Wolfgang R. ADERHOLD

Person

Cupertino, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Rotatable thermal processing chamber
- Patent number 12,176,242
- Issue date Dec 24, 2024
- Applied Materials, Inc.
- Wolfgang R. Aderhold
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RTP substrate temperature one for all control algorithm
- Patent number 12,169,098
- Issue date Dec 17, 2024
- Applied Materials, Inc.
- Wolfgang Aderhold
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems, methods, and apparatus for correcting thermal processing o...
- Patent number 12,085,965
- Issue date Sep 10, 2024
- Applied Materials, Inc.
- Wolfgang R. Aderhold
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Temperature offset and zone control tuning
- Patent number 12,080,573
- Issue date Sep 3, 2024
- Applied Materials, Inc.
- Ole Luckner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Automated substrate placement to chamber center
- Patent number 11,942,345
- Issue date Mar 26, 2024
- Applied Materials, Inc.
- Wolfgang Aderhold
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System for non radial temperature control for rotating substrates
- Patent number 11,942,381
- Issue date Mar 26, 2024
- Applied Materials, Inc.
- Wolfgang R. Aderhold
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus, systems, and methods of measuring edge ring distance for...
- Patent number 11,915,953
- Issue date Feb 27, 2024
- Applied Materials, Inc.
- Ole Luckner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reflector plate for substrate processing
- Patent number 11,828,656
- Issue date Nov 28, 2023
- Applied Materials, Inc.
- Wolfgang R. Aderhold
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enhanced process and hardware architecture to detect and correct re...
- Patent number 11,735,447
- Issue date Aug 22, 2023
- Applied Materials, Inc.
- Kartik Santhanam
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Methods and apparatus for measuring edge ring temperature
- Patent number 11,664,250
- Issue date May 30, 2023
- Applied Materials, Inc.
- Ji-Dih Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optically transparent pedestal for fluidly supporting a substrate
- Patent number 11,492,698
- Issue date Nov 8, 2022
- Applied Materials, Inc.
- Wolfgang R. Aderhold
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of post treating dielectric films with microwave radiation
- Patent number 11,469,100
- Issue date Oct 11, 2022
- Applied Materials, Inc.
- Yong Sun
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Doping techniques
- Patent number 11,443,948
- Issue date Sep 13, 2022
- Applied Materials, Inc.
- Wolfgang Aderhold
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for integrated selective monolayer doping
- Patent number 11,373,871
- Issue date Jun 28, 2022
- Applied Materials, Inc.
- Benjamin Colombeau
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for measuring edge ring temperature
- Patent number 11,342,209
- Issue date May 24, 2022
- Applied Materials, Inc.
- Ji-Dih Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thermal processing chamber with low temperature control
- Patent number 10,948,353
- Issue date Mar 16, 2021
- Applied Materials, Inc.
- Lara Hawrylchak
- G01 - MEASURING TESTING
Information Patent Grant
System for non radial temperature control for rotating substrates
- Patent number 10,741,457
- Issue date Aug 11, 2020
- Applied Materials, Inc.
- Wolfgang R. Aderhold
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thermal cooling member with low temperature control
- Patent number 10,571,337
- Issue date Feb 25, 2020
- Applied Materials, Inc.
- Lara Hawrylchak
- G05 - CONTROLLING REGULATING
Information Patent Grant
Pyrometer background elimination
- Patent number 10,330,535
- Issue date Jun 25, 2019
- Applied Materials, Inc.
- Wolfgang R. Aderhold
- G01 - MEASURING TESTING
Information Patent Grant
Pyrometer background elimination
- Patent number 9,759,615
- Issue date Sep 12, 2017
- Applied Materials, Inc.
- Wolfgang R. Aderhold
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System for non radial temperature control for rotating substrates
- Patent number 9,728,471
- Issue date Aug 8, 2017
- Applied Materials, Inc.
- Wolfgang R. Aderhold
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for enhancing the cool down of radiatively hea...
- Patent number 9,640,412
- Issue date May 2, 2017
- Applied Materials, Inc.
- Wolfgang Aderhold
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Rapid thermal processing chamber with micro-positioning system
- Patent number 9,564,349
- Issue date Feb 7, 2017
- Applied Materials, Inc.
- Khurshed Sorabji
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Backside rapid thermal processing of patterned wafers
- Patent number 9,431,278
- Issue date Aug 30, 2016
- Applied Materials, Inc.
- Wolfgang Aderhold
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Grant
Rapid thermal processing chamber with micro-positioning system
- Patent number 9,390,950
- Issue date Jul 12, 2016
- Applied Materials, Inc.
- Khurshed Sorabji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of improving substrate uniformity during rapid thermal proce...
- Patent number 9,245,768
- Issue date Jan 26, 2016
- Applied Materials, Inc.
- Wolfgang R. Aderhold
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and methods for microwave processing of semiconductor sub...
- Patent number 9,018,110
- Issue date Apr 28, 2015
- Applied Materials, Inc.
- Michael W. Stowell
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Spike anneal residence time reduction in rapid thermal processing c...
- Patent number 8,939,760
- Issue date Jan 27, 2015
- Applied Materials, Inc.
- Jiping Li
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Grant
Rapid thermal processing chamber with micro-positioning system
- Patent number 8,900,889
- Issue date Dec 2, 2014
- Applied Materials, Inc.
- Khurshed Sorabji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Edge ring lip
- Patent number 8,865,602
- Issue date Oct 21, 2014
- Applied Materials, Inc.
- Joseph M. Ranish
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Patents Applicationslast 30 patents

Information Patent Application
PROCESS CHAMBER CLEAN
- Publication number 20240307930
- Publication date Sep 19, 2024
- Applied Materials, Inc.
- Wolfgang R. ADERHOLD
- B08 - CLEANING
Information Patent Application
RADIATION SEPARATION SYSTEM
- Publication number 20240312807
- Publication date Sep 19, 2024
- Applied Materials, Inc.
- Wolfgang R. ADERHOLD
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONVECTIVE SUBSTRATE COOLING WITH MINIMAL PRESSURE CHANGE
- Publication number 20240288220
- Publication date Aug 29, 2024
- Applied Materials, Inc.
- Wolfgang R. ADERHOLD
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Application
APPARATUS, SYSTEMS, AND METHODS OF MEASURING EDGE RING DISTANCE FOR...
- Publication number 20240203766
- Publication date Jun 20, 2024
- Applied Materials, Inc.
- Ole LUCKNER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTACT LAYER FORMATION WITH MICROWAVE ANNEALING FOR NMOS DEVICES
- Publication number 20240203742
- Publication date Jun 20, 2024
- Applied Materials, Inc.
- Nicolas Louis BREIL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AUTOMATED SUBSTRATE PLACEMENT TO CHAMBER CENTER
- Publication number 20240194508
- Publication date Jun 13, 2024
- Applied Materials, Inc.
- WOLFGANG ADERHOLD
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS
Information Patent Application
REFLECTOR PLATE FOR SUBSTRATE PROCESSING
- Publication number 20240175753
- Publication date May 30, 2024
- Applied Materials, Inc.
- Wolfgang R. ADERHOLD
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW TEMPERATURE MEASUREMENT OF SEMICONDUCTOR SUBSTRATES
- Publication number 20240145274
- Publication date May 2, 2024
- Applied Materials, Inc.
- Wolfgang R. ADERHOLD
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RAPID THERMAL PROCESSING (RTP) CHAMBER OUTGASSING REMOVAL
- Publication number 20240123477
- Publication date Apr 18, 2024
- Applied Materials, Inc.
- Wolfgang Aderhold
- B08 - CLEANING
Information Patent Application
LASER ENHANCED MICROWAVE ANNEAL
- Publication number 20240066627
- Publication date Feb 29, 2024
- Applied Materials, Inc.
- Wolfgang R. ADERHOLD
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
AUTOMATED SUBSTRATE PLACEMENT TO CHAMBER CENTER
- Publication number 20240021451
- Publication date Jan 18, 2024
- Applied Materials, Inc.
- Wolfgang Aderhold
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DOPANT DIFFUSION WITH SHORT HIGH TEMPERATURE ANNEAL PULSES
- Publication number 20230411183
- Publication date Dec 21, 2023
- Applied Materials, Inc.
- Wolfgang R. ADERHOLD
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM FOR NON RADIAL TEMPERATURE CONTROL FOR ROTATING SUBSTRATES
- Publication number 20230402331
- Publication date Dec 14, 2023
- Applied Materials, Inc.
- Wolfgang R. ADERHOLD
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AUTO FINE-TUNER FOR DESIRED TEMPERATURE PROFILE
- Publication number 20230402305
- Publication date Dec 14, 2023
- Applied Materials, Inc.
- Yi Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EMISSIVITY INDEPENDENCE TUNING
- Publication number 20230392987
- Publication date Dec 7, 2023
- Applied Materials, Inc.
- Wolfgang Aderhold
- G01 - MEASURING TESTING
Information Patent Application
MACHINE LEARNING MODEL BASED CONTROLLER FOR RAPID THERMAL PROCESSIN...
- Publication number 20230334201
- Publication date Oct 19, 2023
- Preetham Rao
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
UNIFORM RADIATION HEATING CONTROL ARCHITECTURE
- Publication number 20230297740
- Publication date Sep 21, 2023
- Applied Materials, Inc.
- Preetham Rao
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ROTATABLE THERMAL PROCESSING CHAMBER
- Publication number 20230238269
- Publication date Jul 27, 2023
- Applied Materials, Inc.
- Wolfgang R. ADERHOLD
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CODED SUBSTRATE MATERIAL IDENTIFIER COMMUNICATION TOOL
- Publication number 20230147976
- Publication date May 11, 2023
- Applied Materials, Inc.
- Wolfgang Aderhold
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SYSTEMS, METHODS, AND APPARATUS FOR CORRECTING THERMAL PROCESSING O...
- Publication number 20230069444
- Publication date Mar 2, 2023
- Applied Materials, Inc.
- Wolfgang R. ADERHOLD
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PYROMETRY ERROR DETECTION SENSOR FOR RTP TEMPERATURE CONTROL SYSTEM
- Publication number 20230051521
- Publication date Feb 16, 2023
- Applied Material, Inc.
- Wolfgang Aderhold
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Doping Techniques
- Publication number 20220375753
- Publication date Nov 24, 2022
- Applied Materials, Inc.
- Wolfgang Aderhold
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR MEASURING EDGE RING TEMPERATURE
- Publication number 20220246453
- Publication date Aug 4, 2022
- Applied Materials, Inc.
- JI-DIH HU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REFLECTOR PLATE FOR SUBSTRATE PROCESSING
- Publication number 20220163394
- Publication date May 26, 2022
- Applied Materials, Inc.
- Wolfgang R. ADERHOLD
- G01 - MEASURING TESTING
Information Patent Application
RTP SUBSTRATE TEMPERATURE ONE FOR ALL CONTROL ALGORITHM
- Publication number 20220136772
- Publication date May 5, 2022
- Applied Materials, Inc.
- Wolfgang Aderhold
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENHANCED PROCESS AND HARDWARE ARCHITECTURE TO DETECT AND CORRECT RE...
- Publication number 20220122865
- Publication date Apr 21, 2022
- Kartik Santhanam
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
APPARATUS, SYSTEMS, AND METHODS OF MEASURING EDGE RING DISTANCE FOR...
- Publication number 20210327732
- Publication date Oct 21, 2021
- Applied Materials, Inc.
- Ole LUCKNER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR MEASURING EDGE RING TEMPERATURE
- Publication number 20210175101
- Publication date Jun 10, 2021
- Applied Materials, Inc.
- JI-DIH HU
- G01 - MEASURING TESTING
Information Patent Application
METHODS OF POST TREATING DIELECTRIC FILMS WITH MICROWAVE RADIATION
- Publication number 20200381248
- Publication date Dec 3, 2020
- Applied Materials, Inc.
- Yong SUN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEM FOR NON RADIAL TEMPERATURE CONTROL FOR ROTATING SUBSTRATES
- Publication number 20200373212
- Publication date Nov 26, 2020
- Applied Materials, Inc.
- Wolfgang R. ADERHOLD
- H01 - BASIC ELECTRIC ELEMENTS

Wolfgang R. ADERHOLD

Person

Patents Grantslast 30 patents

Rotatable thermal processing chamber

RTP substrate temperature one for all control algorithm

Systems, methods, and apparatus for correcting thermal processing o...

Temperature offset and zone control tuning

Automated substrate placement to chamber center

System for non radial temperature control for rotating substrates

Apparatus, systems, and methods of measuring edge ring distance for...

Reflector plate for substrate processing

Enhanced process and hardware architecture to detect and correct re...

Methods and apparatus for measuring edge ring temperature

Optically transparent pedestal for fluidly supporting a substrate

Methods of post treating dielectric films with microwave radiation

Doping techniques

Methods and apparatus for integrated selective monolayer doping

Methods and apparatus for measuring edge ring temperature

Thermal processing chamber with low temperature control

System for non radial temperature control for rotating substrates

Thermal cooling member with low temperature control

Pyrometer background elimination

Pyrometer background elimination

System for non radial temperature control for rotating substrates

Apparatus and method for enhancing the cool down of radiatively hea...

Rapid thermal processing chamber with micro-positioning system

Backside rapid thermal processing of patterned wafers

Rapid thermal processing chamber with micro-positioning system

Method of improving substrate uniformity during rapid thermal proce...

Apparatus and methods for microwave processing of semiconductor sub...

Spike anneal residence time reduction in rapid thermal processing c...

Rapid thermal processing chamber with micro-positioning system

Edge ring lip

Patents Applicationslast 30 patents

PROCESS CHAMBER CLEAN

RADIATION SEPARATION SYSTEM

CONVECTIVE SUBSTRATE COOLING WITH MINIMAL PRESSURE CHANGE

APPARATUS, SYSTEMS, AND METHODS OF MEASURING EDGE RING DISTANCE FOR...

CONTACT LAYER FORMATION WITH MICROWAVE ANNEALING FOR NMOS DEVICES

AUTOMATED SUBSTRATE PLACEMENT TO CHAMBER CENTER

REFLECTOR PLATE FOR SUBSTRATE PROCESSING

LOW TEMPERATURE MEASUREMENT OF SEMICONDUCTOR SUBSTRATES

RAPID THERMAL PROCESSING (RTP) CHAMBER OUTGASSING REMOVAL

LASER ENHANCED MICROWAVE ANNEAL

AUTOMATED SUBSTRATE PLACEMENT TO CHAMBER CENTER

DOPANT DIFFUSION WITH SHORT HIGH TEMPERATURE ANNEAL PULSES

SYSTEM FOR NON RADIAL TEMPERATURE CONTROL FOR ROTATING SUBSTRATES

AUTO FINE-TUNER FOR DESIRED TEMPERATURE PROFILE

EMISSIVITY INDEPENDENCE TUNING

MACHINE LEARNING MODEL BASED CONTROLLER FOR RAPID THERMAL PROCESSIN...

UNIFORM RADIATION HEATING CONTROL ARCHITECTURE

ROTATABLE THERMAL PROCESSING CHAMBER

CODED SUBSTRATE MATERIAL IDENTIFIER COMMUNICATION TOOL

SYSTEMS, METHODS, AND APPARATUS FOR CORRECTING THERMAL PROCESSING O...

PYROMETRY ERROR DETECTION SENSOR FOR RTP TEMPERATURE CONTROL SYSTEM

Doping Techniques

METHODS AND APPARATUS FOR MEASURING EDGE RING TEMPERATURE

REFLECTOR PLATE FOR SUBSTRATE PROCESSING

RTP SUBSTRATE TEMPERATURE ONE FOR ALL CONTROL ALGORITHM

ENHANCED PROCESS AND HARDWARE ARCHITECTURE TO DETECT AND CORRECT RE...

APPARATUS, SYSTEMS, AND METHODS OF MEASURING EDGE RING DISTANCE FOR...

METHODS AND APPARATUS FOR MEASURING EDGE RING TEMPERATURE

METHODS OF POST TREATING DIELECTRIC FILMS WITH MICROWAVE RADIATION

SYSTEM FOR NON RADIAL TEMPERATURE CONTROL FOR ROTATING SUBSTRATES