Won-Tai Ki

Person

Suwon-City, KR

People

Patents Grantslast 30 patents

Information Patent Grant
Vehicle battery mount structure
- Patent number 11,661,020
- Issue date May 30, 2023
- Hyundai Mobis Co., Ltd.
- Won Yong Ki
- B60 - VEHICLES IN GENERAL
Information Patent Grant
Mask for use in measuring flare, method of manufacturing the mask,...
- Patent number 7,393,615
- Issue date Jul 1, 2008
- Samsung Electronics Co., Ltd.
- Won-Tai Ki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure method for correcting line width variation in a photomask
- Patent number 7,185,312
- Issue date Feb 27, 2007
- Samsung Electronics Co., Ltd.
- Won-tai Ki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Electron beam lithography method
- Patent number 7,129,024
- Issue date Oct 31, 2006
- Samsung Electronics Co., Ltd.
- Won-Tai Ki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for making an OPC mask and an OPC mask manufactured using th...
- Patent number 7,065,735
- Issue date Jun 20, 2006
- Samsung Electronics Co., Ltd.
- Won-Tai Ki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask for use in measuring flare, method of manufacturing the mask,...
- Patent number 6,835,507
- Issue date Dec 28, 2004
- Samsung Electronics Co., Ltd.
- Won-Tai Ki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure method for correcting line width variation in a photomask
- Patent number 6,775,815
- Issue date Aug 10, 2004
- Samsung Electronics Co., Ltd.
- Won-tai Ki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure method for correcting dimension variation in electron beam...
- Patent number 6,689,520
- Issue date Feb 10, 2004
- Samsung Electronics Co., Ltd.
- Won-tai Ki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam mask having dummy stripe(s) and lithographic method o...
- Patent number 6,617,084
- Issue date Sep 9, 2003
- Samsung Electronics Co., Ltd.
- Won-tai Ki
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method of correcting line width variation due to loading effect cau...
- Patent number 6,475,684
- Issue date Nov 5, 2002
- Samsung Electronics Co., Ltd.
- Won-tai Ki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of compensating for pattern dimension variation caused by re...
- Patent number 6,291,119
- Issue date Sep 18, 2001
- Samsung Electronics, Co., Ltd.
- Ji-hyeon Choi
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
VEHICLE BATTERY MOUNT STRUCTURE
- Publication number 20210387583
- Publication date Dec 16, 2021
- HYUNDAI MOBIS CO., LTD.
- Won Yong KI
- B60 - VEHICLES IN GENERAL
Information Patent Application
Mask for use in measuring flare, method of manufacturing the mask,...
- Publication number 20050083518
- Publication date Apr 21, 2005
- Won-Tai Ki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure method for correcting line width variation in a photomask
- Publication number 20040229138
- Publication date Nov 18, 2004
- Won-tai Ki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Electron beam lithography method
- Publication number 20040058536
- Publication date Mar 25, 2004
- Won-Tai Ki
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method for making an OPC mask and an OPC mask manufactured using th...
- Publication number 20030226130
- Publication date Dec 4, 2003
- Samsung Electronics Co., Ltd.
- Won-Tai Ki
- B82 - NANO-TECHNOLOGY
Information Patent Application
Mask for use in measuring flare, method of manufacturing the mask,...
- Publication number 20030068565
- Publication date Apr 10, 2003
- Won-Tai Ki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure method for correcting line width variation in a photomask
- Publication number 20030061595
- Publication date Mar 27, 2003
- Won-tai Ki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure method for correcting dimension variation in electron beam...
- Publication number 20030027064
- Publication date Feb 6, 2003
- SAMSUNG ELECTRONICS CO., LTD.
- Won-Tai Ki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of correcting line width variation due to loading effect cau...
- Publication number 20020051916
- Publication date May 2, 2002
- SAMSUNG ELECTRONICS CO., LTD.
- Won-tai Ki
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Method of compensating for pattern dimension variation caused by re...
- Publication number 20010016295
- Publication date Aug 23, 2001
- SAMSUNG ELECTRONICS CO., LTD.
- Ji-hyeon Choi
- B82 - NANO-TECHNOLOGY

Person

Patents Grantslast 30 patents

Vehicle battery mount structure

Mask for use in measuring flare, method of manufacturing the mask,...

Exposure method for correcting line width variation in a photomask

Electron beam lithography method

Method for making an OPC mask and an OPC mask manufactured using th...

Mask for use in measuring flare, method of manufacturing the mask,...

Exposure method for correcting line width variation in a photomask

Exposure method for correcting dimension variation in electron beam...

Electron beam mask having dummy stripe(s) and lithographic method o...

Method of correcting line width variation due to loading effect cau...

Method of compensating for pattern dimension variation caused by re...

Patents Applicationslast 30 patents

VEHICLE BATTERY MOUNT STRUCTURE

Mask for use in measuring flare, method of manufacturing the mask,...

Exposure method for correcting line width variation in a photomask

Electron beam lithography method

Method for making an OPC mask and an OPC mask manufactured using th...

Mask for use in measuring flare, method of manufacturing the mask,...

Exposure method for correcting line width variation in a photomask

Exposure method for correcting dimension variation in electron beam...

Method of correcting line width variation due to loading effect cau...

Method of compensating for pattern dimension variation caused by re...