Wolfgang Henke

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Dresden, DE

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Patents Grantslast 30 patents

Information Patent Grant
Photomask, method of lithographically structuring a photoresist lay...
- Patent number 6,620,559
- Issue date Sep 16, 2003
- Infineon Technologies AG
- Günther Czech
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Photomask, method of lithographically structuring a photoresist lay...
- Publication number 20020039691
- Publication date Apr 4, 2002
- Gunther Czech
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY