Wolfgang Seitz

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Rainau, DE

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Patents Grantslast 30 patents

Information Patent Grant
Illumination system of a microlithographic projection exposure appa...
- Patent number 9,170,499
- Issue date Oct 27, 2015
- Carl Zeiss SMT GmbH
- Damian Fiolka
- G02 - OPTICS
Information Patent Grant
Illumination system of a microlithographic projection exposure appa...
- Patent number 8,928,859
- Issue date Jan 6, 2015
- Carl Zeiss SMT GmbH
- Damian Fiolka
- G02 - OPTICS
Information Patent Grant
Optical system for EUV lithography with a charged-particle source
- Patent number 8,546,776
- Issue date Oct 1, 2013
- Carl Zeiss SMT GmbH
- Dirk Heinrich Ehm
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system of a microlithographic projection exposure appa...
- Patent number 8,264,668
- Issue date Sep 11, 2012
- Carl Zeiss SMT GmbH
- Damian Fiolka
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...
- Publication number 20150153654
- Publication date Jun 4, 2015
- Carl Zeiss SMT GMBH
- Damian Fiolka
- G02 - OPTICS
Information Patent Application
OPTICAL SYSTEM FOR EUV LITHOGRAPHY WITH A CHARGED-PARTICLE SOURCE
- Publication number 20130099132
- Publication date Apr 25, 2013
- Carl Zeiss SMT GMBH
- Dirk Heinrich EHM
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...
- Publication number 20120293786
- Publication date Nov 22, 2012
- Carl Zeiss SMT GMBH
- Damian Fiolka
- G02 - OPTICS
Information Patent Application
ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...
- Publication number 20100002217
- Publication date Jan 7, 2010
- Carl Zeiss SMT AG
- Damian Fiolka
- G02 - OPTICS