
Information Patent Grant
Objective with fluoride crystal lenses
- Patent number 7,126,765
- Issue date Oct 24, 2006
- Carl Zeiss SMT AG
- Daniel Krähmer
- G02 - OPTICS
Information Patent Grant
Device for holding a beam splitter element
- Patent number 7,079,331
- Issue date Jul 18, 2006
- Carl Zeiss SMT AG
- Ulrich Weber
- G02 - OPTICS
Information Patent Grant
Projection lens and microlithographic projection exposure apparatus
- Patent number 6,879,379
- Issue date Apr 12, 2005
- Carl Zeiss SMT AG
- Martin Brunotte
- G02 - OPTICS
Information Patent Grant
SiO2-coated mirror substrate for EUV
- Patent number 6,453,005
- Issue date Sep 17, 2002
- Carl-Zeiss-Stiftung
- Winfried Kaiser
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Optical system with polarization compensator
- Patent number 6,252,712
- Issue date Jun 26, 2001
- Carl-Zeiss-Stiftung
- Gerhard Fürter
- G02 - OPTICS
Information Patent Grant
Device for correcting perspective distortions
- Patent number 5,194,988
- Issue date Mar 16, 1993
- Carl-Zeiss-Stiftung
- Werner Flother
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
MICROLITHOGRAPHY PROJECTION EXPOSURE APPARATUS HAVING AT LEAST TWO...
- Publication number 20110200946
- Publication date Aug 18, 2011
- CARL ZEISS SMT GMBH
- Hans-Juergen Mann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTIPLE-USE PROJECTION SYSTEM
- Publication number 20080151211
- Publication date Jun 26, 2008
- Carl Zeiss SMT AG
- Winfried Kaiser
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Projection objective, especially for microlithography, and method f...
- Publication number 20070188881
- Publication date Aug 16, 2007
- Carl Zeiss SMT AG
- Alexander Epple
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Objective with fluoride crystal lenses
- Publication number 20060171020
- Publication date Aug 3, 2006
- Carl Zeiss SMT AG
- Daniel Krahmer
- G02 - OPTICS
Information Patent Application
Projection lens and microlithographic projection exposure apparatus
- Publication number 20050264786
- Publication date Dec 1, 2005
- Martin Brunotte
- G02 - OPTICS
Information Patent Application
Device for holding a beam splitter element
- Publication number 20050248858
- Publication date Nov 10, 2005
- Carl Zeiss SMT AG
- Ulrich Weber
- G02 - OPTICS
Information Patent Application
PROJECTION LENS AND MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- Publication number 20050134967
- Publication date Jun 23, 2005
- Carl Zeiss SMT AG
- Martin Brunotte
- G02 - OPTICS
Information Patent Application
Objective with fluoride crystal lenses
- Publication number 20050122594
- Publication date Jun 9, 2005
- Carl Zeiss SMT AG, a Germany corporation
- Daniel Krahmer
- G02 - OPTICS
Information Patent Application
Objective with fluoride crystal lenses
- Publication number 20040190151
- Publication date Sep 30, 2004
- Daniel Krahmer
- G02 - OPTICS
Information Patent Application
Projection lens and microlithographic projection exposure apparatus
- Publication number 20040150806
- Publication date Aug 5, 2004
- Martin Brunotte
- G02 - OPTICS
Information Patent Application
Projection objective, especially for microlithography, and method f...
- Publication number 20040109237
- Publication date Jun 10, 2004
- Carl Zeiss SMT AG
- Alexander Epple
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Objective with fluoride crystal lenses
- Publication number 20040105170
- Publication date Jun 3, 2004
- Carl Zeiss SMT AG
- Daniel Krahmer
- G02 - OPTICS
Information Patent Application
SiO2-coated mirror substrate for EUV
- Publication number 20010028518
- Publication date Oct 11, 2001
- Winfried Kaiser
- B82 - NANO-TECHNOLOGY

Winfried Kaiser

Person

Patents Grantslast 30 patents

Microlithography projection exposure apparatus having at least two...

Objective with fluoride crystal lenses

Projection objective, especially for microlithography, and method f...

Projection objective, especially for microlithography, and method f...

Objective with fluoride crystal lenses

Projection lens and microlithographic projection exposure apparatus

Objective with fluoride crystal lenses

Objective with fluoride crystal lenses

Device for holding a beam splitter element

Projection lens and microlithographic projection exposure apparatus

SiO2-coated mirror substrate for EUV

Optical system with polarization compensator

Device for correcting perspective distortions

Patents Applicationslast 30 patents

MICROLITHOGRAPHY PROJECTION EXPOSURE APPARATUS HAVING AT LEAST TWO...

MULTIPLE-USE PROJECTION SYSTEM

Projection objective, especially for microlithography, and method f...

Objective with fluoride crystal lenses

Projection lens and microlithographic projection exposure apparatus

Device for holding a beam splitter element

PROJECTION LENS AND MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

Objective with fluoride crystal lenses

Objective with fluoride crystal lenses

Projection lens and microlithographic projection exposure apparatus

Projection objective, especially for microlithography, and method f...

Objective with fluoride crystal lenses

SiO2-coated mirror substrate for EUV